Resist composition and method of forming resist pattern

ABSTRACT

A resist composition including: a compound including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent having a hydroxyl group in which Rx 1  to Rx 4  each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Ry 1  and Ry 2  each independently represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Rz 1  to Rz 4  each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; at least one of Rx 1  to Rx 4 , Ry 1  and Ry 2  and Rz 1  to Rz 4  has an anionic group; and M m+  represents an organic cation)

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to a resist composition and a method of forming a resist pattern.

Priority is claimed on Japanese Patent Application No. 2018-101879, filed on May 28, 2018, the content of which is incorporated herein by reference.

Description of Related Art

In lithography techniques, for example, a resist film formed of a resist material is formed on a substrate, and the resist film is subjected to selective exposure, followed by a development treatment, thereby forming a resist pattern having a predetermined shape on the resist film. A resist material with which the exposed portions of the resist film become soluble in a developing solution is called a positive type, and a resist material with which the exposed portions of the resist film become insoluble in a developing solution is called a negative type.

In recent years, in the production of semiconductor elements and liquid crystal display elements, advances in lithography techniques have led to rapid progress in the field of pattern miniaturization. Typically, these miniaturization techniques involve shortening the wavelength (increasing the energy) of the exposure light source.

In particular, ultraviolet radiation typified by g-line and i-line radiation has been used, but nowadays KrF excimer lasers and ArF excimer lasers are used in mass production of semiconductor elements. Furthermore, research is also being conducted into an exposure light source having a wavelength shorter (energy higher) than these excimer lasers, such as extreme ultraviolet radiation (EUV), electron beams (EB), and X rays.

Resist materials require lithography characteristics such as high resolution capable of reproducing patterns of minute dimensions, and a high level of sensitivity to these types of exposure light sources.

As a resist material that satisfies these requirements, in the related art, a chemically amplified resist composition which contains a base material component of which solubility in a developing solution is changed due to an action of an acid and an acid generator component that generates an acid upon exposure has been used.

For example, as a positive chemically amplified resist composition when the developing solution is an alkali developing solution (alkali development process), a composition which contains a resin component (base resin) of which solubility in an alkali developing solution is increased due to an action of an acid and an acid generator component has been typically used. In a case where a resist film formed using such a resist composition is selectively exposed at the time of forming a resist pattern, in exposed portions, an acid is generated from the acid generator component so that the polarity of the base resin is increased due to the action of the acid, and thus the exposed portions of the resist film become soluble in the alkali developing solution. Accordingly, by conducting alkali development, a positive type pattern in which the unexposed portions of the resist film remain as a pattern is formed.

On the other hand, when such a chemically amplified resist composition is applied to a solvent developing process using a developing solution containing an organic solvent (organic developing solution), the solubility in an organic developing solution decreases as the polarity of the base resin increases, thus the unexposed area of the resist film is dissolved and removed by the organic developing solution to form a negative-tone resist pattern in which the exposed area of the resist film remains as a pattern. Such a solvent developing process for forming a negative-tone resist pattern is also referred to as “negative type developing process.”

The base resin used in the chemically amplified resist composition generally has a plurality of constitutional units in order to improve the lithography characteristics and the like.

For example, in a case of the resin component of which solubility in an alkali developing solution is increased due to the action of an acid, a constitutional unit containing an acid decomposable group which is decomposed due to the action of an acid generated from an acid generator to increase polarity is used. Additionally, constitutional units containing a lactone-containing cyclic group and constitutional units containing a polar group such as a hydroxyl group are used in combination.

Furthermore, the behavior of the acid generated from the acid generator component upon exposure is considered to be a factor which greatly affects the lithography characteristics upon forming a resist pattern.

As the acid generator to be used in the chemically amplified resist composition, various acid generators have been suggested so far. For example, an onium salt-based acid generator such as iodonium salt or sulfonium salt, an oxime sulfonate-based acid generator, a diazomethane-based acid generator, a nitrobenzyl sulfonate-based acid generator, an iminosulfonate-based acid generator, and a disulfone-based acid generator have been known.

As the onium salt-based acid generator, an acid generator having an onium ion such as triphenylsulfonium in a cation moiety is mainly used. Generally, an alkyl sulfonate ion or a fluorinated alkyl sulfonate ion in which some or all of hydrogen atoms of the alkyl group are substituted with fluorine atoms is used in an anion moiety of the onium salt-based acid generator.

Moreover, the onium salt-based acid generator having an anion having a specific structure containing an aromatic ring as the anion moiety of the onium salt-based acid generator is also proposed in order to improve the lithography characteristics upon forming the resist pattern (for example, see PTL 1).

DOCUMENTS OF RELATED ART

[PTL 1] Japanese Patent No. 5149236

SUMMARY OF THE INVENTION

As further advances in lithography technology and miniaturization of resist patterns continue to progress, for example, in lithography using electron beams or EUV, fine patterning of several tens of nm is a goal to be achieved. As stated above, as the resist pattern has a smaller size, the resist composition is required to have high sensitivity to the exposure light source and good lithography characteristics such as roughness reduction.

In addition, with the further miniaturization of patterns, it is also required to suppress flaws during development, in particular, occurrence of defects.

The term “defect” refers to, for example, all flaws detected when the developed resist pattern is observed by a wafer defect observation apparatus such as SEM. These flaws include flaws caused by adhering foreign substances or deposits such as post-development scum (resist residue), bubbles or dusts on the resist pattern surface; flaws related to the pattern shape such as bridges between line patterns, or clogging of holes in contact hole patterns; color unevenness of the pattern, etc. As a cause of the occurrence of this defect, foreign substances and flaws present in and on the surface of a coating film coated with a resist on a wafer can be considered. The foreign substances and flaws of the resist coating film can be detected, for example, by a surface defect observation apparatus (for example, Surfscan (registered trademark) series, manufactured by KLA Tekoror Corporation).

However, if improvement of characteristics such as sensitivity, roughness and resolution for an exposure light source such as EUV is tried in the resist composition containing the already-known onium salt-based acid generator as stated above, the foreign substances and flaws occur in the coating film depending on the acid generator, which leads to the occurrence of defects in the resist pattern. It is difficult to satisfy both the characteristics and the defect suppression.

The present invention has been made in consideration of the above-described circumstances, and an object thereof is to provide a resist composition which is excellent in lithography characteristics and in which occurrence of foreign substances and flaws in a coating film is suppressed, and a resist pattern forming method using the resist composition.

In order to achieve the objects, the present invention is made as follows.

That is, according to a first aspect of the present invention, there is provided a resist composition which generates an acid upon exposure and of which solubility in a developing solution is changed due to an action of an acid, the resist composition including: a base material component (A) of which solubility in a developing solution is changed due to an action of an acid; an acid generator component (B) that generates an acid upon exposure; an organic solvent component (S); and a compound (BD1) including an anion moiety and a cation moiety and represented by the following Formula (bd1), wherein the organic solvent component (S) contains an organic solvent (S1) having a hydroxyl group.

[In the formula, Rx¹ to Rx⁴ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rx¹ to Rx⁴ may be bonded to each other to form a ring structure, and at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure; Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, Ry¹ and Ry² may be bonded to each other to form a ring structure;

represents a double bond or a single bond; Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion; n represents an integer of 1 or more; m represents an integer of 1 or more; and M^(m+) represents an m-valent organic cation.]

According to a second aspect of the present invention, there is provided a resist pattern forming method, including: a step of forming a resist film on a support using the resist composition according to the first aspect; a step of exposing the resist film; and a step of developing the exposed resist film to form a resist pattern.

According to the present invention, it is possible to provide a resist composition excellent in lithography characteristics and in which occurrence of foreign substances and flaws in a coating film is suppressed, and a resist pattern forming method using the resist composition.

DETAILED DESCRIPTION OF THE INVENTION

In the present description and claims, the term “aliphatic” is a relative concept used in relation to the term “aromatic”, and defines a group or compound that has no aromaticity.

The term “alkyl group” includes linear, branched or cyclic monovalent saturated hydrocarbon, unless otherwise specified. The same applies for the alkyl group in an alkoxy group.

The term “alkylene group” includes linear, branched or cyclic divalent saturated hydrocarbon, unless otherwise specified.

A “halogenated alkyl group” is a group in which some or all hydrogen atoms of an alkyl group is substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

A “fluorinated alkyl group” or a “fluorinated alkylene group” is a group in which some or all hydrogen atoms of an alkyl group or an alkylene group have been substituted with fluorine atoms.

The term “constitutional unit” indicates a monomer unit that contributes to the formation of a polymeric compound (a resin, a polymer, or a copolymer).

The expression “may have a substituent” means that a case where a hydrogen atom (—H) is substituted with a monovalent group, or a case where a methylene (—CH₂—) group is substituted with a divalent group.

The term “exposure” is used as a general concept that includes irradiation with any form of radiation.

A “constitutional unit derived from acrylic acid ester” indicates a constitutional unit that is formed by the cleavage of the ethylenic double bond of acrylic acid ester.

The “acrylic acid ester” indicates a compound in which the terminal hydrogen atom of the carboxy group of acrylic acid (CH₂═CH—COOH) has been substituted with an organic group.

The acrylic acid ester may have the hydrogen atom bonded to the carbon atom at the α-position substituted with a substituent. The substituent (R^(α0)) that substitutes the hydrogen atom bonded to the carbon atom at the α-position is an atom other than hydrogen atom or a group, and examples thereof include an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms. Further, itaconic acid diester in which a substituent (R^(α0)) has been substituted with a substituent containing an ester bond, or α-hydroxyalkyl acrylic acid ester in which a substituent (R^(α0)) has been substituted with a hydroxyalkyl group or a group in which the hydroxyl group in a hydroxyalkyl group has been modified can be exemplified. A carbon atom at the α-position of acrylic acid ester indicates the carbon atom bonded to the carbonyl group, unless specified otherwise.

Hereinafter, acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position is substituted with a substituent is also referred to as “α-substituted acrylic acid ester.” Further, acrylic acid ester and α-substituted acrylic acid ester are also collectively referred to as “(α-substituted) acrylic acid ester.”

A “constitutional unit derived from acrylamide” indicates a constitutional unit that is formed by the cleavage of the ethylenic double bond of acrylamide.

The acrylamide may have the hydrogen atom bonded to the carbon atom at the α-position substituted with a substituent, and may have either or both hydrogen atoms on the amino group of acrylamide substituted with a substituent. A carbon atom at the α-position of an acrylamide indicates the carbon atom bonded to the carbonyl group of an acrylamide, unless specified otherwise.

As the substituent which substitutes the hydrogen atom bonded to the carbon atom at the α-position of acrylamide, the same substituents as those described above for the substituent (R^(α0)) at the α-position of the above-described α-position of the above-described α-substituted acrylic acid ester can be exemplified.

A “constitutional unit derived from hydroxystyrene” indicates a constitutional unit that is formed by the cleavage of an ethylenic double bond of hydroxystyrene. A “constitutional unit derived from a hydroxystyrene derivative” indicates a constitutional unit that is formed by the cleavage of an ethylenic double bond of a hydroxystyrene derivative.

The term “hydroxystyrene derivative” includes compounds in which the hydrogen atom at the α-position of hydroxystyrene has been substituted with another substituent such as an alkyl group or a halogenated alkyl group; and derivatives thereof. Examples of the derivatives thereof include hydroxystyrene in which the hydrogen atom of the hydroxyl group has been substituted with an organic group and may have the hydrogen atom at the α-position substituted with a substituent; and hydroxystyrene which has a substituent other than a hydroxyl group bonded to the benzene ring and may have the hydrogen atom at the α-position substituted with a substituent. Here, the α-position (carbon atom at the α-position) indicates the carbon atom having the benzene ring bonded thereto, unless specified otherwise.

As the substituent which substitutes the hydrogen atom at the α-position of hydroxystyrene, the same substituents as those described above for the substituent at the α-position of the above-described α-substituted acrylic acid ester can be exemplified.

A “constitutional unit derived from vinylbenzoic acid or a vinylbenzoic acid derivative” indicates a constitutional unit that is formed by the cleavage of the ethylenic double bond of vinylbenzoic acid or a vinylbenzoic acid derivative.

The term “vinylbenzoic acid derivative” includes compounds in which the hydrogen atom at the α-position of vinylbenzoic acid has been substituted with another substituent such as an alkyl group or a halogenated alkyl group; and derivatives thereof. Examples of the derivatives thereof include vinylbenzoic acid in which the hydrogen atom of the carboxy group has been substituted with an organic group and may have the hydrogen atom at the α-position substituted with a substituent; and vinylbenzoic acid which has a substituent other than a hydroxyl group and a carboxy group bonded to the benzene ring and may have the hydrogen atom at the α-position substituted with a substituent. Here, the α-position (carbon atom at the α-position) indicates the carbon atom having the benzene ring bonded thereto, unless specified otherwise.

The term “styrene derivative” is a concept including those obtained by substitution of a hydrogen atom at the α-position of styrene with other substituents such as an alkyl group and a halogenated alkyl group; and these derivatives. Examples of these derivatives include those obtained by bonding a substituent to a benzene ring of hydroxystyrene in which a hydrogen atom at the α-position may be substituted with a substituent. In addition, the α-position (a carbon atom at the α-position) indicates a carbon atom to which a benzene ring is bonded unless otherwise specified.

The term “constitutional unit derived from styrene” or “constitutional unit derived from a styrene derivative” indicates a constitutional unit formed by cleavage of an ethylenic double bond of styrene or a styrene derivative.

As the alkyl group as a substituent at the α-position, a linear or branched alkyl group is preferable, and specific examples include alkyl groups of 1 to 5 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, a neopentyl group and the like.

Specific examples of the halogenated alkyl group as the substituent at the α-position include groups in which some or all hydrogen atoms of the above-described “alkyl group as the substituent at the α-position” are substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferable.

Specific examples of the hydroxyalkyl group as the substituent at the α-position include groups in which some or all hydrogen atoms of the above-described “alkyl group as the substituent at the α-position” are substituted with a hydroxyl group. The number of hydroxyl groups in the hydroxyalkyl group is preferably 1 to 5, and most preferably 1.

In the present specification and the scope of the present patent claims, asymmetric carbons may be present or enantiomers or diastereomers may be present depending on the structures of the chemical formulae. In this case, these isomers are represented by one chemical formula. These isomers may be used alone or in the form of a mixture.

(Resist Composition)

The resist composition according to the first aspect of the present invention is a resist composition which generates an acid upon exposure and of which solubility in a developing solution is changed due to an action of an acid. The resist composition includes a base material component (A) (hereinafter, also referred to as a “component (A)”) of which solubility in a developing solution is changed due to the action of an acid; a compound (BD1) (hereinafter, also referred to as a “component (BD1)”), which is represented by Formula (bd1); and an organic solvent component (S) (hereinafter, also referred to as a “component (S”) which contains an organic solvent (S1) having a hydroxyl group.

One embodiment of the resist composition contains the component (A), an acid generator component (B) (hereinafter also referred to as a “component (B)”) which generates an acid upon exposure, and the component (S). It is preferred that the resist composition further contains a base component (hereinafter also referred to as a “component (D)”) that traps an acid generated from the component (B) upon exposure (i.e. controlling acid diffusion), in addition to the component (A), the component (B) and the component (S).

In the resist composition of the present embodiment, the component (BD1) may be used as the component (B) or as the component (D) by selecting an anionic group in the molecule.

In a case where a resist film is formed using the resist composition according to the present embodiment and the formed resist film is subjected to a selective exposure, acid is generated from the component (B) at exposed portions of the resist film, and the generated acid acts on the component (A) to change the solubility of the component (A) in a developing solution, whereas the solubility of the component (A) in a developing solution is not changed at unexposed portions of the resist film, thereby generating difference in solubility in a developing solution between exposed portions and unexposed portions. Therefore, by subjecting the resist film to development, the exposed portions of the resist film are dissolved and removed to form a positive-tone resist pattern in a case of a positive-tone resist composition, whereas the unexposed portions of the resist film are dissolved and removed to form a negative-tone resist pattern in a case of a negative-tone resist composition.

In the present specification, a resist composition which forms a positive-tone resist pattern by dissolving and removing the exposed portions of the resist film is called a positive-tone resist composition, and a resist composition which forms a negative-tone resist pattern by dissolving and removing the unexposed portions of the resist film is called a negative-tone resist composition.

The resist composition of the present embodiment may be a positive-tone resist composition or a negative-tone resist composition. Further, in the formation of a resist pattern, the resist composition of the present embodiment can be applied to an alkali developing process using an alkali developing solution in the developing treatment, or a solvent developing process using a developing solution containing an organic solvent (organic developing solution) in the developing treatment.

The resist composition of the present embodiment has an acid generating ability to generate an acid upon exposure, and the component (A) may generate an acid upon exposure in addition to the component (B).

In a case where the component (A) generates an acid upon exposure, the component (A) is defined as a “base material component which generates an acid upon exposure and of which solubility in a developing solution is changed due to the action of an acid.”

In a case where the component (A) is a base material component which generates an acid upon exposure and of which solubility in a developing solution is changed due to the action of an acid, it is preferred that the component (A1) described later generates an acid upon exposure, and is a polymer compound of which solubility in a developing solution is changed due to the action of an acid. Such a polymer compound is exemplified by a resin which has a constitutional unit for generating an acid upon exposure. Well-known monomers may be used as a monomer that leads to a constitutional unit that generates an acid upon exposure.

[Component (A)]

In the resist composition of the present embodiment, the component (A) is a base material component of which solubility in a developing solution is changed due to the action of an acid.

In the present embodiment, the term “base material component” indicates an organic compound capable of forming a film, and is preferably an organic compound having a molecular weight of 500 or greater. In a case where the organic compound has a molecular weight of 500 or greater, the film-forming ability is improved, and a resist pattern at a nano level can be easily formed.

The organic compound used as the base material component is broadly classified into non-polymers and polymers.

In general, as a non-polymer, any of those which have a molecular weight in the range of 500 or greater and less than 4,000 is used. Hereinafter, a “low molecular weight compound” indicates a non-polymer having a molecular weight in the range of 500 or greater and less than 4,000.

As a polymer, any of those which have a molecular weight of 1,000 or greater is generally used. Hereinafter, a “resin”, “polymer compound” or “polymer” indicates a polymer having a molecular weight of 1,000 or greater.

As the molecular weight of the polymer, the weight average molecular weight in terms of the polystyrene equivalent value determined by gel permeation chromatography (GPC) is used.

In a case where the resist composition of the present embodiment is a “negative-tone resist composition for an alkali developing process” which forms a negative-tone resist pattern in an alkali developing process, or alternatively, in a case where it is a “positive-tone resist composition for a solvent developing process” which forms a positive-tone resist pattern in a solvent developing process, the component (A) is preferably a base material component (A-2) (hereinafter referred to as a “component (A-2)”), which is soluble in an alkaline developing solution. A crosslinking agent component is further blended thereto. In the resist composition, for example, when an acid is generated from the component (B) upon exposure, the acid acts to cause crosslinking between the component (A-2) and the crosslinking agent component. Consequently, the solubility in the alkali developing solution is decreased (the solubility in the organic developing solution is increased).

Therefore, in a case where a resist film obtained by coating the resist composition on a support is selectively exposed at the time of forming a resist pattern, the exposed portions of the resist film are poorly soluble in the alkali developing solution (but easily soluble in the organic developing solution). On the other hand, the unexposed portions of the resist film remain as being soluble in the alkali developing solution (poorly soluble in the organic developing solution). Accordingly, the negative-tone resist pattern is formed by developing with the alkali developing solution. Alternatively, the positive-tone resist pattern is formed by developing with the organic developing solution.

A preferred component (A-2) is a resin soluble in the alkali developing solution (hereinafter referred to as an “alkali-soluble resin”).

Preferred examples of the alkali-soluble resin include a resin having a constitutional unit derived from at least one selected from alkyl ester of α-(hydroxyalkyl) acrylic acid or α-(hydroxyalkyl) acrylic acid (preferably having 1 to 5 carbon atoms), which is disclosed in Japanese Unexamined Patent Application, First Publication No. 2000-206694; an acrylic resin or a polycycloolefin resin disclosed in U.S. Pat. No. 6,949,325, in which a hydrogen atom bonded to a carbon atom at the α-position having a sulfonamide group may be optionally substituted with a substituent; an acrylic resin containing fluorinated alcohol, in which a hydrogen atom bonded to a carbon atom at the α-position may be optionally substituted with a substituent, which is disclosed in U.S. Pat. No. 6,949,325, Japanese Unexamined Patent Application, First Publication No. 2005-336452 and Japanese Unexamined Patent Application, First Publication No. 2006-317803; a polycycloolefin resin having fluorinated alcohol, which is disclosed in, for example, Japanese Unexamined Patent Application, First Publication No. 2006-259582, since these resins can form a resist pattern with minimal swelling.

The α-(hydroxyalkyl) acrylic acid refers to either or both of acrylic acid in which a hydrogen atom is bonded to a carbon atom at the α-position to which a carboxy group is bonded, and α-hydroxyalkyl acrylic acid in which a hydroxyalkyl group (preferably a hydroxyalkyl group having 1 to 5 carbon atoms) is bonded to the carbon atom at this α-position, among the acrylic acids in which the hydrogen atom bonded to the carbon atom at the α-position may be optionally substituted with a substituent.

As the crosslinking agent component, for example, it is preferable to use an amino-based crosslinking agent such as glycoluril having a methylol group or an alkoxymethyl group, or a melamine-based crosslinking agent, since a good resist pattern with little swelling is easily formed. The blending amount of the crosslinking agent component is preferably 1 to 50 parts by mass based on 100 parts by mass of the alkali-soluble resin.

In a case where the resist composition of the present embodiment is a “positive-tone resist composition for an alkali developing process” which forms a positive-tone resist pattern in an alkali developing process, or alternatively, in a case where it is a “negative-tone resist composition for a solvent developing process” which forms a negative-tone resist pattern in a solvent developing process, the component (A) is preferably a base material component (A-1) (hereinafter referred to as a “component (A-1)”), of which polarity is increased due to the action of an acid. By using the component (A-1), the polarity of the base material component changes before and after exposure, so that good development contrast can be obtained not only in the alkali developing process but also in the solvent developing process.

In a case where the alkali developing process is applied, the component (A-1) is poorly soluble in the alkali developing solution before exposure. For example, in a case where an acid is generated from the component (B) upon exposure, the acid acts to cause that the polarity is increased to increase the solubility in the alkali developing solution. Therefore, when the resist film obtained by coating the resist composition on a support is selectively exposed at the time of forming a resist pattern, the exposed portions of the resist film shift from being poorly soluble to soluble in the alkali developing solution. On the other hand, the unexposed portions of the resist film remain as being poorly soluble in alkali, thus the positive-tone resist pattern is formed by alkali development.

Meanwhile, in a case where the solvent developing process is applied, the component (A-1) has high solubility in an organic developing solution before exposure. In a case where when an acid is generated from the component (B) upon exposure, the polarity is increased due to the action of the acid, and the solubility in the organic developing solution is decreased. Therefore, in a case where a resist film obtained by coating the resist composition on a support is selectively exposed at the time of forming a resist pattern, the exposed portions of the resist film shift from being soluble to being poorly soluble in the organic developing solution. On the other hand, the unexposed portions of the resist film remain as being soluble, thus the development can be carried out with the organic developing solution to provide contrast between the exposed portions and the unexposed portions, thereby forming the negative-tone resist pattern.

In the resist composition of the present embodiment, the component (A) may be used alone or in combination of two or more.

In the resist composition of the present embodiment, the component (A) is preferably the component (A-1). That is, the resist composition of the present embodiment is preferably the “positive-tone resist composition for an alkali developing process”, which forms the positive-tone resist pattern in the alkali developing process, or alternatively, the “negative-tone resist composition for a solvent developing process” which forms the negative-tone resist pattern in the solvent developing process. As the component (A), at least one of a polymer compound and a low molecular weight compound can be used.

In a case where the component (A) is the component (A-1), it is preferable that the component (A-1) contains a resin component (A1) (hereinafter also referred to as a “component (A1)”).

Regarding Component (A1)

The component (A1) is a resin component, which preferably contains a polymer compound having a constitutional unit (a1) containing an acid decomposable group of which polarity is increased due to the action of an acid.

The component (A1) preferably further has a constitutional unit (a10) containing a hydroxystyrene skeleton, in addition to the constitutional unit (a1).

Furthermore, the component (A1) preferably further has a constitutional unit (a2) containing a lactone-containing cyclic group, a —SO₂-containing cyclic group or a carbonate-containing cyclic group, in addition to the constitutional unit (a1).

Furthermore, the component (A1) preferably further has a constitutional unit (a3) containing a polar group-containing aliphatic hydrocarbon group (here, a constitutional unit corresponding to the constitutional unit (a1) or (a2) is excluded), in addition to the constitutional unit (a1).

The component (A1) may have a constitutional unit other than the constitutional unit (a1), the constitutional unit (a2), the constitutional unit (a3), and the constitutional unit (a10).

<<Constitutional Unit (a1)>>

The constitutional unit (a1) is a constitutional unit containing an acid decomposable group of which polarity is increased due to the action of an acid.

The term “acid decomposable group” indicates a group having acid decomposability in which at least a part of a bond in the structure of the acid decomposable group can be cleaved due to the action of an acid.

Examples of the acid decomposable group of which polarity is increased due to the action of an acid include groups which are decomposed due to the action of an acid to generate a polar group.

Examples of the polar group include a carboxy group, a hydroxyl group, an amino group, a sulfo group (—SO₃H) and the like. Among these, a polar group containing —OH in a structure thereof (hereinafter, also referred to as an “OH-containing polar group”) is preferable, a carboxy group or a hydroxyl group is more preferable, and a carboxy group is particularly preferable.

More specific examples of the acid decomposable group include a group in which the above-described polar group has been protected with an acid dissociable group (such as a group in which a hydrogen atom of the OH-containing polar group has been protected with an acid dissociable group).

Here, the “acid dissociable group” indicates both (i) group having acid dissociability in which a bond between the acid dissociable group and an atom adjacent to the acid dissociable group can be cleaved due to the action of an acid; and (ii) group in which some bonds are cleaved due to the action of an acid, and then a decarboxylation reaction occurs, thereby cleaving the bond between the acid dissociable group and the atom adjacent to the acid dissociable group.

It is necessary that the acid dissociable group that constitutes the acid decomposable group is a group which exhibits a lower polarity than the polar group generated by the dissociation of the acid dissociable group. Thus, in a case where the acid dissociable group is dissociated due to the action of an acid, a polar group exhibiting a higher polarity than that of the acid dissociable group is generated, thereby increasing the polarity. As a result, the polarity of the entire component (A1) is increased. By the increase in the polarity, relatively, the solubility in a developing solution changes, and the solubility in an alkali developing solution is increased, whereas the solubility in an organic developing solution is decreased.

Examples of the acid dissociable group are the same as those which have been proposed as acid dissociable groups for the base resin for a chemically amplified resist composition.

Specific examples of acid dissociable groups for the base resin for a conventional chemically amplified resist composition include an “acetal type acid dissociable group”, a “tertiary alkyl ester type acid dissociable group”, and a “tertiary alkyloxycarbonyl acid dissociable group” described below.

Acetal Type Acid Dissociable Group:

Examples of the acid dissociable group for protecting a carboxy group or a hydroxyl group as a polar group include the acid dissociable group represented by Formula (a1-r-1) shown below (hereinafter, also referred to as “acetal type acid dissociable group”).

[In the formula, Ra′¹ and Ra′² each represent a hydrogen atom or an alkyl group, and Ra′³ represents a hydrocarbon group, provided that Ra′³ may be bonded to Ra′¹ or Ra′² to form a ring.]

In Formula (a1-r-1), it is preferable that at least one of Ra′¹ and Ra′² represents a hydrogen atom and more preferable that both of Ra′¹ and Ra′² represent a hydrogen atom.

In a case where Ra′¹ or Ra′² represents an alkyl group, examples of the alkyl group include the same alkyl groups exemplified as the substituent which may be bonded to the carbon atom at the α-position in the description on α-substituted acrylic acid ester. Among these, an alkyl group having 1 to 5 carbon atoms is preferable. More specific examples thereof include linear or branched alkyl groups. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, a neopentyl group and the like. Among these, a methyl group or an ethyl group is more preferable, and a methyl group is particularly preferable.

In Formula (a1-r-1), examples of the hydrocarbon group as Ra′³ include a linear or branched alkyl group and a cyclic hydrocarbon group.

The linear alkyl group has preferably 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and still more preferably 1 or 2 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and an n-pentyl group. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.

The branched alkyl group has preferably 3 to 10 carbon atoms and more preferably 3 to 5 carbon atoms. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group, a 1,1-diethylpropyl group, a 2,2-dimethylbutyl group and the like. Among these, an isopropyl group is preferable.

In a case where Ra′³ represents a cyclic hydrocarbon group, the cyclic hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be polycyclic or monocyclic.

As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.

As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable. The polycycloalkane has preferably 7 to 12 carbon atoms, and specific examples thereof include adamantane, norbornane, isobomane, tricyclodecane, tetracyclododecane and the like.

In a case where the cyclic hydrocarbon group as Ra′³ becomes an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.

The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having (4n+2) π electrons, and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms.

Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocyclic rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic heterocyclic ring include a pyridine ring and a thiophene ring.

Specific examples of the aromatic hydrocarbon group as Ra′³ include a group in which one hydrogen atom has been removed from the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring (an aryl group or a heteroaryl group); a group in which one hydrogen atom has been removed from an aromatic compound having two or more aromatic rings (biphenyl, fluorene or the like); and a group in which one hydrogen atom of the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring has been substituted with an alkylene group (an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, a 2-naphthylethyl group or the like). The alkylene group which is bonded to the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

The cyclic hydrocarbon group as Ra′³ may have a substituent. Examples of the substituent include —R^(P1), —R^(P2)—O—R^(P1), —R^(P2)—CO—R^(P1), —R^(P2)—CO—OR^(P1), —R^(P2)—O—CO—R^(P1), —R^(P2)—OH, —R^(P2)—CN, and —R^(P2)—COOH (hereinafter, these substituents are also collectively referred to as “Ra⁰⁵”).

Here, R^(P1) represents a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Further, R^(P2) represents a single bond, a chain-like divalent saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms.

Here, some or all hydrogen atoms in the chain-like saturated hydrocarbon group, the aliphatic cyclic saturated hydrocarbon group, and the aromatic hydrocarbon group as R^(P1) and R^(P2) may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of one kind of substituents or one or more of each of plural kinds of the substituents.

Examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group and the like.

Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, a cyclododecyl group or the like; and a polycyclic aliphatic saturated hydrocarbon group such as a bicyclo[2.2.2]octanyl group, a tricyclo[5.2.1.02,6]decanyl group, a tricyclo[3.3.1.13,7]decanyl group, a tetracyclo[6.2.1.13,6.02,7] dodecanyl group, an adamantyl group or the like.

Examples of the monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms include a group formed by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, biphenyl, fluorene, naphthalene, anthracene, or phenanthrene.

In a case where Ra′³ is bonded to Ra′¹ or Ra′² to form a ring, the cyclic group is preferably a 4- to 7-membered ring, and more preferably a 4- to 6-membered ring. Specific examples of the cyclic group include a tetrahydropyranyl group and a tetrahydrofuranyl group.

Tertiary Alkyl Ester Type Acid Dissociable Group:

Examples of the acid dissociable group for protecting the carboxy group as a polar group include the acid dissociable group represented by Formula (a1-r-2) shown below.

Among the acid dissociable groups represented by Formula (a1-r-2), for convenience, a group which is constituted of alkyl groups is referred to as “tertiary alkyl ester type acid dissociable group”.

[In the formula, Ra′⁴ to Ra′⁶ each independently represents a hydrocarbon group, provided that Ra′⁵ and Ra′⁶ may be bonded to each other to form a ring.]

Examples of the hydrocarbon group as Ra′⁴ include a linear or branched alkyl group, a chain-like or cyclic alkenyl group, and a cyclic hydrocarbon group.

Examples of the linear or branched alkyl group and the cyclic hydrocarbon group (an aliphatic hydrocarbon group which is a monocyclic group, an aliphatic hydrocarbon group which is a polycyclic group, or an aromatic hydrocarbon group) as Ra′⁴ are the same as those exemplified above as Ra′³.

As the chain-like or cyclic alkenyl group as Ra′⁴, an alkenyl group having 2 to 10 carbon atoms is preferable.

Examples of the hydrocarbon group as Ra′⁵ or Ra′⁶ are the same as those exemplified above as Ra′³.

In a case where Ra′⁵ and Ra′⁶ are bonded to form a ring, suitable examples thereof include a group represented by Formula (a1-r2-1), a group represented by Formula (a1-r2-2), and a group represented by Formula (a1-r2-3).

Meanwhile, Ra′⁴ to Ra′⁶ are not bonded to one another and represent an independent hydrocarbon group, suitable examples thereof include a group represented by Formula (a1-r2-4).

[In Formula (a1-r2-1), Ra′¹⁰ represents an alkyl group having 1 to 10 carbon atoms, or a group represented by the following Formula (a1-r2-r1). Ra′¹¹ represents a group that forms an aliphatic cyclic group together with the carbon atom to which Ra′¹⁰ is bonded. In Formula (a1-r2-2), Ya represents a carbon atom. Xa represents a group that forms a cyclic hydrocarbon group together with Ya. Some or all hydrogen atoms in this cyclic hydrocarbon group may be substituted. Ra⁰¹ to Ra⁰³ each independently represents a hydrogen atom, a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all hydrogen atoms in this cyclic saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group may be substituted. Two or more of Rα⁰¹ to Ra⁰³ may be bonded to one another to form a cyclic structure. In Formula (a1-r2-3), Yaa represents a carbon atom. Xaa represents a group that forms an aliphatic cyclic group together with Yaa. Ra⁰⁴ represents an aromatic hydrocarbon group which may have a substituent. In Formula (a1-r2-4), Ra′¹² and Ra′¹³ each independently represents a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Some or all hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted. Ra′¹⁴ represents a hydrocarbon group which may have a substituent. The symbol “*” represents a bonding site (the same applies hereinafter).]

[In the formula, Ya⁰ represents a quaternary carbon atom. Ra⁰³¹, Ra⁰³², and Ra⁰³³ each independently represents a hydrocarbon group which may have a substituent, provided that one or more of Ra⁰³¹, Ra⁰³², and Ra⁰³³ are hydrocarbon groups having at least one polar group.]

In Formula (a1-r2-1), as the alkyl group having 1 to 10 carbon atoms as Ra′¹⁰, a group exemplified as the linear or branched alkyl group represented by Ra′³ in Formula (a1-r-1) is preferable. It is preferable that Ra′¹⁰ represents an alkyl group having 1 to 5 carbon atoms.

In Formula (a1-r2-r1), Ya⁰ represents a quaternary carbon atom. That is, there are four adjacent carbon atoms bonded to Ya⁰ (carbon atom).

In Formula (a1-r2-r1), Ra⁰³¹, Ra⁰³², and Ra⁰³³ each independently represents a hydrocarbon group which may have a substituent. The hydrocarbon groups in Ra⁰³¹, Ra⁰³², and Ra⁰³³ each independently represents a linear or branched alkyl group, a chain-like or cyclic alkenyl group, or a cyclic hydrocarbon group.

The number of carbon atoms of the linear alkyl group as Ra⁰³¹, Ra⁰³², and Ra⁰³³ is preferably in a range of 1 to 5, more preferably in a range of 1 to 4, and still more preferably 1 or 2. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group and the like. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.

The number of carbon atoms of the branched alkyl group as Ra⁰³¹, Ra⁰³², and Ra⁰³³ is preferably in a range of 3 to 10, and more preferably in a range of 3 to 5. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group a 1,1-diethylpropyl group, and a 2,2-dimethylbutyl group. Among these, an isopropyl group is preferable.

As the chain-like or cyclic alkenyl group as Ra⁰³¹, Ra⁰³², and Ra⁰³³, an alkenyl group having 2 to 10 carbon atoms is preferable.

In a case where the cyclic hydrocarbon group as Ra⁰³¹, Ra⁰³², and Ra⁰³³ may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be polycyclic or monocyclic.

As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.

As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable, and the polycyclic group has preferably 7 to 12 carbon atoms, and specific examples of the polycycloalkane include adamantane, norbornane, isobomane, tricyclodecane, and tetracyclododecane.

The aromatic hydrocarbon group as Ra⁰³¹, Ra⁰³², or Ra⁰³³ is a hydrocarbon group having at least one aromatic ring. The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having (4n+2) π electrons, and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocyclic rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom and a nitrogen atom. Specific examples of the aromatic heterocyclic ring include a pyridine ring and a thiophene ring. Specific examples of the aromatic hydrocarbon group include a group in which one hydrogen atom has been removed from the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring (an aryl group or a heteroaryl group); a group in which one hydrogen atom has been removed from an aromatic compound having two or more aromatic rings (for example, biphenyl, fluorene or the like); and a group in which one hydrogen atom of the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring has been substituted with an alkylene group (an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, a 2-naphthylethyl group or the like). The alkylene group which is bonded to the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

In a case where the hydrocarbon group represented by Ra⁰³¹, Ra⁰³², and Ra⁰³³ is substituted, examples of substituent include a hydroxy group, a carboxy group, a halogen atom (such as a fluorine atom, a chlorine atom, or a bromine atom), an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group), an alkyloxycarbonyl group and the like.

Among these, the optionally substituted hydrocarbon group as Ra⁰³¹, Ra⁰³², and Ra⁰³³ is preferably a linear or branched alkyl group which may have a substituent. A linear alkyl group is more preferred.

Provided that, one or more of Ra⁰³¹, Ra⁰³², and Ra⁰³³ are hydrocarbon groups having at least a polar group.

The “hydrocarbon group having a polar group” means that a methylene group (—CH₂—) constituting the hydrocarbon group is substituted with a polar group, or at least one hydrogen atom constituting the hydrocarbon group is substituted with a polar group.

As the “hydrocarbon group having a polar group”, a functional group represented by the following Formula (a1-p1) is preferable.

*Ra⁰⁷-Ra⁰⁸_(n) _(p0) Ra⁰⁶   (a1-p1)

[In the formula, Ra⁰⁷ represents a divalent hydrocarbon group having 2 to 12 carbon atoms. Ra⁰⁸ represents a divalent linking group having a hetero atom. Ra⁰⁶ represents a monovalent hydrocarbon group having 1 to 12 carbon atoms.

n_(p0) represents an integer of 1 to 6.]

In Formula (a1-p1), Ra⁰⁷ represents a divalent hydrocarbon group having 2 to 12 carbon atoms.

The number of carbon atoms of Ra⁰⁷ is in a range of 2 to 12, preferably in a range of 2 to 8, more preferably in a range of 2 to 6, still more preferably in a range of 2 to 4, and particularly preferably 2.

The hydrocarbon group as Ra⁰⁷ is preferably a chain-like or cyclic aliphatic hydrocarbon group, and more preferably a chain-like hydrocarbon group.

Examples of Ra⁰⁷ include a linear alkanediyl group such as an ethylene group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, a heptane-1,7-diyl group, an octane-1,8-diyl group, a nonane-1,9-diyl group, a decane-1,10-diyl group, a undecane-1,11-diyl group, a dodecane-1,12-diyl group or the like; a branched alkanediyl group such as a propane-1,2-diyl group, an 1-methylbutane-1,3-diyl group, a 2-methylpropane-1,3-diyl group, a pentane-1,4-diyl group, a 2-methylbutane-1,4-diyl group or the like; a cycloalkanediyl group such as a cyclobutane-1,3-diyl group, a cyclopentane-1,3-diyl group, a cyclohexane-1,4-diyl group, a cyclooctane-1,5-diyl group or the like; a polycyclic divalent alicyclic hydrocarbon group such as a norbomane-1,4-diyl group, a norbomane-2,5-diyl group, an adamantane-1,5-diyl group, an adamantane-2,6-diyl group or the like; and the like.

Among these, an alkanediyl group is preferable, and a linear alkanediyl group is more preferable.

In Formula (a1-p1), Ra⁰⁸ represents a divalent linking group having a hetero atom.

Examples of Ra⁰⁸ includes —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)—, wherein H may be substituted with a substituent such as an alkyl group or an acyl group, —S—, —S(═O)₂—, —S(═O)₂—O— and the like. Among these, —O—, —C(═O)—O—, —C(═O)—, and —O—C(═O)—O— are preferable from the viewpoint of solubility in a developing solution, —O— and —C(═O)— are particularly preferable.

In Formula (a1-p1), Ra⁰⁶ represents a monovalent hydrocarbon group having 1 to 12 carbon atoms.

The number of carbon atoms of Ra⁰⁶ is in a range of 1 to 12, preferably in a range of 1 to 8, more preferably in a range of 1 to 5, and still more preferably in a range of 1 to 3, particularly preferable 1 or 2, and most preferably 1, from the viewpoint of solubility in a developing solution.

The hydrocarbon group as Ra⁰⁶ includes a chain-like hydrocarbon group or a cyclic hydrocarbon group, or a hydrocarbon group obtained by combining chain-like and cyclic groups.

Examples of the chain-like hydrocarbon group, include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, 2-ethylhexyl group, an n-octyl group, an n-nonyl group, an n-decyl group, an n-undecyl group, an n-dodecyl group and the like.

The cyclic hydrocarbon group may be an alicyclic hydrocarbon group or an aromatic hydrocarbon group.

The alicyclic hydrocarbon group may be monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, a dimethylcyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclononyl group, a cyclodecyl group and the like. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a 2-alkyladamantan-2-yl group, an 1-(adamantan-1-yl) alkane-1-yl group, a norbomyl group, a methyl norbomyl group, an isobornyl group and the like.

Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, anthryl group, a p-methylphenyl group, a p-tert-butylphenyl group, a p-adamantylphenyl group, a tolyl group, a xylyl group, a cumenyl group, a mesityl group, a biphenyl group, a phenanthryl group, a 2,6-diethylphenyl group, a 2-methyl-6-ethylphenyl group and the like.

As Ra⁰⁶, a chain-like hydrocarbon group is preferable, an alkyl group is more preferable, and a linear alkyl group is still more preferable, from the viewpoint of solubility in a developing solution.

In Formula (a1-p1), n_(p0) represents an integer of 1 to 6, preferably an integer of 1 to 3, more preferably 1 or 2, and still more preferably 1.

Hereinafter, the specific examples of the hydrocarbon group having at least a polar group are shown.

In the following formulae, * indicates a bond bonded to a quaternary carbon atom (Ya⁰).

One or more of Ra⁰³¹, Ra⁰³² and Ra⁰³³ are hydrocarbon groups having at least a polar group in Formula (a1-r2-r1). However, it can be appropriately determined with consideration of the solubility in a developing solution at the time of forming a resist pattern. For example, it is preferable that one or two of Ra⁰³¹, Ra⁰³² and Ra⁰³³ are hydrocarbon groups having at least a polar group, and particularly preferable that one of Ra⁰³¹, Ra⁰³² and Ra⁰³³ is a hydrocarbon group having at least a polar group.

The hydrocarbon group having at least a polar group may have a substituent other than the polar group.

Examples of the substituent include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom and the like), a halogenated alkyl group having 1 to 5 carbon atoms, and the like.

In Formula (a1-r2-1), as Ra′¹¹ (the aliphatic cyclic group formed together with the carbon atom to which Ra′¹⁰ is bonded), a group exemplified as the aliphatic hydrocarbon group which is a monocyclic group or a polycyclic group as Ra′³ in Formula (a1-r-1) is preferable.

In Formula (a1-r2-2), as the cyclic hydrocarbon group that is formed by Xa together with Ya, a group formed by further removing one or more hydrogen atoms from the cyclic monovalent hydrocarbon group (such as an aliphatic hydrocarbon group) as Ra′³ in Formula (a1-r-1) is exemplified.

The cyclic hydrocarbon group that is formed by Xa together with Ya may have a substituent. Examples of the substituent are the same as those exemplified as the substituents which may be included in the cyclic hydrocarbon group as Ra′³.

In Formula (a1-r2-2), examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Ra⁰¹ to Ra⁰³ include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group.

Examples of the monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms as Ra⁰¹ to Ra⁰³ include a monocyclic aliphatic saturated hydrocarbon group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, a cyclododecyl group or the like; and a polycyclic aliphatic saturated hydrocarbon group such as a bicycle[2.2.2]octanyl group, a tricycle[5.2.1.02,6]decanyl group, a tricycle[3.3.1.13,7]decanyl group, a tetracyclo[6.2.1.13,6.02,7]dodecanyl group, an adamantyl group or the like.

From the viewpoint of easily synthesizing a monomer compound from which the constitutional unit (a1) is derived, it is preferable that Ra⁰¹ to Ra⁰³ represents a hydrogen atom or a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms. Among these, a hydrogen atom, a methyl group, or an ethyl group is more preferable, and a hydrogen atom is particularly preferable.

Examples of the substituent included in the chain-like saturated hydrocarbon group or the aliphatic cyclic saturated hydrocarbon group represented by Ra⁰¹ to Ra⁰³ are the same as those exemplified as Ra⁰⁵.

Examples of the group having a carbon-carbon double bond generated by two or more of Ra⁰¹ to Ra⁰³ being bonded to one another to form a cyclic structure include a cyclopentenyl group, a cyclohexenyl group, a methylcyclopentenyl group, a methylcyclohexenyl group, a cyclopentylidenethenyl group, a cyclohexylidenethenyl group and the like. Among these, from the viewpoint of easily synthesizing a monomer compound from which the constitutional unit (a1) is derived, a cyclopentenyl group, a cyclohexenyl group, or a cyclopentylidenethenyl group is preferable.

In Formula (a1-r2-3), as the aliphatic cyclic group that is formed by Xaa together with Yaa, a group exemplified as the aliphatic hydrocarbon group which is a monocyclic or polycyclic group as Ra′³ in Formula (a1-r-1) is preferable.

In Formula (a1-r2-3), examples of the aromatic hydrocarbon group as Ra⁰⁴ include a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 5 to 30 carbon atoms. Among the examples, Ra⁰⁴ represents preferably a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably a group formed by removing one or more hydrogen atoms from benzene, naphthalene, anthracene, or phenanthrene, still more preferably a group formed by removing one or more hydrogen atoms from benzene, naphthalene, or anthracene, particularly preferably a group formed by removing one or more hydrogen atoms from benzene or naphthalene, and most preferably a group formed by removing one or more hydrogen atoms from benzene.

Examples of the substituent which may be included in Ra⁰⁴ in Formula (a1-r2-3) include a methyl group, an ethyl group, a propyl group, a hydroxyl group, a carboxyl group, a halogen atom (such as a fluorine atom, a chlorine atom, a bromine atom or the like), an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, a butoxy group or the like), an alkyloxycarbonyl group, and the like.

In Formula (a1-r2-4), Ra′¹² and Ra′¹³ each independently represents a chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Examples of the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Ra′¹² and Ra′¹³ are the same as those exemplified as the chain-like monovalent saturated hydrocarbon group having 1 to 10 carbon atoms as Ra⁰¹ to Ra⁰³. Some or all hydrogen atoms in the chain-like saturated hydrocarbon group may be substituted.

Ra′¹² and Ra′¹³ represent preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, still more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

In a case where the chain-like saturated hydrocarbon group represented by Ra′¹² and Ra′¹³ is substituted, examples of the substituent are the same as those exemplified as Ra⁰⁵.

In Formula (a1-r2-4), Ra′¹⁴ represents a hydrocarbon group which may have a substituent. Examples of the hydrocarbon group as Ra′¹⁴ include a linear or branched alkyl group and a cyclic hydrocarbon group.

The number of carbon atoms of the linear alkyl group as Ra′¹⁴ is preferably in a range of 1 to 5, more preferably in a range of 1 to 4, and still more preferably 1 or 2. Specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group and the like. Among these, a methyl group, an ethyl group, or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.

The number of carbon atoms of the branched alkyl group as Ra′¹⁴ is preferably in a range of 3 to 10 and more preferably in a range of 3 to 5. Specific examples thereof include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a neopentyl group a 1,1-diethylpropyl group, a 2,2-dimethylbutyl group and the like. Among these, an isopropyl group is preferable.

In a case where Ra′¹⁴ represents a cyclic hydrocarbon group, the cyclic hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be polycyclic or monocyclic.

As the aliphatic hydrocarbon group which is a monocyclic group, a group in which one hydrogen atom has been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane, cyclohexane and the like.

As the aliphatic hydrocarbon group which is a polycyclic group, a group in which one hydrogen atom has been removed from a polycycloalkane is preferable. The polycylcoalkane has preferably 7 to 12 carbon atoms, and specific examples thereof include adamantane, norbornane, isobomane, tricyclodecane, tetracyclododecane, and the like.

Examples of the aromatic hydrocarbon group as Ra′¹⁴ are the same as those exemplified as the aromatic hydrocarbon group as Ra⁰⁴. Among these, Ra′¹⁴ represents preferably a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably a group formed by removing one or more hydrogen atoms from benzene, naphthalene, anthracene, or phenanthrene, still more preferably a group formed by removing one or more hydrogen atoms from benzene, naphthalene, or anthracene, particularly preferably a group formed by removing one or more hydrogen atoms from naphthalene or anthracene, and most preferably a group formed by removing one or more hydrogen atoms from naphthalene.

Examples of the substituent which may be included in Ra′¹⁴ are the same as those exemplified as the substituent which may be included in Ra⁰⁴.

In a case where Ra′¹⁴ in Formula (a1-r2-4) represents a naphthyl group, the position bonded to the tertiary carbon atom in Formula (a1-r2-4) may be the 1-position or the 2-position of the naphthyl group.

In a case where Ra′¹⁴ in Formula (a1-r2-4) represents an anthryl group, the position bonded to the tertiary carbon atom in Formula (a1-r2-4) may be the 1-position, the 2-position, or the 9-position of the anthryl group.

Specific examples of the group represented by Formula (a1-r2-1) are shown below.

Specific examples of the group represented by Formula (a1-r2-2) are shown below.

Specific examples of the group represented by Formula (a1-r2-3) are shown below.

Specific examples of the group represented by Formula (a1-r2-4) are shown below.

Tertiary Alkyloxycarbonyl Acid Dissociable Group

Examples of the acid dissociable group for protecting a hydroxyl group as a polar group include an acid dissociable group (hereinafter, for convenience, also referred to as a “tertiary alkyloxycarbonyl acid dissociable group”) represented by Formula (a1-r-3) shown below.

[In the formula, Ra′⁷ to Ra′⁹ each represent an alkyl group.]

In Formula (a1-r-3), Ra′⁷ to Ra′⁹ each represent preferably an alkyl group having 1 to 5 carbon atoms and more preferably an alkyl group having 1 to 3 carbon atoms.

Furthermore, the total number of carbon atoms in each alkyl group is preferably in a range of 3 to 7, more preferably in a range of 3 to 5, and most preferably 3 or 4.

Examples of the constitutional unit (a1) include a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent; a constitutional unit derived from acrylamide; a constitutional unit in which at least some hydrogen atoms in a hydroxyl group of a constitutional unit derived from hydroxystyrene or a hydroxystyrene derivative are protected by a substituent containing the acid decomposable group; and a constitutional unit in which at least some hydrogen atoms in —C(═O)—OH of a constitutional unit derived from vinylbenzoic acid or a vinylbenzoic acid derivative are protected by a substituent containing the acid decomposable group.

Among the examples, as the constitutional unit (a1), a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent is preferable.

Specific preferred examples of such a constitutional unit (a1) include constitutional units represented by Formula (a1-1) or (a1-2) shown below.

[In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va¹ represents a divalent hydrocarbon group which may contain an ether bond, n_(a1) represents an integer of 0 to 2, and Ra¹ represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-2). Wa¹ represents a (n_(a2)+1)-valent hydrocarbon group, n_(a2) represents an integer of 1 to 3, and R^(α2) represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-3)].

In Formula (a1-1), as the alkyl group having 1 to 5 carbon atoms as R, a linear or branched alkyl group having 1 to 5 carbon atoms is preferable, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group. The halogenated alkyl group having 1 to 5 carbon atoms is a group in which some or all hydrogen atoms of the alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atoms include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.

R represents preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms and most preferably a hydrogen atom or a methyl group from the viewpoint of industrial availability.

In Formula (a1-1), the divalent hydrocarbon group as Va¹ may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

The aliphatic hydrocarbon group as the divalent hydrocarbon group represented by Va¹ may be saturated or unsaturated. In general, the aliphatic hydrocarbon group is preferably saturated.

As specific examples of the aliphatic hydrocarbon group, a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group containing a ring in the structure thereof.

The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.

As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH₂—], an ethylene group [—(CH₂)₂—], a trimethylene group [—(CH₂)₃—], a tetramethylene group [—(CH₂)₄—], and a pentamethylene group [—(CH₂)₅—].

The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms.

As the branched aliphatic hydrocarbon group, a branched alkylene group is preferred, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)—, and —C(CH₂CH₃)₂—; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, —CH(CH₂CH₃)CH₂—, and —C(CH₂CH₃)₂—CH₂—; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂—, and —CH₂CH(CH₃)CH₂—; and alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂—, and —CH₂CH(CH₃)CH₂CH₂—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.

Examples of the aliphatic hydrocarbon group containing a ring in the structure thereof include an alicyclic hydrocarbon group (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the alicyclic hydrocarbon group is bonded to the terminal of the linear or branched aliphatic hydrocarbon group, and a group in which the alicyclic hydrocarbon group is interposed in the linear or branched aliphatic hydrocarbon group. The linear or branched aliphatic hydrocarbon group is the same as defined for the above-described linear aliphatic hydrocarbon group or the above-described branched aliphatic hydrocarbon group.

The alicyclic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.

The alicyclic hydrocarbon group may be monocyclic or polycyclic. As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable. The polycycloalkane has preferably 7 to 12 carbon atoms, and specific examples thereof the polycycloalkane include adamantane, norbornane, isobomane, tricyclodecane, and tetracyclododecane.

The aromatic hydrocarbon group as the divalent hydrocarbon group represented by Va¹ is a hydrocarbon group having an aromatic ring.

The aromatic hydrocarbon group has preferably 3 to 30 carbon atoms, more preferably 5 to 30 carbon atoms, still more preferably 5 to 20 carbon atoms, particularly preferably 6 to 15 carbon atoms, and most preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.

Specific examples of the aromatic ring contained in the aromatic hydrocarbon group include aromatic hydrocarbon rings such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene; and aromatic heterocyclic rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom, and a nitrogen atom.

Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring (an arylene group); and a group in which one hydrogen atom of a group (an aryl group) formed by removing one hydrogen atom from the aromatic hydrocarbon ring has been substituted with an alkylene group (a group formed by removing one more hydrogen atom from an aryl group in an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The alkylene group (an alkyl chain in the arylalkyl group) has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

In Formula (a1-1), Ra1 represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-2).

In Formula (a1-2), the (n_(a2)+1)-valent hydrocarbon group as Wa¹ may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity, and may be saturated or unsaturated, but is preferably saturated in general. Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, an aliphatic hydrocarbon group containing a ring in the structure thereof, and a combination of the linear or branched aliphatic hydrocarbon group and the aliphatic hydrocarbon group containing a ring in the structure thereof.

The valency of n_(a2)+1 is preferably divalent, trivalent or tetravalent, and divalent or trivalent is more preferable.

In Formula (a1-2), Ra² represents an acid dissociable group represented by Formula (a1-r-1) or (a1-r-3).

Specific examples of the constitutional unit represented by Formula (a1-1) are shown below. In the formulae shown below, R^(α) represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

Specific examples of the constitutional unit represented by Formula (a1-2) are shown below.

The constitutional unit (a1) in the component (A1) may be used alone or two or more kinds thereof.

As the constitutional unit (a1), the constitutional unit represented by Formula (a1-1) is more preferable since the characteristics (sensitivity, shape and the like) in lithography by electron beam or EUV are easily enhanced.

Among these, as the constitutional unit (a1), particularly preferred is one containing a constitutional unit represented by the following Formula (a1-1-1).

[In the formulae, Ra¹″ represents an acid dissociable group represented by Formula (a1-r2-1), (a1-r2-3) or (a1-r2-4).]

In Formula (a1-1-1), R, Va¹ and n_(a1) are the same as R, Va¹ and n_(a1) defined in Formula (a1-1).

The acid dissociable group represented by Formula (a1-r2-1), (a1-r2-3) or (a1-r2-4) is defined as described above.

The proportion of the constitutional unit (a1) in the component (A1) is preferably in a range of 5% to 80% by mole, more preferably in a range of 10% to 75% by mole, and still more preferably in a range of 30% to 70% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).

By setting the proportion of the constitutional unit (a1) to be greater than or equal to the lower limit, lithography characteristics such as sensitivity, resolution, or roughness can be improved. Further, by setting the proportion of the constitutional unit (a1) to be lower than or equal to the upper limit, the constitutional unit (a1) and other constitutional units can be balanced, and various lithography characteristics are enhanced.

<<Constitutional Unit (a10) Containing Hydroxystyrene Skeleton>>

It is preferable that the component (A1) further has a constitutional unit (a10) containing a hydroxystyrene skeleton, in addition to the constitutional unit (a1).

The constitutional unit (a10) is suitably, for example, a constitutional unit represented by the following Formula (a10-1).

[In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ya^(x1) represents a single bond or a divalent linking group. Wa^(x1) represents a (n_(ax1)+1)-valent aromatic hydrocarbon group. n_(ax1) represents an integer of 1 to 3.]

In Formula (a10-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms.

The alkyl group having 1 to 5 carbon atoms as R is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, and specific examples thereof include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group and the like.

The halogenated alkyl group having 1 to 5 carbon atoms as R is a group in which some or all hydrogen atoms of the above-described alkyl group having 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like, and a fluorine atom is particularly preferable.

R represents preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms and most preferably a hydrogen atom or a methyl group from the viewpoint of industrial availability.

In Formula (a10-1), Ya^(x1) represents a single bond or a divalent linking group.

Suitable examples of the divalent linking group as Ya^(x1) include a divalent hydrocarbon group which may have a substituent and a divalent linking group having hetero atoms.

Divalent Hydrocarbon Group which May have Substituent

In a case where Ya^(x1) represents a divalent hydrocarbon group which may have a substituent, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

Aliphatic Hydrocarbon Group as Ya^(x1):

The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated. In general, the aliphatic hydrocarbon group is preferably saturated.

Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group containing a ring in the structure thereof.

Linear or Branched Aliphatic Hydrocarbon Group

The linear aliphatic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms.

As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH₂—], an ethylene group [—(CH₂)₂—], a trimethylene group [—(CH₂)₃—], a tetramethylene group [—(CH₂)₄-] and a pentamethylene group [—(CH₂)₅—].

The branched aliphatic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms.

As the branched aliphatic hydrocarbon group, a branched alkylene group is preferred, and specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)—, and —C(CH₂CH₃)₂—; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, —CH(CH₂CH₃)CH₂—, and —C(CH₂CH₃)₂—CH₂—; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂—, and —CH₂CH(CH₃)CH₂—; and alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂—, and —CH₂CH(CH₃)CH₂CH₂—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.

The linear or branched aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include a fluorine atom, a fluorinated alkyl group having 1 to 5 carbon atoms which has been substituted with a fluorine atom, and a carbonyl group.

Aliphatic Hydrocarbon Group Containing Ring in Structure Thereof

Examples of the aliphatic hydrocarbon group containing a ring in the structure thereof include a cyclic aliphatic hydrocarbon group which may have a substituent containing a hetero atom in the ring structure thereof (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring), a group in which the cyclic aliphatic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the cyclic aliphatic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group. As the linear or branched aliphatic hydrocarbon group, the same groups as those described above can be used.

The cyclic aliphatic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.

The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable. Examples of the polycycloalkane include adamantane, norbornane, isobomane, tricyclodecane, and tetracyclododecane.

The cyclic aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and the like.

The alkyl group as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group, a tert-butyl group or the like is most preferable.

The alkoxy group as the substituent is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, a tert-butoxy group or the like, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as the substituent include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as the substituent include groups in which some or all hydrogen atoms in the above-described alkyl groups have been substituted with the above-described halogen atoms.

In the cyclic aliphatic hydrocarbon group, some carbon atoms constituting the ring structure thereof may be substituted with a substituent containing a hetero atom. As the substituent containing a hetero atom, —O—, —C(═O)—O—, —S—, —S(═O)₂—, or —S(═O)₂—O— is preferable.

Aromatic Hydrocarbon Group as Ya^(x1)

The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring.

The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having (4n+2) π electrons, and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocyclic rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic heterocyclic ring include a pyridine ring and a thiophene ring.

Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring (an arylene group or a heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (biphenyl, fluorene or the like); a group in which one hydrogen atom of a group (an aryl group or a heteroaryl group) obtained by removing one hydrogen atom from the above-described aromatic hydrocarbon ring or aromatic heterocyclic ring has been substituted with an alkylene group (a group in which one hydrogen atom has been further removed from the aryl group in the arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group), and the like. The alkylene group which is bonded to the above-described aryl group or heteroaryl group has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

With respect to the aromatic hydrocarbon group, the hydrogen atom in the aromatic hydrocarbon group may be substituted with a substituent. For example, the hydrogen atom bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, and a hydroxyl group.

The alkyl group as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is most preferable.

As the alkoxy group, the halogen atom, and the halogenated alkyl group as the substituents, the same groups as the above-described substituent groups for substituting a hydrogen atom in the cyclic aliphatic hydrocarbon group can be exemplified.

Divalent Linking Group Containing Hetero Atom

In a case where Ya^(x1) represents a divalent linking group containing a hetero atom, preferred examples of the linking group include —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)—, wherein CH may be substituted with a substituent such as an alkyl group, an acyl group, or the like, —S—, —S(═O)₂—, —S(═O)₂—O—, and a group represented by Formula: —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(═O)—O—, —C(═O)—O—Y²¹—, —[Y²¹—C(═O)—O]_(m″)—Y²²—, —Y²¹—O—C(═O)—Y²²— or —Y²¹—S(═O)₂—O—Y²²— [in the formulae, Y²¹ and Y²² each independently represents a divalent hydrocarbon group which may have a substituent, O represents an oxygen atom, and m″ represents an integer of 0 to 3].

In a case where the divalent linking group containing a hetero atom is —C(═O)—NH—, —C(═O)—NH—C(═O)—, —NH— or —NH—C(═NH)—, wherein H may be substituted with a substituent such as an alkyl group, an acyl group, or the like. The substituent (an alkyl group, an acyl group, or the like) has preferably 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and particularly preferably 1 to 5 carbon atoms.

In Formulae —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(═O)—O—, —C(═O)—O—Y²¹—, —[Y²¹—C(═O)—O]_(m″)—Y²²—, —Y²¹—O—C(═O)—Y²²— or —Y²¹—S(═O)₂—O—Y²²—, Y²¹ and Y²² each independently represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include the same groups as those described above as the “divalent hydrocarbon group which may have a substituent” in the explanation of the above-described divalent linking group.

As Y²¹, a linear aliphatic hydrocarbon group is preferable, a linear alkylene group is more preferable, a linear alkylene group having 1 to 5 carbon atoms is still more preferable, and a methylene group or an ethylene group is particularly preferable.

As Y²², a linear or branched aliphatic hydrocarbon group is preferable, and a methylene group, an ethylene group, or an alkylmethylene group is more preferable. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group.

In the group represented by Formula —[Y²¹—C(═O)—O]_(m″)—Y²²—, m″ represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1. In other words, it is particularly preferable that the group represented by Formula —[Y²¹—C(═O)—O]_(m″)—Y²²— is a group represented by Formula —Y²¹—C(═O)—O—Y²²—. Among these, a group represented by Formula —(CH₂)_(a′)—C(═O)—O—(CH₂)_(b′)— is preferable. In the formula, a′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1. b′ represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1.

As Ya^(x1), a single bond, an ester bond [—C(═O)—O—], an ether bond (—O—), —C(═O)—NH—, a linear or branched alkylene group, or a combination of these is preferable, and among these, a single bond is particularly preferable.

In Formula (a10-1), Wa^(x1) represents a (n_(ax1)+1)-valent aromatic hydrocarbon group.

Examples of the aromatic hydrocarbon group as Wa^(x1) include groups in which (n_(ax1)+1) hydrogen atoms have been removed from an aromatic ring. The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having (4n+2) π electrons, and may be monocyclic or polycyclic. The aromatic ring has preferably 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, still more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, phenanthrene and the like; and aromatic heterocyclic rings in which some carbon atoms constituting the above-described aromatic hydrocarbon rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom and a nitrogen atom. Specific examples of the aromatic heterocyclic ring include a pyridine ring, a thiophene ring, and the like.

In Formula (a10-1), n_(ax1) represents an integer of 1 to 3, preferably 1 or 2, and more preferably 1.

Specific examples of the constitutional unit represented by Formula (a10-1) are shown below.

In each formula, R^(α) represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

The constitutional unit (a10) included in the component (A1) may be used alone or two or more kinds thereof.

The proportion of the constitutional unit (a10) in the component (A1) is, for example, in a range of 0% to 80% by mole, preferably in a range of 10% to 80% by mole, more preferably in a range of 20% to 70% by mole, and particularly preferably in a range of 30% to 60% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).

By setting the proportion of the constitutional unit (a10) to be greater than or equal to the lower limit of the above-described preferable range, lithography characteristics such as sensitivity, resolution, or roughness can be improved. Further, by setting the proportion of the constitutional unit (a10) to be lower than or equal to the upper limit, the constitutional unit (a10) and other constitutional units can be balanced, and various lithography characteristics are enhanced.

<<Constitutional Unit (a2)>>

It is preferable that the component (A1) has a constitutional unit (a2) (here, a constitutional unit corresponding to the constitutional unit (a1) is excluded) containing a lactone-containing cyclic group, a —SO₂-containing cyclic group, or a carbonate-containing cyclic group, in addition to the constitutional unit (a1).

In a case where the component (A1) is used for forming a resist film, the lactone-containing cyclic group, the —SO₂-containing cyclic group, or the carbonate-containing cyclic group in the constitutional unit (a2) is effective for improving the adhesiveness of the resist film to the substrate. Additionally, as the constitutional unit (a2) is contained, for example, the acid diffusion length is appropriately adjusted, the adhesion of the resist film to the substrate is enhanced, or the solubility during development is appropriately adjusted. Therefore, the lithography characteristics are enhanced.

The term “lactone-containing cyclic group” indicates a cyclic group that contains a ring (lactone ring) containing a —O—C(═O)— in the ring structure. In a case where the lactone ring is counted as the first ring and the group contains only the lactone ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The lactone-containing cyclic group may be a monocyclic group or a polycyclic group.

The lactone-containing cyclic group for the constitutional unit (a2) is not particularly limited, and an optional constitutional unit may be used. Specific examples thereof include groups represented by Formulae (a2-r-1) to (a2-r-7) shown below.

[In the formulae, each Ra′²¹ independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group; and R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO₂-containing cyclic group; A″ represents an oxygen atom (—O—), a sulfur atom (—S—) or an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; n′ represents an integer of 0 to 2; and m′ represents 0 or 1.]

In Formulae (a2-r-1) to (a2-r-7), the alkyl group as Ra′²¹ is preferably an alkyl group having 1 to 6 carbon atoms. Further, the alkyl group is preferably a linear alkyl group or a branched alkyl group. Specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, a neopentyl group, a hexyl group and the like. Among these, a methyl group or ethyl group is preferable, and a methyl group is particularly preferable.

The alkoxy group as Ra′²¹ is preferably an alkoxy group having 1 to 6 carbon atoms.

Further, the alkoxy group is preferably a linear alkoxy group or a branched alkoxy group. Specific examples of the alkoxy groups include a group formed by linking the above-described alkyl group as Ra′²¹ to an oxygen atom (—O—).

Examples of the halogen atom as Ra′²¹ include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable.

Examples of the halogenated alkyl group as Ra′²¹ include groups in which some or all hydrogen atoms in the above-described alkyl group as Ra′²¹ have been substituted with the above-described halogen atoms. As the halogenated alkyl group, a fluorinated alkyl group is preferable, and a perfluoroalkyl group is particularly preferable.

In —COOR″ and —OC(═O)R″ as Ra′²¹, R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO₂-containing cyclic group.

The alkyl group as R″ may be linear, branched, or cyclic, and preferably has 1 to 15 carbon atoms.

In a case where R″ represents a linear or branched alkyl group, it is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, and particularly preferably a methyl group or an ethyl group.

In a case where R″ represents a cyclic alkyl group, the number of carbon atoms thereof is preferably in a range of 3 to 15, more preferably in a range of 4 to 12, and most preferably in a range of 5 to 10. Specific examples thereof include groups in which one or more hydrogen atoms have been removed from a monocycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as bicycloalkane, tricycloalkane, or tetracycloalkane. More specific examples thereof include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbomane, isobomane, tricyclodecane, or tetracyclododecane; and the like.

Examples of the lactone-containing cyclic group as R″ include those exemplified as the groups represented by Formulae (a2-r-1) to (a2-r-7).

The carbonate-containing cyclic group as R″ has the same definition as that for the carbonate-containing cyclic group described below. Specific examples of the carbonate-containing cyclic group include groups represented by Formulae (ax3-r-1) to (ax3-r-3).

The —SO₂-containing cyclic group as R″ has the same definition as that for the —SO₂-containing cyclic group described below. Specific examples of the —SO₂-containing cyclic group include groups represented by Formulae (a5-r-1) to (a5-r-4).

The hydroxyalkyl group as Ra′²¹ has preferably 1 to 6 carbon atoms, and specific examples thereof include a group in which at least one hydrogen atom in the alkyl group as Ra′²¹ has been substituted with a hydroxyl group.

In Formulae (a2-r-2), (a2-r-3) and (a2-r-5), as the alkylene group having 1 to 5 carbon atoms as A″, a linear or branched alkylene group is preferable, and examples thereof include a methylene group, an ethylene group, an n-propylene group, an isopropylene group and the like. Specific examples of alkylene groups that contain an oxygen atom or a sulfur atom include groups in which —O— or —S— is interposed in the terminal of the alkylene group or between the carbon atoms of the alkylene group, and examples thereof include —O—CH₂—, —CH₂—O—CH₂—, —S—CH₂—, and —CH₂—S—CH₂—. As A″, an alkylene group having 1 to 5 carbon atoms or —O— is preferable, an alkylene group having 1 to 5 carbon atoms is more preferable, and a methylene group is most preferable.

Specific examples of the groups represented by Formulae (a2-r-1) to (a2-r-7) are shown below.

The “—SO₂-containing cyclic group” indicates a cyclic group having a ring containing —SO₂— in the ring structure thereof. Specifically, the —SO₂-containing cyclic group is a cyclic group in which the sulfur atom (S) in —SO₂— forms a part of the ring skeleton of the cyclic group. In a case where the ring containing —SO₂— in the ring skeleton thereof is counted as the first ring and the group contains only the ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The —SO₂-containing cyclic group may be a monocyclic group or a polycyclic group.

As the —SO₂-containing cyclic group, a cyclic group containing —O—SO₂— in the ring skeleton thereof, in other words, a cyclic group containing a sultone ring in which —O—S— in the —O—SO₂— group forms a part of the ring skeleton thereof is particularly preferable.

More specific examples of the —SO₂-containing cyclic group include groups represented by Formulae (a5-r-1) to (a5-r-4) shown below.

[In the formulae, each Ra′⁵¹ independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group. R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO₂-containing cyclic group. A″ represents an oxygen atom, a sulfur atom or an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom. n′ represents an integer of 0 to 2.]

In Formulae (a5-r-1) and (a5-r-2), A″ has the same definition as that for A″ in Formulae (a2-r-2), (a2-r-3) and (a2-r-5).

Examples of the alkyl group, the alkoxy group, the halogen atom, the halogenated alkyl group, —COOR″, —OC(═O)R″, and the hydroxyalkyl group as Ra′⁵¹ include the same groups as those described above in the explanation of Ra′²¹ in Formulae (a2-r-1) to (a2-r-7).

Specific examples of the groups represented by Formulae (a5-r-1) to (a5-r-4) are shown below. In the formulae shown below, “Ac” represents an acetyl group.

The “carbonate-containing cyclic group” indicates a cyclic group having a ring (a carbonate ring) containing —O—C(═O)—O— in the ring structure thereof. In a case where the carbonate ring is counted as the first ring and the group contains only the carbonate ring, the group is referred to as a monocyclic group. Further, in a case where the group has other ring structures, the group is referred to as a polycyclic group regardless of the structures. The carbonate-containing cyclic group may be a monocyclic group or a polycyclic group.

The carbonate ring-containing cyclic group is not particularly limited, and an optional group may be used. Specific examples thereof include groups represented by Formulae (ax3-r-1) to (ax3-r-3) shown below.

[In the formulae, each Ra′^(x31) independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group. R″ represents a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO₂-containing cyclic group. A″ represents an oxygen atom, a sulfur atom or an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom. p′ represents an integer of 0 to 3, and q′ represents 0 or 1.]

In Formulae (ax3-r-2) and (ax3-r-3), A″ has the same definition as that for A″ in Formulae (a2-r-2), (a2-r-3) and (a2-r-5).

Examples of the alkyl group, the alkoxy group, the halogen atom, the halogenated alkyl group, —COOR″, —OC(═O)R″, and the hydroxyalkyl group as Ra′³¹ include the same groups as those described above in the explanation of Ra′²¹ in Formulae (a2-r-1) to (a2-r-7).

Specific examples of the groups represented by Formulae (ax3-r-1) to (ax3-r-3) are shown below.

As the constitutional unit (a2), a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent is preferable.

Specific preferred examples of such a constitutional unit (a2) include a constitutional unit represented by Formula (a2-1) shown below.

[In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ya²¹ represents a single bond or a divalent linking group. La²¹ represents —O—, —COO—, —CON(R′)—, —OCO—, —CONHCO— or —CONHCS—. R′ represents a hydrogen atom or a methyl group; provided that, in a case where La²¹ represents —O—, Ya²¹ does not represents —CO—. Ra²¹ represents a lactone-containing cyclic group, a carbonate-containing cyclic group, or a —SO₂-containing cyclic group.]

In Formula (a2-1), R has the same definition as described above. R represents preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms and particularly preferably a hydrogen atom or a methyl group from the viewpoint of industrial availability.

In Formula (a2-1), the divalent linking group as Ya²¹ is not particularly limited, and suitable examples thereof include a divalent hydrocarbon group which may have a substituent and a divalent linking group having hetero atoms. The divalent hydrocarbon group which may have a substituent and the divalent linking group containing a hetero atom as Ya²¹ are defined the same as the divalent hydrocarbon group which may be a substituent and the divalent linking group containing a hetero atom as Ya^(x1) in Formula (a10-1) stated above, respectively.

As Ya²¹, a single bond, an ester bond [—C(═O)—O—], an ether bond (—O—), a linear or branched alkylene group, or a combination of these is preferable.

In Formula (a2-1), R^(α21) represents a lactone-containing cyclic group, a —SO₂-containing cyclic group, or a carbonate-containing cyclic group.

Preferred examples of the lactone-containing cyclic group, the —SO₂-containing cyclic group, and the carbonate-containing cyclic group as Ra²¹ include groups represented by Formulae (a2-r-1) to (a2-r-7), groups represented by Formulae (a5-r-1) to (a5-r-4), and groups represented by Formulae (ax3-r-1) to (ax3-r-3).

Among the examples, Ra21 represents preferably a lactone-containing cyclic group or a —SO₂-containing cyclic group and more preferably a group represented by Formula (a2-r-1), (a2-r-2), (a2-r-6) or (a5-r-1). Specifically, a group represented by any of chemical Formulae (r-1c-1-1) to (r-1c-1-7), (r-1c-2-1) to (r-1c-2-18), (r-1c-6-1), (r-s1-1-1), and (r-s1-1-18) is still more preferable.

The constitutional unit (a2) in the component (A1) may be used alone or two or more kinds thereof.

In a case where the component (A1) has the constitutional unit (a2), the proportion of the constitutional unit (a2) in the component (A1) is preferably in a range of 1% to 50% by mole, more preferably in a range of 5% to 45% by mole, still more preferably in a range of 10% to 40% by mole, and particularly preferably in a range of 10% to 30% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).

By setting the proportion of the constitutional unit (a2) to be greater than or equal to the preferable lower limit, the effects obtained by allowing the constitutional unit (a2) to be contained in the component (A1) can be sufficiently obtained. Further, by setting the proportion of the constitutional unit (a2) to be lower than or equal to the upper limit of the above-described preferable range, the constitutional unit (a2) and other constitutional units can be balanced, and various lithography characteristics are enhanced.

[Constitutional Unit (a3)]

It is preferable that the component (A1) further has a constitutional unit (a3) (here, a constitutional unit corresponding to the constitutional unit (a1) or the constitutional unit (a2) is excluded) containing a polar group-containing resin hydrocarbon group, in addition to the constitutional unit (a1). In a case where the component (A1) includes the constitutional unit (a3), the hydrophilicity of the component (A) is enhanced, and this contributes to improvement of the resolution. In addition, the acid diffusion length can be appropriately adjusted.

Examples of the polar group include a hydroxyl group, a cyano group, a carboxyl group, or a hydroxyalkyl group in which some hydrogen atoms of the alkyl group have been substituted with fluorine atoms. Among these, a hydroxyl group is particularly preferable.

Examples of the aliphatic hydrocarbon group include linear or branched hydrocarbon groups (preferably alkylene groups) having 1 to 10 carbon atoms, and cyclic aliphatic hydrocarbon groups (cyclic groups). The cyclic group may be a monocyclic group or a polycyclic group. For example, these cyclic groups can be selected appropriately from the multitude of groups that have been proposed for the resins of resist compositions for ArF excimer lasers. The cyclic group is preferably a polycyclic group and more preferably a polycyclic group having 7 to 30 carbon atoms.

Among the examples, constitutional units derived from acrylic acid ester that include an aliphatic polycyclic group containing a hydroxyl group, cyano group, carboxyl group, or a hydroxyalkyl group in which some hydrogen atoms of the alkyl group have been substituted with fluorine atoms are particularly preferable. Examples of the polycyclic group include groups in which two or more hydrogen atoms have been removed from a bicycloalkane, tricycloalkane, tetracycloalkane or the like. Specific examples thereof include groups in which two or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbomane, isobomane, tricyclodecane or tetracyclododecane. Among these polycyclic groups, groups in which two or more hydrogen atoms have been removed from adamantane, groups in which two or more hydrogen atoms have been removed from norbomane or groups in which two or more hydrogen atoms have been removed from tetracyclododecane are preferred industrially.

The constitutional unit (a3) is not particularly limited as long as the constitutional unit contains a polar group-containing aliphatic hydrocarbon group, and an optional constitutional unit may be used.

The constitutional unit (a3) is a constitutional unit derived from acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent, and a constitutional unit containing a polar group-containing aliphatic hydrocarbon group is preferable.

In a case where the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a linear or branched hydrocarbon group having 1 to 10 carbon atoms, the constitutional unit (a3) is preferably a constitutional unit derived from hydroxyethyl ester of acrylic acid.

On the other hand, in a case where the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a polycyclic group, a constitutional unit represented by Formula (a3-1), a constitutional unit represented by Formula (a3-2), and a constitutional unit represented by Formula (a3-3) shown below are preferable as the constitutional unit (a3).

[In the formulae, R has the same definition as described above, j represents an integer of 1 to 3, k represents an integer of 1 to 3, t′ represents an integer of 1 to 3, 1 represents an integer of 1 to 5, and s represents an integer of 1 to 3.]

In Formula (a3-1), j represents preferably 1 or 2 and more preferably 1. In a case where j represents 2, it is preferable that the hydroxyl groups are bonded to the 3rd and 5th positions of the adamantyl group. In a case where j represents 1, it is preferable that the hydroxyl group is bonded to the 3rd position of the adamantyl group.

j represents preferably 1, and it is particularly preferable that the hydroxyl group is bonded to the 3rd position of the adamantyl group.

In Formula (a3-2), k represents preferably 1. The cyano group is preferably bonded to the 5th or 6th position of the norbomyl group.

In Formula (a3-3), t′ represents preferably 1. l represents preferably 1. s represents preferably 1. Further, it is preferable that a 2-norbomyl group or 3-norbomyl group is bonded to the terminal of the carboxy group of the acrylic acid. The fluorinated alkyl alcohol is preferably bonded to the 5th or 6th position of the norbomyl group.

The constitutional unit (a3) included in the component (A1) may be used alone or two or more kinds thereof.

In a case where the component (A1) has the constitutional unit (a3), the proportion of the constitutional unit (a3) is preferably in a range of 1% to 40% by mole, more preferably in a range of 2% to 30% by mole, still more preferably in a range of 5% to 25% by mole, and particularly preferably in a range of 5% to 20% by mole with respect to the total amount of all constitutional units constituting the component (A1).

By setting the proportion of the constitutional unit (a3) to be greater than or equal to the preferable lower limit, the effects obtained by allowing the constitutional unit (a3) to be contained in the component (A1) can be sufficiently obtained. Further, by setting the proportion of the constitutional unit (a3) to be lower than or equal to the upper limit of the above-described preferable range, the constitutional unit (a3) and other constitutional units can be balanced, and various lithography characteristics are enhanced.

[Other Constitutional Units]

The component (A1) may have other constitutional units other than the constitutional unit (a1), the constitutional unit (a10), the constitutional unit (a2), and the constitutional unit (a3) described above.

Examples of the other constitutional units include a constitutional unit (a9) represented by Formula (a9-1) described below, a constitutional unit derived from styrene, a constitutional unit derived from a styrene derivative (here, a constitutional unit corresponding to the constitutional unit (a10) is excluded), and a constitutional unit containing a non-acid dissociable aliphatic cyclic group.

[Constitutional Unit (a9)]

The constitutional unit (a9) is a constitutional unit represented by Formula (a9-1) shown below.

[In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Ya⁹¹ represents a single bond or a divalent linking group. Ya⁹² represents a divalent linking group. R⁹¹ represents a hydrocarbon group which may have a substituent.]

In Formula (a9-1), R has the same definition as described above.

R represents preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms and particularly preferably a hydrogen atom or a methyl group from the viewpoint of industrial availability.

Examples of the divalent linking group as Ya⁹¹ in Formula (a9-1) include the same as the divalent linking groups as Ya^(x1) in Formula (a10-1) described above. Among these, Ya⁹¹ is preferably a single bond.

Examples of the divalent linking group as Ya⁹² in Formula (a9-1) include the same as the divalent linking groups as Ya^(x1) in Formula (a10-1) described above.

As the divalent hydrocarbon group which may have a substituent in the divalent linking group as Ya⁹², a linear or branched aliphatic hydrocarbon group is preferable.

Furthermore, in the divalent linking group as Ya⁹², examples of the divalent linking group containing a hetero atom include —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH—, —NH—C(═NH)— wherein H may be substituted with a substituent such as an alkyl group, an acyl group, or the like, —S—, —S(═O)₂—, —S(═O)₂—O—, —C(═S)—; a group represented by Formula: —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(═O)—O—, —C(═O)—O—Y²¹, [Y²¹—C(═O)—O]_(m′)—Y²²—, or —Y²¹—O—C(═O)—Y²²— [in the formulae, Y²¹ and Y²² each independently represents a divalent hydrocarbon group which may have a substituent, O represents an oxygen atom, and m′ represents an integer of 0 to 3], and the like. Among these, —C(═O)— and —C(═S)— are preferable.

In Formula (a9-1), examples of the hydrocarbon group as R⁹¹ include an alkyl group, a monovalent alicyclic hydrocarbon group, an aryl group, an aralkyl group and the like.

The alkyl group as R⁹¹ preferably has 1 to 8 carbon atoms, more preferably 1 to 6 carbon atoms, and still more preferably 1 to 4 carbon atoms, and may be linear or branched as R⁹¹. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group and the like.

The monovalent alicyclic hydrocarbon group as R⁹¹ preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms, and may be polycyclic or monocyclic. As the monocyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclobutane, cyclopentane, cyclohexane and the like. As the polycyclic alicyclic group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane is preferable. As the polycycloalkane, a group having 7 to 12 carbon atoms is preferable. Specific examples of the polycycloalkane include adamantane, norbomane, isobomane, tricyclodecane, tetracyclododecane and the like.

The aryl group as R⁹¹ preferably has 6 to 18 carbon atoms, and more preferably 6 to 10 carbon atoms. In particular, a phenyl group is particularly preferable.

The aralkyl group as R⁹¹ is preferably an aralkyl group in which an alkylene group having 1 to 8 carbon atoms is bonded to the “aryl group as R⁹¹”, more preferably an aralkyl group in which alkylene group having 1 to 6 carbon atoms is bonded to the “aryl group as R⁹¹”, and particularly preferably an aralkyl group in which an alkylene group having 1 to 4 carbon atoms is bonded to the “aryl group as R⁹¹.”

The hydrocarbon group as R⁹¹ is preferably a group in which some or all hydrogen atoms of an alkyl group or an alkylene group have been substituted with fluorine atoms, and more preferably a group in which 30% to 100% of the hydrogen atoms in the hydrocarbon group are substituted with fluorine atoms. Among these, a perfluoroalkyl group in which all the hydrogen atoms of the alkyl group are substituted with fluorine atoms is particularly preferable.

The hydrocarbon group as R⁹¹ may have a substituent. Examples of the substituent include a halogen atom, an oxo group (═O), a hydroxyl group (—OH), an amino group (—NH₂), —SO₂—NH₂ and the like. Additionally, a part of carbon atoms constituting the hydrocarbon group may be substituted with substituents containing a hetero atom. Examples of the substituent containing a hetero atom include —O—, —NH—, —N═, —C(═O)—O—, —S—, —S(═O)₂—, and —S(═O)₂—O—.

Examples of the hydrocarbon group having a substituent as R⁹¹ include those exemplified as the groups represented by Formulae (a2-r-1) to (a2-r-7).

Examples of the hydrocarbon group having a substituent as R⁹¹ include a —SO₂-containing cyclic group respectively represented by of Formulae (a5-r-1) to (a5-r-4) above; a substituted aryl group represented by the following chemical formula, a monovalent heterocyclic group, and the like.

Among the constitutional units (a9), a constitutional unit represented by Formula (a9-1-1) shown below is preferable.

[In formula, R is as defined above, Ya⁹¹ represents a single bond or a divalent linking group, R⁹¹ represents a hydrocarbon group which may have a substituent, and R⁹² represents an oxygen atom or a sulfur atom.]

In Formula (a9-1-1), Ya⁹¹, R⁹¹ and R are defined the same as above. Moreover, R⁹² represents an oxygen atom or a sulfur atom.

Specific examples of the constitutional unit represented by Formula (a9-1) or Formula (a9-1-1) are shown below. In the following formulae, R″ represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

The constitutional unit (a9) included in the component (A1) may be used alone or two or more kinds thereof.

In a case where the component (A1) has the constitutional unit (a9), the proportion of the constitutional unit (a9) is preferably in a range of 1% to 40% by mole, more preferably in a range of 3% to 30% by mole, still more preferably in a range of 5% to 25% by mole, and particularly preferably in a range of 10% to 20% by mole with respect to the total amount (100% by mole) of all constitutional units constituting the component (A1).

By setting the proportion of the constitutional unit (a9) to be greater than or equal to the lower limit, the advantageous effects can be obtained, for example, the acid diffusion length is appropriately adjusted, the adhesion of the resist film to the substrate is enhanced, or the solubility during development is appropriately adjusted. Further, by setting the proportion of the constitutional unit (a9) to be lower than or equal to the upper limit of the above-described preferable range, the constitutional unit (a9) and other constitutional units can be balanced, and various lithography characteristics are enhanced.

The component (A1) contained in the resist composition may be used alone or in combination of two or more.

The component (A1) preferably contains the polymer compound (A1-1) (hereinafter also referred to as a “component (A1-1)”) having the constitutional unit (a1).

Preferred examples of the component (A1-1) include a polymer compound having repeating structures of the constitutional unit (a1) and the constitutional unit (a2); a polymer compound having repeating structures of the constitutional unit (a1) and the constitutional unit (a10); and the like.

In addition to the combination of the two constitutional units described above, the constitutional unit described above may be combined appropriately in order to obtain desired effects as a third constitutional unit, or alternatively, three or more of such constitutional units may be combined. The third constitutional unit is preferably at least one of the constitutional unit (a3) and the constitutional unit (a9).

The component (A1) can be prepared by dissolving a monomer from which each constitutional unit is derived in a polymerization solvent and polymerizing the dissolved monomer using a radical polymerization initiator such as azobisisobutylonitrile (AIBN) or dimethyl azobisisobutyrate (for example, V-601). Alternatively, the component (A1) can be prepared by dissolving a monomer from which the constitutional unit (a1) is derived, and a precursor monomer (monomer for which the functional group is protected) from which the constitutional unit other than the constitutional unit (a1) is derived in a polymerization solvent, polymerizing the dissolved monomers using the radical polymerization initiator described above, followed by performing a deprotection reaction. Further, a —C(CF₃)₂—OH group may be introduced into a terminal during the polymerization using a chain transfer agent such as HS—CH₂—CH₂—CH₂—C(CF₃)₂—OH together. As described above, a copolymer into which a hydroxyalkyl group, formed by substitution of some hydrogen atoms in the alkyl group with fluorine atoms, has been introduced is effective for reducing development defects and reducing line edge roughness (LER: uneven irregularities of a line side wall).

The weight average molecular weight (Mw) (in terms of polystyrene determined by gel permeation chromatography (GPC)) of the component (A1) is not particularly limited, but is preferably in a range of 1,000 to 50,000, more preferably in a range of 2,000 to 30,000, and still more preferably in a range of 3,000 to 20,000.

In a case where the weight average molecular weight (Mw) of the component (A1) is less than or equal to the preferable upper limit of the above-described range, the resist composition exhibits a satisfactory solubility in a solvent for a resist enough to be used as a resist. Meanwhile, in a case where the weight average molecular weight is greater than or equal to the preferable lower limit of the above-described range, dry etching resistance and the cross-sectional shape of the resist pattern becomes excellent.

The dispersity (Mw/Mn) of the component (A1) is not particularly limited, but preferably in a range of 1.0 to 4.0, more preferably in a range of 1.0 to 3.0, and particularly preferably in a range of 1.1 to 2.0. Moreover, Mn indicates a number average molecular weight.

Regarding Component (A2)

In the resist composition of the present embodiment, a base material component (hereinafter, referred to as a “component (A2)”) which does not correspond to the component (A1) and of which solubility in a developing solution is changed due to the action of an acid may be used in combination as the component (A).

The component (A2) is not particularly limited, and may be optionally selected from those known in the related art as the base material components for a chemically amplified resist composition.

In the component (A2), a high molecular weight compound or a low molecular weight compound may be used alone or in combination of two or more kinds thereof.

The proportion of the component (A1) in the component (A) is preferably 25% by mass or greater, more preferably 50% by mass or greater, still more preferably 75% by mass or greater, or may be 100% by mass with respect to the total mass of the component (A). In a case where the proportion thereof is 25% by mass or greater, a resist pattern with excellent lithography characteristics of enhancing the high sensitivity, resolution, or roughness and the like is easily formed. These advantageous effects are particularly remarkable in electron beam lithography and EUV lithography.

In the resist composition of the present embodiment, the content of the component (A) may be adjusted according to the film thickness of a resist intended to be formed.

[Compound (BD1)]

In the resist composition of the present embodiment, the component (BD1) is a compound represented by the following Formula (bd1) and composed of an anion moiety and a cation moiety.

[In the formula, Rx¹ to Rx⁴ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rx¹ to Rx⁴ may be bonded to each other to form a ring structure, and at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure. Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, Ry¹ and Ry² may be bonded to each other to form a ring structure.

represents a double bond or a single bond. Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more. m represents an integer of 1 or more. M^(m+) represents an m-valent organic cation.]

Regarding Anion Moiety

In Formula (bd1), Rx¹ to Rx⁴ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rx¹ to Rx⁴ may be bonded to each other to form a ring structure, and at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure.

Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, Ry¹ and Ry² may be bonded to each other to form a ring structure.

Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure.

The hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, or may be a cyclic hydrocarbon group or a chain-like hydrocarbon group.

For example, examples of the hydrocarbon group, which may have a substituent as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, include a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent.

Cyclic Group which May have Substituent

The cyclic group is preferably a cyclic hydrocarbon group, and the cyclic hydrocarbon group may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. The aliphatic hydrocarbon group indicates a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated, but in general, the aliphatic hydrocarbon group is preferably saturated. The cyclic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ may contain a hetero atom as in a case of a heterocyclic ring and the like.

The aromatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon ring has preferably 3 to 30 carbon atoms, more preferably 5 to 30 carbon atoms, still more preferably 5 to 20 carbon atoms, particularly preferably 6 to 15 carbon atoms, and most preferably 6 to 12 carbon atoms. Here, the number of carbon atoms in a substituent is not included in the number of carbon atoms.

Specific examples of the aromatic ring contained in the aromatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or an aromatic heterocyclic ring in which some carbon atoms constituting any of these aromatic rings have been substituted with hetero atoms. Examples of the hetero atom in the aromatic heterocyclic rings include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the aromatic ring contained in the aromatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, an aromatic heterocyclic ring in which a part of carbon atoms constituting the aromatic ring is substituted with hetero atoms, and the like, from the viewpoint of compatibility with the component (A).

Specific examples of the aromatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include a group in which one hydrogen atom has been removed from the above-described aromatic ring (an aryl group such as a phenyl group, a naphthyl group or the like), and a group in which one hydrogen atom in the aromatic ring has been substituted with an alkylene group (an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, 1-naphthylethyl group, a 2-naphthylethyl group or the like). The alkylene group (an alkyl chain in the arylalkyl group) has preferably 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

Examples of the cyclic aliphatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include aliphatic hydrocarbon groups containing a ring in the structure thereof.

Examples of the hydrocarbon group containing a ring in the structure thereof include an alicyclic hydrocarbon group (a group in which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), a group in which the alicyclic hydrocarbon group is bonded to the terminal of a linear or branched aliphatic hydrocarbon group, and a group in which the alicyclic hydrocarbon group is interposed in a linear or branched aliphatic hydrocarbon group.

The alicyclic hydrocarbon group has preferably 3 to 20 carbon atoms and more preferably 3 to 12 carbon atoms.

The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. As the monocyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane is preferable, and the number of carbon atoms of the polycycloalkane is preferably in a range of 7 to 30. Among polycycloalkanes, a polycycloalkane having a bridged ring polycyclic skeleton, such as adamantane, norbomane, isobomane, tricyclodecane, or tetracyclododecane, and a polycycloalkane having a fused ring polycyclic skeleton, such as a cyclic group having a steroid skeleton are preferable.

Among these examples, as the cyclic aliphatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, a group in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane is preferable, a group in which one hydrogen atom has been removed from a monocycloalkane is more preferable, and a group in which one hydrogen atom has been removed from cyclopentane or cyclohexane is particularly preferable.

The linear aliphatic hydrocarbon group which may be bonded to the alicyclic hydrocarbon group has preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable. Specific examples thereof include a methylene group [—CH₂—], an ethylene group [—(CH₂)₂—], a trimethylene group [—(CH₂)₃—], a tetramethylene group [—(CH₂)₄—], and a pentamethylene group [—(CH₂)₅—].

The branched aliphatic hydrocarbon group which may be bonded to the alicyclic hydrocarbon group has preferably 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable. Specific examples thereof include alkylalkylene groups, for example, alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)—, and —C(CH₂CH₃)₂—; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, —CH(CH₂CH₃)CH₂—, and —C(CH₂CH₃)₂—CH₂—; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂—, and —CH₂CH(CH₃)CH₂—; and alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂—, and —CH₂CH(CH₃)CH₂CH₂—. As the alkyl group in the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferable.

Further, examples of the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ also include —COOR^(XYZ) and —OC(═O)^(RXYZ), in which R^(XYZ) is a lactone-containing cyclic group, a carbonate-containing cyclic group or —SO²-containing cyclic group.

Examples of the substituent for the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a nitro group, a carbonyl group and the like.

The alkyl group as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is most preferable.

The alkoxy group as the substituent is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom for the substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferable.

Example of the halogenated alkyl group as the substituent includes a group in which some or all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms such as a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group have been substituted with the above-described halogen atoms.

The carbonyl group as the substituent is a group that substitutes a methylene group (—CH₂—) constituting the cyclic hydrocarbon group.

Among these, as the substituent in the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, an alkyl group, a halogen atom, a halogenated alkyl group and the like are preferable from the viewpoint of compatibility with the component (A). An Alkyl group is more preferable.

Chain-Like Alkyl Group which May have Substituent:

The chain-like alkyl group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ may be linear or branched.

The linear alkyl group has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decanyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, an isohexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, an icosyl group, a henicosyl group, a docosyl group, and the like.

The branched alkyl group has preferably 3 to 20 carbon atoms, more preferably 3 to 15 carbon atoms, and most preferably 3 to 10 carbon atoms. Specific examples thereof include a 1-methylethyl group, a 1,1-dimethylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, a 4-methylpentyl group, and the like.

Chain-Like Alkenyl Group which May have Substituent

Such a chain-like alkenyl group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ may be linear or branched, and the number of carbon atoms thereof is preferably in a range of 2 to 10, more preferably in a range of 2 to 5, still more preferably in a range of 2 to 4, and particularly preferably 3. Examples of the linear alkenyl group include a vinyl group, a propenyl group (an allyl group), and a butynyl group. Examples of the branched alkenyl group include a 1-methylvinyl group, a 2-methylvinyl group, a 1-methylpropenyl group, a 2-methylpropenyl group, and the like.

Among the examples, as the chain-like alkenyl group, a linear alkenyl group is preferable, a vinyl group or a propenyl group is more preferable, and a vinyl group is particularly preferable.

As the substituent for the chain-like alkyl group or alkenyl group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, an alkoxy group, a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom etc.), a halogenated alkyl group, a hydroxyl group, a carbonyl group, a nitro group, an amino group, a cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ or the like can be used. Among these, as the substituent in the chain-like alkyl group or alkenyl group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, a halogen atom, a halogenated alkyl group, groups exemplified as the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, and the like are preferable, and the groups exemplified as the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ are more preferable from the viewpoint of compatibility with the component (A).

Among those hydrocarbon groups, as the group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴, an aromatic hydrocarbon group which may have a substituent, a cyclic group which may have a substituent and a chain-like alkyl group which may have a substituent are preferable.

In Formula (bd1), Ry¹ and Ry² may be bonded to each other to form a ring structure.

The ring structure formed by Ry¹ and Ry² shares one side of the six-membered ring in Formula (bd1) (bond between carbon atoms to which Ry¹ and Ry² are respectively bonded). This ring structure may be an alicyclic hydrocarbon or an aromatic hydrocarbon. Additionally, the ring structure may be a polycyclic structure composed of other ring structures.

The alicyclic hydrocarbon formed by Ry¹ and Ry² may be polycyclic or monocyclic. As the monocyclic alicyclic hydrocarbon, a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon, a polycycloalkane is preferable.

The polycycloalkane has preferably 7 to 30 carbon atoms. In particular, a polycycloalkane having a bridged ring polycyclic skeleton, such as adamantane, norbomane, isobomane, tricyclodecane, tetracyclododecane or the like, and a polycycloalkane having a fused ring polycyclic skeleton, such as a cyclic group having a steroid skeleton are more preferable.

Examples of the aromatic hydrocarbon ring formed by Ry¹ and Ry² include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, an aromatic heterocyclic ring in which some carbon atoms constituting any of these aromatic rings have been substituted with hetero atoms, and the like. The aromatic hydrocarbon ring formed by Ry¹ and Ry² preferably contains no hetero atom from the viewpoint of compatibility with the component (A), and an aromatic ring such as benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl or the like is more preferable.

The ring structure (alicyclic hydrocarbon, aromatic hydrocarbon) formed by Ry¹ and Ry² may have a substituent. Examples of the substituent include the same substituents as those for the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ (for example, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a nitro group, a carbonyl group, and the like). Among these, the substituent in the ring structure formed by Ry¹ and Ry² is preferably an alkyl group, a halogen atom, a halogenated alkyl group or the like, and an alkyl group is more preferable, from the viewpoint of compatibility with the component (A).

Among the ring structures formed by Ry¹ and Ry², an aromatic hydrocarbon which may have a substituent is more preferable in terms of short diffusion and diffusion controllability of an acid generated upon exposure.

In Formula (bd1), two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure. For example, Rz¹ may form a ring structure with any of Rz² to Rz⁴. Specific examples of the ring structure include a ring structure sharing one side of a six-membered ring in Formula (bd1) (bond between a carbon atom to which Rz¹ and Rz² are bonded and a carbon atom to which Rz³ and Rz⁴ are bonded), a ring structure formed by bonding Rz¹ to Rz², a ring structure formed by bonding Rz³ to Rz⁴, and the like.

The ring structure formed by two or more of Rz¹ to Rz⁴ may be an alicyclic hydrocarbon or an aromatic hydrocarbon, and is particularly preferably an aromatic hydrocarbon.

Additionally, the ring structure may be a polycyclic structure composed of other ring structures.

The alicyclic hydrocarbon formed by two or more of Rz¹ to Rz⁴ may be polycyclic or monocyclic. As the monocyclic alicyclic hydrocarbon, a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon, a polycycloalkane is preferable. The polycycloalkane has preferably 7 to 30 carbon atoms. In particular, a polycycloalkane having a bridged ring polycyclic skeleton, such as adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane or the like, and a polycycloalkane having a fused ring polycyclic skeleton, such as a cyclic group having a steroid skeleton are more preferable.

It may be a heterocyclic structure in which a part of carbon atoms is substituted with hetero atoms. A nitrogen-containing heterocyclic ring is particularly preferable, and specific examples thereof include cyclic imide and the like.

Examples of the aromatic hydrocarbon ring formed by two or more of Rz¹ to Rz⁴ include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, an aromatic heterocyclic ring in which some carbon atoms constituting any of these aromatic rings have been substituted with hetero atoms, and the like. The aromatic hydrocarbon ring formed by two or more of Rz¹ to Rz⁴ preferably contains no hetero atom from the viewpoint of compatibility with the component (A), and an aromatic ring such as benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl or the like is more preferable.

The ring structure (alicyclic hydrocarbon, aromatic hydrocarbon) formed by Rz¹ to Rz⁴ may have a substituent. Examples of the substituent include the same substituents as those for the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ (for example, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a nitro group, a carbonyl group, and the like). Among these, the substituent in the ring structure formed by Rz¹ to Rz⁴ is preferably an alkyl group, a halogen atom, a halogenated alkyl group or the like, and an alkyl group is more preferable, from the viewpoint of compatibility with the component (A).

Among the ring structures formed by two or more of Rz¹ to Rz⁴, a ring structure sharing one side of a six-membered ring in Formula (bd1) (bond between a carbon atom to which Rz¹ and Rz² are bonded and a carbon atom to which Rz³ and Rz⁴ are bonded) is preferable, and an aromatic ring structure is more preferable in terms of diffusion controllability of an acid generated upon exposure.

In Formula (bd1), the phase “where valence allows” is defined as follows. That is, in a case where a bond between a carbon atom to which Rz¹ and Rz² are bonded and a carbon atom to which Rz³ and Rz⁴ are bonded is a single bond, all of Rz¹, Rz², Rz³ and Rz⁴ are present. In a case where a bond between a carbon atom to which Rz¹ and Rz² are bonded and a carbon atom to which Rz³ and Rz⁴ are bonded is a double bond, only one of Rz¹ and Rz², and only one of Rz³ and Rz⁴ are present. For example, in a case where Rz¹ and Rz³ are bonded to form an aromatic ring structure, Rz² and Rz⁴ are not present.

In Formula (bd1), two or more of Rx¹ to Rx⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure.

A ring structure formed by two or more of Rx¹ to Rx⁴ may be an alicyclic hydrocarbon or an aromatic hydrocarbon. Additionally, the ring structure may be a polycyclic structure composed of other ring structures.

The alicyclic hydrocarbon formed by two or more of Rx¹ to Rx⁴ may be polycyclic or monocyclic. As the monocyclic alicyclic hydrocarbon, a monocycloalkane is preferable. The monocycloalkane has preferably 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon, a polycycloalkane is preferable. The polycycloalkane has preferably 7 to 30 carbon atoms. In particular, a polycycloalkane having a bridged ring polycyclic skeleton, such as adamantane, norbornane, isobomane, tricyclodecane, tetracyclododecane or the like, and a polycycloalkane having a fused ring polycyclic skeleton, such as a cyclic group having a steroid skeleton are more preferable.

Examples of the aromatic hydrocarbon ring formed by two or more of Rx¹ to Rx⁴ include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, an aromatic heterocyclic ring in which some carbon atoms constituting any of these aromatic rings have been substituted with hetero atoms, and the like. The aromatic hydrocarbon ring formed by two or more of Rx¹ to Rx⁴ preferably contains no hetero atom from the viewpoint of compatibility with the component (A), and an aromatic ring such as benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl or the like is more preferable.

The ring structure (alicyclic hydrocarbon, aromatic hydrocarbon) formed by Rx¹ to Rx⁴ may have a substituent. Examples of the substituent include the same substituents as those for the cyclic group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ (for example, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a nitro group, a carbonyl group, and the like). Among these, the substituent in the ring structure formed by Rx¹ to Rx⁴ is preferably an alkyl group, a halogen atom, a halogenated alkyl group or the like, and an alkyl group is more preferable, from the viewpoint of compatibility with the component (A).

Among the ring structures formed by two or more of Rx¹ to Rx⁴, an alicylic hydrocarbon is preferable in terms of diffusion controllability of an acid.

The ring structure formed by bonding at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ to each other may be any one of the exemplified ring structures formed by two or more of Rx¹ to Rx⁴. However, an alicyclic hydrocarbon is more preferable from the viewpoint of acid diffusion controllability.

In a case where at least one of Rx¹ to Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure, the number of carbon atoms of a bicyclic structure (ring structure containing carbon atoms to which Ry¹, Ry², Rz¹ and Rz², and Rz³ and Rz⁴ are respectively bonded) is preferably in a range of 7 to 16.

In Formula (bd1), at least one of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.

The component (BD1) acts as the acid generator component (B) which generates an acid acting on the base material component (A) in the resist composition by selecting an anionic group in the molecule, or acts as the base component (D) that traps an acid generated from the component (B) upon exposure (i.e. controlling acid diffusion). In the component (BD1), each of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ may be the anionic groups described above. Alternatively, in a case where two or more of Rx¹ to Rx⁴ are bonded to each other to form a ring structure, a carbon atom forming the ring structure or a hydrogen atom bonded to this carbon atom may be substituted by the anionic group in the component (BD1). In a case where two or more of Ry¹ and Ry² are bonded to each other to form a ring structure, a carbon atom forming the ring structure or a hydrogen atom bonded to this carbon atom may be substituted by the anionic group. In a case where two or more of Rz¹ to Rz⁴ are bonded to each other to form a ring structure, a carbon atom forming the ring structure or a hydrogen atom bonded to this carbon atom may be substituted by the anionic group.

Examples of the anionic group contained in any of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ include a sulfonate anion structure, a carboxylate anion structure, an imide anion structure, a methide anion structure, a carbanion structure, a borate anion structure, a halogen anion structure, a phosphate anion structure, an antimonate anion structure, an arsinate anion structure and the like.

Among these, those having a sulfonate anion structure or a carboxylate anion structure are preferable.

Suitable examples of the anionic group having a carboxylate anion structure include *—V′¹⁰—COO— (V′¹⁰ is a single bond or an alkylene group having 1 to 20 carbon atoms).

Suitable examples of the anionic group having a sulfonate anion structure include anionic groups represented by *—V′¹¹—SO₃— (V′¹¹ is a single bond or an alkylene group having 1 to 20 carbon atoms) and *—Y′¹¹—SO₃— (Y′¹¹ is a divalent linking group containing a hetero atom).

As the divalent linking group containing a hetero atom as Y′¹¹, a group containing an oxygen atom as a hetero atom is preferable. Examples of the divalent linking group containing an oxygen atom include a non-hydrocarbon linking group containing an oxygen atom, such as an oxygen atom (ether bond: —O—), an ester bond (—C(═O)—O—), an oxycarbonyl group (—O—C(═O)—), an amide bond (—C(═O)—NH—), a carbonyl group (—C(═O)—), a carbonate bond (—O—C(═O)—O—) or the like; combinations of an alkylene group and such a non-hydrocarbon linking group containing an oxygen atom; and the like.

Among these, a divalent linking group containing an ester bond or a divalent linking group containing an ether bond is preferable, and linking groups represented by Formulae (y-a1-1) to (y-a1-6) are more preferable.

Moreover, suitable examples of the anionic group represented by *—Y′¹¹—SO₃ also include an anionic group represented by the following Formula (bd1-r-an1).

In Formula (bd1-r-an1), * represents a bond. The symbol * indicates a bond to a carbon atom to which each of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ is bonded.

[In the formula, R^(b01) represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. V^(b01) represents an alkylene group, a fluorinated alkylene group, or a single bond. Y^(b01) represents a divalent linking group or a single bond.]

In Formula (bd1-r-an1), R^(b01) represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. R^(b01) represents preferably a perfluoroalkyl group having 1 to 5 carbon atoms or a fluorine atom, and more preferably a fluorine atom.

In Formula (bd1-r-an1), V^(b01) represents an alkylene group, a fluorinated alkylene group, or a single bond.

The number of carbon atoms of the alkylene group or the fluorinated alkylene group as V^(b01) is preferably in a range of 1 to 4 and more preferably in a range of 1 to 3, respectively. Examples of the fluorinated alkylene group as V^(b01) include a group in which some or all hydrogen atoms in the alkylene group have been substituted with fluorine atoms. Among these, preferred examples of V^(b01) include an alkylene group having 1 to 4 carbon atoms, a fluorinated alkylene group having 1 to 4 carbon atoms, and a single bond.

In Formula (bd1-r-an1), Y^(b10) represents a divalent linking group or a single bond.

Suitable examples of the divalent linking group as Y^(b10) include a divalent linking group containing an oxygen atom.

In a case where Y^(b10) represents a divalent linking group containing an oxygen atom, Y^(b10) may contain an atom other than an oxygen atom. Examples of atoms other than an oxygen atom include a carbon atom, a hydrogen atom, a sulfur atom, and a nitrogen atom.

Examples of the divalent linking group containing an oxygen atom include a non-hydrocarbon linking group containing an oxygen atom, such as an oxygen atom (ether bond: —O—), an ester bond (—C(═O)—O—), an oxycarbonyl group (—O—C(═O)—), an amide bond (—C(═O)—NH—), a carbonyl group (—C(═O)—), a carbonate bond (—O—C(═O)—O—) or the like; combinations of an alkylene group and such a non-hydrocarbon linking group containing an oxygen atom; and the like. A sulfonyl group (—SO₂—) may be further linked to the combination.

Examples of the divalent linking group containing an oxygen atom include linking groups represented by Formulae (y-a1-1) to (y-a1-8).

[In the formulae, V′¹⁰¹ represents a single bond or an alkylene group having 1 to 5 carbon atoms, and V′¹⁰² represents a divalent saturated hydrocarbon group having 1 to 30 carbon atoms.]

As the divalent saturated hydrocarbon group as V′¹⁰², an alkylene group having 1 to 30 carbon atoms is preferable, an alkylene group having 1 to 10 carbon atoms is more preferable, and an alkylene group having 1 to 5 carbon atoms is still more preferable.

The alkylene group as V′¹⁰¹ and V′¹⁰² may be a linear alkylene group or a branched alkylene group, and a linear alkylene group is preferable.

Specific examples of the alkylene group as V′¹⁰¹ and V′¹⁰² include a methylene group [—CH₂—]; an alkylmethylene group such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)—, or —C(CH₂CH₃)₂—; an ethylene group [—CH₂CH₂—]; an alkylethylene group such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, or —CH(CH₂CH₃)CH₂—; a trimethylene group (n-propylene group) [—CH₂CH₂CH₂—]; an alkyltrimethylene group such as —CH(CH₃)CH₂CH₂— or —CH₂CH(CH₃)CH₂—; a tetramethylene group [—CH₂CH₂CH₂CH₂—]; an alkyltetramethylene group such as —CH(CH₃)CH₂CH₂CH₂—, —CH₂CH(CH₃)CH₂CH₂— or the like; a pentamethylene group [—CH₂CH₂CH₂CH₂CH₂—]; and the like.

Further, a part of the methylene group in the alkylene group as V′¹⁰¹ and V′¹⁰² may be substituted with a divalent aliphatic cyclic group having 5 to 10 carbon atoms. As the aliphatic cyclic group, a cyclohexylene group, a 1,5-adamantylene group, or a 2,6-adamantylene group is preferable.

Y^(bO1) represents preferably a divalent linking group having an ester bond or an ether bond, and more preferably a linking group represented by any of Formulae (y-a1-1) to (y-a1-6).

Specific examples of the anionic group represented by Formula (bd1-r-an1) include, in a case where Y^(b10) is a single bond, a fluorinated alkyl sulfonate anion such as —CH₂CF₂SO₃—, —CF₂CF₂SO₃—, trifluoromethane sulfonate anion, perfluorobutane sulfonate anion or the like.

Specific examples of the anionic group represented by Formula (bd1-r-an1) include, in a case where Y^(b10) is a divalent linking group containing an oxygen atom, anions represented by any of the following Formulae (bd1-r-an11) to (bd1-r-an13).

[In the formulae, V″¹⁰¹ represents a single bond, an alkylene group having 1 to 4 carbon atoms or a fluorinated alkylene group having 1 to 4 carbon atoms. R¹⁰² represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. v″ each independently represents an integer of 0 to 3. q″ each independently represents an integer of 1 to 20. n″ is 0 or 1.]

In Formulae (bd1-r-an11) to (bd1-r-an13), V″¹⁰¹ represents a single bond, an alkylene group having 1 to 4 carbon atoms, or a fluorinated alkylene group having 1 to 4 carbon atoms. V″¹⁰¹ is preferably a single bond, an alkylene group having 1 carbon atom (methylene group), or a fluorinated alkylene group having 1 to 3 carbon atoms.

In Formulae (bd1-r-an11) to (bd1-r-an13), R¹⁰² represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. R¹⁰² represents preferably a perfluoroalkyl group having 1 to 5 carbon atoms or a fluorine atom, and more preferably a fluorine atom.

In Formulae (bd1-r-an11) to (bd1-r-an13), v″ represents an integer of 0 to 3, preferably 0 or 1. q″ represents an integer of 1 to 20, preferably an integer of 1 to 10, more preferably 1 or 5, still more preferably 1, 2 or 3, and particularly preferably 1 or 2. n″ is 0 or 1, preferably 0.

The number of anionic groups in the component (BD1) may be 1, or 2 or more, and preferably 1.

The component (BD1) has an n-valent anion for the whole anion moiety. n represents an integer of 1 or more, preferably 1 or 2, and more preferably 1.

As the anion moiety in the component (BD1), an anion represented by the following Formula (bd1-an1) is preferable from the viewpoint of acid diffusion controllability.

[In the formula, Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom. Rx⁷ and Rx⁸ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure. p is 1 or 2, and when p is 2, a plurality of Rx⁷s and Rx⁸s may be different from each other. Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure.

represents a double bond or a single bond. Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.]

In Formula (bd1-an1), Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom. The hydrocarbon group which may have a substituent as Rx⁵ and Rx⁶ is the same as the hydrocarbon group which may have a substituent as Rx¹ to Rx⁴ in Formula (bd1).

In Formula (bd1-an1), Rx⁷ and Rx⁸ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure. Rx⁷ and Rx⁸ are defined the same as Rx¹ to Rx⁴ in Formula (bd1).

In Formula (bd1-an1), p is 1 or 2, and when p is 2, a plurality of Rx⁷s and Rx⁸s may be different from each other. The anion represented by Formula (bd1-an1) has a bicycloheptane ring structure when p is 1, and a bicyclooctane ring structure when p is 2.

In Formula (bd1-an1), Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure. Ry¹ and Ry² are defined the same as Ry¹ and Ry² in Formula (bd1).

Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure. Rz¹ to Rz⁴ are defined the same as Rz¹ to Rz⁴ in Formula (bd1).

However, in Formula (bd1-an1), at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.

Among these, as the anion moiety in the component (BD1), an anion represented by Formula (bd1-an1) and p is 2, i.e. an anion represented by the following Formula (bd1-an2) is more preferable from the viewpoint of acid diffusion controllability.

[In the formula, Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom. A plurality of Rx's and Rx⁸s each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rx⁷ and Rx⁸ may be bonded to each other to form a ring structure. Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure.

represents a double bond or a single bond. Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.]

In Formula (bd1-an2), Rx⁵ and Rx⁶, Rx⁷ and Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ are respectively defined the same as Rx⁵ and Rx⁶, Rx⁷ and Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ in Formula (bd1).

However, in Formula (bd1-an2), at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.

In Formulae (bd1), (bd1-an1) and (bd1-an2), Ry¹ and Ry² are preferably bonded to each other to form a ring structure, in terms of short diffusion and diffusion controllability of an acid generated upon exposure. The ring structure formed by Ry¹ and Ry² is more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have a substituent, and still more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have an alkyl group as a substituent.

In Formulae (bd1), (bd1-an1) and (bd1-an2), Rz¹ to Rz⁴ are preferably bonded to each other to form a ring structure, in terms of diffusion controllability of an acid generated upon exposure. The ring structure formed by Rz¹ to Rz⁴ is preferably a ring structure sharing one side of a six-membered ring in the formulae (bond between a carbon atom to which Rz¹ and Rz² are bonded and a carbon atom to which Rz³ and Rz⁴ are bonded), more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have a substituent, and still more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have an alkyl group as a substituent.

In Formulae (bd1-an1) and (bd1-an2), Rx⁷ and Rx⁸ are preferably bonded to each other to form a ring structure, in terms of short diffusion and diffusion controllability of an acid generated upon exposure. The ring structure formed by Rx⁷ and Rx⁸ is more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have a substituent, and still more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have an alkyl group as a substituent.

In Formula (bd1-an2), the ring structure formed by Rx⁷ and Rx⁸ is preferably a ring structure sharing one side of a six-membered ring in Formula (bd1-an2) (bond between the same carbon atoms to which Rx⁷ and Rx⁸ are bonded), more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have a substituent, and still more preferably an aromatic hydrocarbon (aromatic ring or aromatic heterocyclic ring) which may have an alkyl group as a substituent.

In the whole anion represented by Formula (bd1-an2), the number of ring structures formed by any of Rx⁷ and Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ being bonded to each other may be 1, or 2 or more, and preferably 2 or 3.

In particular, suitable examples of the anion moiety in the component (BD1) include an anion represented by the following Formula (bd1-an3).

[In the formula, Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom.

represents a double bond or a single bond. Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more. R⁰²¹ represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group. n1 represents an integer of 1 to 3. n11 represents an integer of 0 to 8. R⁰²² represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group. n2 represents an integer of 1 to 3. n21 represents an integer of 0 to 8.]

In Formula (bd1-an3), Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ are respectively defined the same as Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ in Formula (bd1-an1).

In Formula (bd1-an3), R⁰²¹ represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group.

The alkyl group as R⁰²¹ is preferably an alkyl group having 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group is most preferable.

The alkoxy group as R⁰²¹ is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

The halogen atom as R⁰²¹ is preferably a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as R⁰²¹ include a group in which some or all hydrogen atoms in an alkyl group having 1 to 5 carbon atoms such as a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group have been substituted with the halogen atoms.

Among these, R⁰²¹ is preferably an alkyl group, a halogen atom, a halogenated alkyl group or the like, and more preferably an alkyl group, from the viewpoint of compatibility with the component (A).

In Formula (bd1-an3), n1 represents an integer of 1 to 3, preferably 1 or 2, and particularly preferably 1.

In Formula (bd1-an3), n11 represents an integer of 0 to 8, preferably an integer of 0 to 4, more preferably 0, 1 and 2, and particularly preferably 0 or 1.

In Formula (bd1-an3), R⁰²² represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and a nitro group, and examples thereof include the same as described above as R⁰²¹. Among these, R⁰²² is preferably an alkyl group, a halogen atom, a halogenated alkyl group or the like, and more preferably an alkyl group, from the viewpoint of compatibility with the component (A).

In Formula (bd1-an3), n2 represents an integer of 1 to 3, preferably 1 or 2, and particularly preferably 1.

In Formula (bd1-an3), n21 represents an integer of 0 to 8, preferably an integer of 0 to 4, more preferably 0, 1 and 2, and particularly preferably 0 or 1.

In Formula (bd1-an3), at least one of Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.

Suitable examples of the anionic group include anionic groups represented by *—V′¹—COO— (V′¹⁰ is a single bond or an alkylene group having 1 to 5 carbon atoms), *—V′¹¹—SO₃— (V′¹¹ is a single bond or an alkylene group having 1 to 20 carbon atoms) and *—Y′¹¹—SO₃— (Y′¹¹ is a divalent linking group containing a hetero atom), as described above.

In Formulae (bd1), (bd1-an1), (bd1-an2) and (bd1-an3), at least one of Rz¹ to Rz⁴ preferably has an anionic group since it allows to obtain the excellent advantageous effect of the present embodiment. In a case where two or more of Rz¹ to Rz⁴ are bonded to each other to form a ring structure, a carbon atom forming the ring structure or a hydrogen atom bonded to this carbon atom may be substituted by the anionic group.

Alternatively, in Formulae (bd1-an1), (bd1-an2) and (bd1-an3), at least one of Rx⁵ and Rx⁶ preferably has an anionic group since it allows to obtain the excellent advantageous effect of the present embodiment.

Alternatively, in Formulae (bd1-an1), (bd1-an2) and (bd1-an3), at least one of Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ preferably has an anionic group since it allows to obtain the excellent advantageous effect of the present embodiment.

Specific examples of the anion moiety in the compound (BD1) are shown below.

Regarding Cation Moiety ((M^(m+))_(1/m))

In Formula (bd1), M^(m+) represents an m-valent organic cation. m represents an integer of 1 or more.

As the organic cation of M^(m+), a sulfonium cation and an iodonium cation are preferable. In a case where the component (BD1) is used as the base component (D), an ammonium cation can be employed as the organic cation.

Preferred examples of the cation moiety ((M^(m+))_(1/m)) include organic cations represented by Formulae (ca-1) to (ca-4).

[In the formulae, R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² each independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent, or an alkenyl group which may have a substituent. Each of R²⁰¹ to R²⁰³, R²⁰⁶ and R²⁰⁷, and R²¹¹ and R²¹² may be bonded to each other to form a ring together with a sulfur atom in the formulae. R²⁰⁸ and R²⁰⁹ each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, or alternatively, may be bonded to each other to form a ring together with a sulfur atom in the formulae. R²¹⁰ represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO₂-containing cyclic group which may have a substituent. L²⁰¹ represents —C(═O)— or —C(═O)—O—. A plurality of Y²⁰¹s each independently represents an arylene group, an alkylene group or an alkenylene group. x is 1 or 2. W²⁰¹ represents a (x+1)-valent linking group.]

Examples of the aryl group as R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² include an aryl group having 6 to 20 carbon atoms, and a phenyl group or a naphthyl group is preferable.

The alkyl group as R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² is a chain-like or cyclic alkyl group, and the number of carbon atoms thereof is preferably in a range of 1 to 30.

The alkenyl group as R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² preferably has 2 to 10 carbon atoms.

Examples of the substituent which R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² may have include an alkyl group, a halogen atom, a halogenated alkyl group, a carbonyl group, a cyano group, an amino group, an aryl group, and groups represented by Formulae (ca-r-1) to (ca-r-7) shown below.

[In the formulae, each R′²⁰¹ independently represents a hydrogen atom, a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent.]

Examples of the cyclic group which may have a substituent, the chain-like alkyl group which may have a substituent, and the chain-like alkenyl group which may have a substituent as R′²⁰¹ are the same as defined as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ in Formula (bd1), and additionally, as those defined as the acid dissociable group represented by Formula (a1-r-2) as a cyclic group which may have a substituent or a chain-like alkyl group which may have a substituent.

Each of R²⁰¹ to R²⁰³, R²⁰⁶ and R²⁰⁷, and R²¹¹ and R²¹² may be bonded to each other to form a ring together with a sulfur atom in the formulae.

In a case where R²⁰¹ to R²⁰³, R²⁰⁶ and R²⁰⁷, and R²¹¹ and R²¹² are bonded to one another to form a ring with a sulfur atom in the formula, these groups may be bonded via a hetero atom such as a sulfur atom, an oxygen atom or a nitrogen atom, or a functional group such as a carbonyl group, —SO—, —SO₂—, —SO₃—, —COO—, —CONH—, —N(RN)— (here, RN represents an alkyl group having 1 to 5 carbon atoms) or the like. As a ring to be formed, a ring containing the sulfur atom in the formula in the ring skeleton thereof is preferably a 3- to 10-membered ring and most preferably a 5- to 7-membered ring including the sulfur atom. Specific examples of the ring to be formed include a thiophene ring, a thiazole ring, a benzothiophene ring, a thianthrene ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthrene ring, a phenoxathiin ring, a tetrahydrothiophenium ring, a tetrahydrothiopyranium ring, and the like.

R²⁰⁸ and R²⁰⁹ each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms and preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. In a case where R²⁰⁸ and R²⁰⁹ each represents an alkyl group, R²⁰⁸ and R²⁰⁹ may be bonded to each other to form a ring together with a sulfur atom in the formulae.

R²¹⁰ represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO₂-containing cyclic group which may have a substituent.

Examples of the aryl group as R²¹⁰ include an unsubstituted aryl group having 6 to 20 carbon atoms, and a phenyl group or a naphthyl group is preferable.

As the alkyl group as R²¹⁰, a chain-like or cyclic alkyl group having 1 to 30 carbon atoms is preferable.

The alkenyl group as R²¹⁰ preferably has 2 to 10 carbon atoms.

The —SO₂-containing cyclic group as R²¹⁰ which may have a substituent is preferably the “—SO₂-containing polycyclic group”, and more preferably the group represented by Formula (a5-r-1).

Each Y²⁰¹ independently represents an arylene group, an alkylene group, or an alkenylene group.

Examples of the arylene group as Y²⁰¹ include groups in which one hydrogen atom has been removed from an aryl group exemplified as the aromatic hydrocarbon group as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ in Formula (bd1).

Examples of the alkylene group and alkenylene group as Y²⁰¹ include groups in which one hydrogen atom has been removed from a group exemplified as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ in Formula (bd1) as the chain-like alkyl group or the chain-like alkenyl group.

In Formula (ca-4), x represents 1 or 2.

W²⁰¹ represents a (x+1)-valent linking group, that is, a divalent or trivalent linking group.

As the divalent linking group represented by W²⁰¹, a divalent hydrocarbon group which may have a substituent is preferable, and as examples thereof, the same divalent hydrocarbon groups which may have a substituent as those described above represented by Ya^(x1) in Formula (a0-1-1) can be exemplified. The divalent linking group as W²⁰¹ may be linear, branched or cyclic, and cyclic is more preferable. Among these, an arylene group having two carbonyl groups, each bonded to the terminal thereof is preferable. Examples of the arylene group include a phenylene group, and a naphthylene group, and a phenylene group is particularly preferable.

As the trivalent linking group as W²⁰¹, a group in which one hydrogen atom has been removed from the above-described divalent linking group as W²⁰¹ and a group in which the divalent linking group has been bonded to another divalent linking group can be exemplified. The trivalent linking group as W²⁰¹ is preferably a group in which two carbonyl groups are bonded to an arylene group.

Specific examples of suitable cations represented by Formula (ca-1) include cations represented by Formulae (ca-1-1) to (ca-1-17), (ca-1-20) to (ca-1-78) and (ca-1-101) to (ca-1-149) shown below.

In the following chemical formulae, g1 represents a repeating number, and g1 is an integer of 1 to 5. g2 represents a repeating number, and g2 is an integer of 0 to 20. g3 represents a repeating number, and g3 is an integer of 0 to 20.

[In the formulae, g1 represents a repeating number, and g1 is an integer of 1 to 5.]

[In the formulae, g2 represents a repeating number, and g2 is an integer of 0 to 20.]

[In the formulae, g3 represents a repeating number, and g3 is an integer of 0 to 20.]

[In the formulae, R″²⁰¹ represents a hydrogen atom or a substituent. Examples of the substituent which R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² may have include an alkyl group, a halogen atom, a halogenated alkyl group, a carbonyl group, a cyano group, an amino group, an aryl group, and groups respectively represented by Formulae (ca-r-1) to (ca-r-7).]

Specific examples of suitable cations represented by Formula (ca-2) include cations respectively represented by the following Formulae (ca-2-1) to (ca-2-2), a dihphenyliodonium cation and a bis(4-tert-butylphenyl)iodonium cation.

Specific examples of suitable cations represented by Formula (ca-3) include cations respectively represented by Formulae (ca-3-1) to (ca-3-7) shown below.

Specific examples of suitable cations represented by Formula (ca-4) include cations respectively represented by Formulae (ca-4-1) to (ca-4-2) shown below.

Further, examples of the ammonium cation in a case where the component (BD1) is used as the base component (D) include a cation (primary to quaternary ammonium cations) in which NH₄, or H bonded to its nitrogen atom is substituted with a hydrocarbon group which may have a hetero atom, or a cyclic cation forming a ring with the nitrogen atom thereof.

Among the examples, as the cation moiety [(M^(m+))_(1/m)], a cation represented by Formula (ca-1) is preferable, and a cation represented by any of Formulae (ca-1-1) to (ca-1-17), (ca-1-20) to (ca-1-78) and (ca-1-101) to (ca-1-149) is more preferable.

Among the components (BD1) described above, specific examples of the compound suitable as an acid generator component (B) (hereinafter referred to as a “component (B1)”) which generates an acid acting on the component (A) will be shown below.

In the resist composition of the present embodiment, the component (B1) may be used alone or in combination of two or more kinds thereof.

The content of the component (B1) in the resist composition of the present embodiment is preferably in a range of 5 to 65 parts by mass, more preferably in a range of 5 to 55 parts by mass, still more preferably in a range of 10 to 50 parts by mass, and particularly preferably in a range of 15 to 45 parts by mass with respect to 100 parts by mass of the component (A).

The proportion of the component (B1) in the entire acid generator component (B) that generates an acid acting on the component (A) in the resist composition is, for example, 50% by mass or more, preferably 70% by mass or more, and more preferably 95% by mass or more. 100% by mass of the component (B1) may be allowable.

In a case where the content of the component (B1) is greater than or equal to the lower limit of the above-described preferable range, lithography characteristics such as sensitivity, resolution, line width roughness (LWR) reduction, or shape are further improved at the time of forming a resist pattern. Meanwhile, in a case where the content of the component (B1) is less than or equal to the upper limit of the preferable range, a uniform solution is easily obtained and the storage stability of a resist composition is further increased at the time of dissolving each component of the resist composition in an organic solvent.

Furthermore, in a case where the resist composition contains both the component (B1) and the component (D) (at least one of the components (D1) to (D3) described below), the ratio (molar ratio) is preferably (B1):(D)=100:0 to 50:50, and more preferably (B1):(D)=99:1 to 51:49, and still more preferably (B1):(D)=90:10 to 60:40, in terms of easily obtainable resist pattern shape and good lithography characteristics.

Further, among the components (BD1) described above, the base component (D) that traps an acid generated from the component (B) upon exposure (i.e. controlling acid diffusion) (hereinafter also referred to as a “component (D1)”). Specific examples of suitable compounds are shown below.

In the resist composition of the present embodiment, the component (D1) may be used alone or in combination of two or more kinds thereof.

The content of the component (D1) in the resist composition of the present embodiment is preferably in a range of 1 to 35 parts by mass, more preferably in a range of 2 to 25 parts by mass, still more preferably in a range of 3 to 20 parts by mass, and particularly preferably in a range of 3 to 15 parts by mass with respect to 100 parts by mass of the component (A).

The proportion of the component (D1) in the entire base component (D) that traps an acid generated from the component (B) upon exposure (i.e. controlling acid diffusion) in the resist composition is, for example, 50% by mass or more, preferably 70% by mass or more, and more preferably 95% by mass or more. 100% by mass of the component (D1) may be allowable.

In a case where the content of the component (D1) is greater than or equal to the lower limit of the preferable range, excellent lithography characteristics and an excellent resist pattern shape can be more reliably obtained. On the other hand, in a case where the content of the component (D1) is lower than or equal to the upper limit of the preferable range, the component (D1) and other components can be balanced, and various lithography characteristics are enhanced.

Furthermore, in a case where the resist composition contains both the component (D1) and the component (B) (at least one of the component (B1) and the component (B2) described below), the ratio (molar ratio) is preferably (B):(D1)=100:0 to 50:50, and more preferably (B):(D1)=99:1 to 51:49, and still more preferably (B):(D1)=90:10 to 60:40, in terms of easily obtainable resist pattern shape and good lithography characteristics.

[Method for Producing Compound (BD1)]

The component (BD1) can be produced according to a known method.

Examples of a method for producing the component (BD1) include a method in which the Diels-Alder reaction is used, as shown in the following reaction formula, that an alkene or alkyne (“Starting Material 2”) in the following reaction formula) is added to a conjugated diene (starting material 1) to form a ring structure (“Intermediate” in the following reaction formula). In particular, a desired anionic group is introduced into a product (intermediate) by the Diels-Alder reaction to obtain a precursor, and then a desired cation is introduced by the salt exchange reaction, thereby obtaining the target component (BD1). Alternatively, the target component (BD1) may be obtained as follows: the Diels-Alder reaction is carried out using an alkene, an alkyne or a conjugated diene, which contains a substituent derived from a desired anionic group (substituent capable of introducing a desired anionic group) to obtain an intermediate; a precursor is obtained by introducing the desired anionic group; and a desired cation is introduced by the salt exchange reaction.

The conjugated diene is appropriately selected in accordance with the target compound (component (BD1)), and for example, anthracene or a derivative thereof, or triptycene or a derivative thereof may be employed.

Examples of a method for introducing an anionic group include a method using the esterification reaction; a method using a reaction between an ammonium salt having an anionic group into which a tosyl group is introduced, and a lithium compound having a ring structure of an anion skeleton (derived from the Diels-Alder reaction); a method in which an intermediate containing a halogen atom is sulfinized to obtain a sulfinate and then oxidized the sulfinate to obtain a sulfonate; and the like.

In a case where the esterification reaction is used to introduce the anionic group, examples of a method for producing a compound represented by Formula (bd1) [compound having an anionic group represented by Formula (bd1-r-an1), wherein Y^(b01) is —C(═O)—O—] include a production method of an embodiment including first and second steps as shown below.

An anionic group represented by Formula (bd1-r-an1) in which Y^(b01) is —C(═O)—O— is denoted as an “anionic group represented by Formula (b1-r-an10).” The target compound produced by the production method of the embodiment including the first and second steps is referred to as a compound (B1-0).

Commercially available material or synthesized material may be employed as a raw material used in each step.

An organic solvent used in the first and second steps may be any solvent which can dissolve the compound used in each step and does not react with the compound, and examples thereof include dichloromethane, dichloroethane, chloroform, tetrahydrofuran, N,N-Dimethylformamide, dimethylacetamide, dimethylsulfoxide, acetonitrile, propionitrile, and the like.

First Step

In a first step, an intermediate and a compound (I) are dissolved in an organic solvent (such as dichloromethane), and the reaction is carried out in the presence of a base. A precursor (Bpre) is obtained by carrying out filtration, concentration and the like.

[In the formula, R^(b01) and V^(b01) are defined the same as R^(b01) and V^(b11) in Formula (bd1-r-an1), respectively. (M₁″^(m+))_(1/m) represents an ammonium cation. Rx⁵, Rx⁶, Rz¹ to Rz⁴, R⁰²¹, n1, n11, R⁰²², n2 and n21 are defined the same as Rx⁵, Rx⁶, Rz¹ to Rz⁴, R^(° 21), n1, n11, R⁰²², n2 and n21 in Formula (bd1-an3), provided that at least one of Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ has an anionic group represented by Formula (b1-r-an10), and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more.]

Examples of the base to be added in the first step include an organic base such as triethylamine, 4-dimethylaminopyridine, pyridine, ethyldiisopropylaminocarbodiimide (EDCI) hydrochloride, dicyclohexylcarboximide (DCC), diisopropylcarbodiimide, carbodiimidazole or the like; an inorganic base such as sodium hydride, K₂CO₃, Cs₂CO₃ or the like; and the like.

A cation moiety of the compound (I) may be an ammonium cation derived from an aliphatic amine or an ammonium cation derived from an aromatic amine.

An amount of the compound (I) used is preferably about 1 to 3 equivalents, more preferably 1 to 2 equivalents, with respect to the intermediate.

A reaction temperature is preferably 0° C. to 50° C., more preferably 5° C. to 40° C.

Second Step

In a second step, the precursor (Bpre) and a compound (II) for salt exchange are reacted in a solvent such as water, dichloromethane, acetonitrile, chloroform or the like. Salt exchange is carried out between the precursor (Bpre) and an organic cation in the compound (II), thereby obtaining a target compound (B1-0).

[In the formula, R^(b01) and V^(b01) are defined the same as R^(b01) and V^(b01) in Formula (b1-r-an10), respectively. (M₁″^(m+))_(1/m) represents an ammonium cation. Rx⁵, Rx⁶, Rz¹ to Rz⁴, R⁰²¹, n1, n11, R⁰²², n2 and n21 are defined the same as Rx⁵, Rx⁶, Rz¹ to Rz⁴, R⁰²¹ n1, n11, R⁰²², n2 and n21 in Formula (bd1-an3), provided that at least one of Rx⁵ and Rx⁶ and Rz¹ to Rz⁴ has an anionic group represented by Formula (b1-r-an10), and the whole anion moiety is an n-valent anion. n represents an integer of 1 or more. Z⁻ represents a non-nucleophilic ion. (M^(m+))_(1/m) represents an m-valent organic cation and is the same as above.]

Examples of Z⁻ include a halogen ion such as a bromine ion, a chloride ion or the like; an ion which can be an acid having a lower acidity than that of the precursor (Bpre); BF₄ ⁻; AsF₆ ⁻, SbF₆ ⁻; PF₆ ⁻; ClO₄ ⁻; and the like.

A reaction temperature is preferably about 0° C. to 100° C., and more preferably about 0° C. to 50° C.

Reaction time varies depending on reactivity of the precursor (Bpre) with the compound (II) for salt exchange, the reaction temperature, and the like; in general, 10 minutes to 24 hours is preferable, and 10 minutes to 12 hours is more preferable.

After the salt exchange reaction is completed, the compounds in the reaction solution may be isolated and purified. For isolation and purification, conventionally known methods can be used. For example, concentration, solvent extraction, distillation, crystallization, recrystallization, chromatography and the like can be used in combination as appropriate.

A structure of the compound thus obtained as described above can be identified by a typical organic analysis method such as ¹H-nuclear magnetic resonance (NMR) spectroscopy, ¹³C-NMR spectroscopy, ¹⁹F-NMR spectroscopy, infrared absorption (IR) spectroscopy, mass spectrometry (MS), elemental analysis, X-ray crystal diffraction or the like.

The intermediate is appropriately selected in accordance with the target compound (B1-0), and examples thereof include a product of the Diels-Alder reaction represented by the following reaction formula. Anthracene or a derivative thereof may be used as the “Starting Material 1” in the following reaction formula. A compound having an ethylenic double bond such as an acrylic ester can be used as the “Starting Material 2” in the following reaction formula.

Examples of the intermediates also include triptycene or derivatives thereof.

[In the formula, Rx₁′ to Rx₄′ are defined the same as Rx₁ to Rx₄ as described above. Ry₁′ to Ry₂′ are defined the same as Ry¹ and Ry² as described above.

represents a triple bond or a double bond.

represents a double bond or a single bond. Rz₁′ to Rz₄′ are defined the same as Rz₁ to Rz₄ as described above, provided that at least one of Rx₁′ to Rx₄′, Ry₁′ to Ry₂′ and Rz₁′ to Rz₄′ is a leaving group-containing group capable of introducing an anionic group.]

Examples of the leaving group-containing group capable of introducing an anionic group include a halogen atom, a group containing a halogen atom, and a group having a dehydratable/condensable substituent (such as a hydroxyl group, a carboxy group or the like).

In a case where the esterification reaction is used as a method for introducing an anionic group, examples of the leaving group-containing group include dehydratable/condensable substituents. For example, the intermediate in the reaction formula shown in the first step preferably has a dehydratable/condensable substituent (such as a hydroxyl group, a carboxy group or the like). The esterification reaction is carried out in the first step to obtain a sulfinate ammonium salt, which is the precursor (Bpre).

In a case where a reaction between an ammonium salt having an anionic group into which a tosyl group is introduced and a lithium compound having a ring structure of an anion skeleton (derived from the Diels-Alder reaction) is used as a method for introducing an anionic group, examples of the leaving group-containing group include a halogen atom or a group containing a halogen atom, and preferred is a bromine atom. An intermediate containing a halogen atom (preferably a bromine atom) is lithiated to form a Li-compound, which is then reacted with an ammonium salt having an anionic group into which a tosyl group is introduced, thereby obtaining a sulfonate ammonium salt which is a precursor.

In a case where a method in which an intermediate containing a halogen atom is sulfinized to obtain a sulfinate and then oxidized the sulfinate to obtain a sulfonate is used as a method for introducing an anionic group, examples of the leaving group-containing group include a halogen atom or a group containing a halogen atom, and preferred is a bromine atom. An intermediate containing a halogen atom (preferably a bromine atom) is converted to a sulfinate ammonium salt by using a sulfinating agent in the presence of an amine, and is further reacted with an oxidizing agent, thereby obtaining a sulfonate ammonium salt which is a precursor.

The target compound (component (BD1)) can be obtained by carrying out the salt exchange of second step for the sulfonate ammonium salt which is the precursor.

<Component (S): Organic Solvent Component>

The resist composition of the present embodiment may be produced by dissolving the resist materials in an organic solvent component (“component (S)”).

The component (S) contains an organic solvent (S1) (hereinafter also referred to as a “component (S1)”) which has a hydroxyl group.

Component (S1)

The component (S1) is an organic solvent having a hydroxyl group. In the resist composition of the present embodiment, the combination of the component (S1) and the compound (BD1) improves the lithography characteristics (roughness, sensitivity, etc.) and suppresses occurrence of foreign substances/flaws in a coating film.

The component (S1) is not particularly limited as long as it is an organic solvent having 1 or more hydroxyl groups and can dissolve the respective components to be used to obtain a uniform solution. Optional organic solvent can be appropriately selected from those which have been conventionally known as solvents for a chemically amplified resist composition and then used.

The number of hydroxyl groups in the component (S1) is preferably 1 to 3, more preferably 1 to 2, and still more preferably 1.

Examples of the component (S1) include (i) an organic solvent having an ester bond (—C(═O)—O—), (ii) an organic solvent having an ether bond (—O—) other than an ester bond, (iii) an organic solvent having a carbonyl group (ketone: —C(═O)—) other than an ester bond, (iv) alcohols other than (i) to (iii), and the like.

Examples of the organic solvent (i) having an ester bond include methyl lactate, ethyl lactate (EL), and the like.

Examples of the organic solvent (ii) having an ether bond other than an ester bond include alkylene glycol monoalkyl ethers such as propylene glycol monomethyl ether (PGME), ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol monophenyl ether, ethylene glycol mono-2-ethyl butyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, or the like; polyhydric alcohol partial ethers such as ether group-containing alkylene glycol monoalkyl ether compound, including diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, and the like; and the like. Among these, as the organic solvent having an ether bond other than an ester bond, an alkylene glycol monoalkyl ether is preferable, and PGME is more preferable.

Examples of the organic solvent (iii) having a carbonyl group (ketone) other than an ester bond include aliphatic keto alcohol such as 4-hydroxy-4-methyl-2-pentanone (diacetone alcohol), 4-hydroxy-2-pentanone, 4-hydroxy-2-butanone, 5-hydroxy-5-methyl-3-hexanone, 5-hydroxy-3-hexanone, 5-hydroxy-3-pentanone, 4-hydroxy-4-ethyl-2-hexanone, 4-hydroxy-2-hexanone or the like; alicyclic keto alcohol such as 3-hydroxy-1-cyclohexyl-3-methyl-1-butanone, 3-hydroxy-1-cyclohexyl-1-butanone, 3-hydroxy-1-cyclohexyl-3-propanone or the like; aromatic alcohol such as 3-hydroxy-1-phenyl-3-methyl-1-butanone, 3-hydroxy-1-phenyl-1-butanone, 3-hydroxy-1-phenyl-3-propanone or the like; and the like. Among these, as the organic solvent having a carbonyl group (ketone) other than an ester bond, an aliphatic keto alcohol is preferable, and diacetone alcohol (DAA) is more preferable.

Examples of the alcohols (iv) other than (i) to (iii) include monoalcohols such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol (IPA), n-butyl alcohol, sec-butyl alcohol, t-butyl alcohol, n-pentyl alcohol, isopentyl alcohol, 2-methylbutyl alcohol or the like; polyhydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol or the like; and the like. Among these, as the alcohols other than (i) to (iii), monoalkyl alcohols (preferably having 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms) and divalent alkylene alcohols (preferably having 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms) are preferable, and isopropyl alcohol, t-butyl alcohol and ethylene glycol are more preferable.

Among these, the component (S1) is preferably one or more organic solvents selected from the group consisting of PGME, IPA, t-butyl alcohol, diacetone alcohol (DAA) and ethylene glycol.

The component (S1) may be used alone or in combination of two or more kinds thereof.

The content of the component (S1) in the component (S) is preferably 10 parts by mass or more, and more preferably 20 parts by mass or more, with respect to 100 parts by mass of the component (S). 100 parts by mass of the component (S1) may be allowable. By setting the content of the component (S1) in the component (S) to be greater than or equal to the lower limit, solubility or dispersibility of the component (BD1) to the component (S) is improved, and occurrence of foreign substances/flaws in a coating film can be effectively suppressed.

Component (S2)

The component (S) may contain an organic solvent (S2) having no hydroxyl group (hereinafter also referred to as a “component (S2)”), in addition to the component (S1).

The component (S2) may be any organic solvent which has no hydroxyl group and can dissolve the respective components to be used to obtain a uniform solution, and one or two or more kinds of optional organic solvents can be appropriately selected from those which have been conventionally known as solvents for a chemically amplified resist and then used.

Examples of the component (S2) include lactones such as γ-butyrolactone (GBL) or the like; ketones such as acetone, methyl ethyl ketone, cyclohexanone (CH), ethyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone; compounds having an ester bond, such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, dipropylene glycol monoacetate, or the like; alkylene glycol monoalkyl ether carboxylate compounds such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monomethyl ether propionate, or the like; cyclic ethers such as dioxane; esters such as methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, ethyl ethoxypropionate, or the like; aromatic organic solvents such as anisole, ethylbenzylether, cresylmethylether, diphenylether, dibenzylether, phenetole, butylphenylether, ethylbenzene, diethylbenzene, pentylbenzene, isopropylbenzene, toluene, xylene, cymene, mesitylene, or the like; dimethylsulfoxide (DMSO); and the like. Among these, the component (S2) is preferably one or more organic solvents selected from the group consisting of PGMEA, γ-butyrolactone (GBL) and cyclohexanone (CH).

The component (S2) may be used alone or in combination of two or more kinds thereof.

The content of the component (S2) in the component (S) is preferably 90 parts by mass or less, and more preferably 80 parts by mass or less, with respect to 100 parts by mass of the component (S). 0 part by mass of the component (S2) may be allowable. By setting the content of the component (S2) in the component (S) to be lower than or equal to the upper limit, solubility or dispersibility of the component (BD1) to the component (S) is improved, and occurrence of foreign substances/flaws in a coating film can be effectively suppressed.

In the resist composition of the present embodiment, the component (S) may contain the component (S1) only, or may be a mixed solvent of the component (S1) and the component (S2). In a case where the component (S) is a mixed solvent of the component (S1) and the component (S2), the component (S1) is preferably one or more organic solvents selected from the group consisting of PGME, IPA, t-butyl alcohol, diacetone alcohol (DAA) and ethylene glycol, and the component (S2) is preferably one or more organic solvents selected from the group consisting of PGMEA, γ-butyrolactone (GBL) and cyclohexanone (CH).

In a case where the component (S) is a mixed solvent of the component (S1) and the component (S2), the blending ratio (mass ratio) of the component (S1) to the component (S2) (S1:S2) is preferably 1:9 to 9:1, and more preferably 3:7 to 8:2.

The amount of the component (S) is not particularly limited, and is appropriately adjusted to a concentration which enables coating of a coating solution to a substrate, depending on the thickness of the coating film. In general, the component (S) is used in an amount such that the solid content of the resist composition becomes in the range of 0.1% to 20% by mass and preferably in a range of 0.2% to 15% by mass.

<Optional Components>

The resist composition of the present embodiment may further contain components (optional components) other than the component (A), the compound (BD1) (the component (B1) and the component (D1)) and the component (S) described above.

Examples of such optional components include the following components (B2), (D2), (D3), (E), and (F).

<<Component (B2)>>

The resist composition of the present embodiment may further contain an acid generator component (hereinafter, referred to as a “component (B2)”) other than the component (B1) in a range not damaging the effects of the present invention.

The component (B2) is not particularly limited, and those which have been proposed as an acid generator for a chemically amplified resist composition in the related art can be used.

Examples of these acid generators are numerous and include onium salt-based acid generators such as iodonium salts, sulfonium salts, or the like; oxime sulfonate-based acid generators; diazomethane-based acid generators such as bisalkyl or bisaryl sulfonyl diazomethanes, poly(bis-sulfonyl)diazomethanes, or the like; nitrobenzylsulfonate-based acid generators; iminosulfonate-based acid generators; disulfone-based acid generators; and the like.

As the onium salt-based acid generator, a compound represented by Formula (b-1) (hereinafter, also referred to as a “component (b-1)”), a compound represented by Formula (b-2) (hereinafter, also referred to as a “component (b-2)”) or a compound represented by Formula (b-3) (hereinafter, also referred to as a “component (b-3)”) can be used. Further, the component (b-1) does not contain a compound corresponding to the above-described component (B1).

[In the formulae, R¹⁰¹ and R¹⁰⁴ to R¹⁰⁸ each independently represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, provided that R¹⁰⁴ and R¹⁰⁵ may be bonded to each other to form a ring. R¹⁰² represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. Y¹⁰¹ represents a single bond or a divalent linking group containing an oxygen atom. V¹⁰¹ to V¹⁰³ each independently represents a single bond, an alkylene group, or a fluorinated alkylene group. L¹⁰¹ and L¹⁰² each independently represents a single bond or an oxygen atom. L¹⁰³ to L¹⁰⁵ each independently represents a single bond, —CO— or —SO₂—. m represents an integer of 1 or more. M′^(m+) represents an m-valent onium cation.]

[Anion Moiety]

Anion Moiety of Component (b-1)

In Formula (b-1), R¹⁰¹ represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent. R¹⁰¹ is defined the same as the hydrocarbon group which may have a substituent (the cyclic group which may have a substituent, the chain-like alkyl group which may have a substituent, or the chain-like alkenyl group which may have a substituent) as Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ (hereinafter collectively referred to as “Rx¹ to Rx⁴”) in Formula (bd1).

Among the examples, as R¹⁰¹, a cyclic group which may have a substituent is preferable, and a cyclic hydrocarbon group which may have a substituent is more preferable. More specific preferred examples thereof include a phenyl group, a naphthyl group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) and (a2-r-3) to (a2-r-7), and a —SO₂-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4).

In Formula (b-1), Y¹⁰¹ represents a single bond or a divalent linking group containing an oxygen atom.

In a case where Y¹⁰¹ represents a divalent linking group containing an oxygen atom, Y¹⁰¹ may contain an atom other than an oxygen atom. Examples of atoms other than an oxygen atom include a carbon atom, a hydrogen atom, a sulfur atom, a nitrogen atom and the like.

Examples of the divalent linking group having an oxygen atom include linking groups represented by Formulae (y-a1-1) to (y-a1-8).

Y¹⁰¹ represents preferably a divalent linking group containing an ester bond or a divalent linking group containing an ether bond and more preferably linking groups represented by Formulae (y-a1-1) to (y-a1-5).

In Formula (b-1), V¹⁰¹ represents a single bond, an alkylene group, or a fluorinated alkylene group. The alkylene group and the fluorinated alkylene group as V¹⁰¹ preferably have 1 to 4 carbon atoms. Examples of the fluorinated alkylene group as V¹⁰¹ include a group in which some or all hydrogen atoms in the alkylene group as V¹⁰¹ have been substituted with fluorine atoms. Among these examples, as V¹⁰¹, a single bond or a fluorinated alkylene group having 1 to 4 carbon atoms is preferable.

In Formula (b-1), R¹⁰² represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. R¹⁰² represents preferably a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms and more preferably a fluorine atom.

As a specific example of the anion moiety of the component (b-1), in a case where Y¹⁰¹ represents a single bond, a fluorinated alkylsulfonate anion such as a trifluoromethanesulfonate anion, a perfluorobutanesulfonate anion or the like can be exemplified; and in a case where Y¹⁰¹ represents a divalent linking group containing an oxygen atom, anions represented by Formulae (an-1) to (an-3) shown below can be exemplified.

[In the formulae, R″¹⁰¹ represents an aliphatic cyclic group which may have a substituent, a monovalent heterocyclic group represented by any of Formulae (r-hr-1) to (r-hr-6), or a chain-like alkyl group which may have a substituent. R″¹⁰² represents an aliphatic cyclic group which may have a substituent, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) and (a2-r-3) to (a2-r-7), or a —SO₂-containing cyclic group represented by any of Formulae (a5-r-1) to (a5-r-4). R″¹⁰³ represents an aromatic cyclic group which may have a substituent, an aliphatic cyclic group which may have a substituent, or a chain-like alkenyl group which may have a substituent.

V″¹⁰¹ represents an alkylene group having 1 to 4 carbon atoms, or a fluorinated alkylene group having 1 to 4 carbon atoms. R¹⁰² represents a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. Each v″ independently represents an integer of 0 to 3. Each q″ independently represents an integer of 1 to 20. n″ represents 0 or 1.]

As the aliphatic cyclic group as R″¹⁰¹, R″¹⁰², and R″¹⁰³ which may have a substituent, the same groups exemplified as the cyclic aliphatic hydrocarbon group as Rx¹ to Rx⁴ in Formula (bd1) described above are preferable. As the substituent, the same groups as the substituents with which the cyclic aliphatic hydrocarbon group as Rx¹ to Rx⁴ in Formula (bd1) may be substituted can be exemplified.

As the aromatic cyclic group as R″¹⁰³ which may have a substituent, the same groups exemplified as the aromatic hydrocarbon group for the cyclic hydrocarbon group as Rx¹ to Rx⁴ in Formula (bd1) described above are preferable. As the substituent, the same groups as the substituents with which the aromatic hydrocarbon group as Rx¹ to Rx⁴ in Formula (bd1) may be substituted can be exemplified.

As the chain-like alkyl group as R″¹⁰¹ which may have a substituent, the same groups exemplified as the chain-like alkyl group as Rx¹ to Rx⁴ in Formula (bd1) are preferable. As the chain-like alkenyl group as R″¹⁰³ which may have a substituent, the same groups exemplified as the chain-like alkenyl group as Rx¹ to Rx⁴ in Formula (bd1) are preferable.

Anion Moiety of Component (b-2)

In Formula (b-2), R¹⁰⁴ and R¹⁰⁵ each independently represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, which are the same as a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent as Rx¹ to Rx⁴ in Formula (bd1). Here, R¹⁰⁴ and R¹⁰⁵ may be bonded to each other to form a ring.

As R¹⁰⁴ and R¹⁰⁵, a chain-like alkyl group which may have a substituent is preferable, and a linear or branched alkyl group or a linear or branched fluorinated alkyl group is more preferable.

The chain-like alkyl group has preferably 1 to 10 carbon atoms, more preferably 1 to 7 carbon atoms, and still more preferably 1 to 3 carbon atoms. It is preferable that the number of carbon atoms in the chain-like alkyl group as R¹⁰⁴ and R¹⁰⁵ is smaller because the solubility in a solvent for a resist is also excellent in the range of the number of carbon atoms. Further, in the chain-like alkyl group as R¹⁰⁴ and R¹⁰⁵, it is preferable that the number of hydrogen atoms substituted with fluorine atoms is as large as possible because the acid strength increases. The proportion of fluorine atoms in the chain-like alkyl group, that is, the fluorination ratio is preferably in a range of 70% to 100% and more preferably in a range of 90% to 100%, and it is most preferable that the chain-like alkyl group is a perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms.

In Formula (b-2), V¹⁰² and V¹⁰³ each independently represents a single bond, an alkylene group, or a fluorinated alkylene group, and has the same definition as that for V¹⁰¹ in Formula (b-1).

In Formula (b-2), L¹⁰¹ and L¹⁰² each independently represents a single bond or an oxygen atom.

Anion Moiety of Component (b-3)

In Formula (b-3), R¹⁰⁶ to R¹⁰⁸ each independently represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, which are the same as a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent as Rx¹ to Rx⁴ in Formula (bd1).

L¹⁰³ to L¹⁰⁵ each independently represents a single bond, —CO—, or —SO₂—.

[Cation Moiety]

In Formulae (b-1), (b-2), and (b-3), m represents an integer of 1 or greater, M′^(m+) represents an m-valent onium cation and preferably a sulfonium cation or an iodonium cation. For example, an organic cation represented by any of Formulae (ca-1-1) to (ca-1-17), (ca-1-20) to (ca-1-78), and (ca-1-101) to (ca-1-149) is preferable.

Moreover, examples of M′^(m+) in Formulae (b-1), (b-2) and (b-3) also include diphenyliodonium cation, bis(4-tert-butylphenyl) iodonium cation, cations respectively represented by Formulae (ca-3-1) to (ca-3-6), and cations respectively represented by the Formulae (ca-4-1) to (ca-4-2).

Among the examples, as the cation moiety [(M′^(m+))_(1/m)], an organic cation represented by any of Formulae (ca-1-1) to (ca-1-17), (ca-1-20) to (ca-1-78), and (ca-1-101) to (ca-1-149) is more preferable.

In the resist composition of the present embodiment, the component (B2) may be used alone or in combination of two or more kinds thereof.

In a case where the resist composition contains the component (B2), the content of the component (B2) in the resist composition is preferably 50 parts by mass or less, more preferably in a range of 1 to 40 parts by mass, and still more preferably in a range of 5 to 30 parts by mass with respect to 100 parts by mass of the component (A).

In a case where the resist composition contains the component (B2), the content of the component (B2) in the whole acid generator component (B) which generates an acid acting on the component (A) in the resist composition is preferably 50% by mass or less, more preferably 30% by mass or less, and still more preferably 0% by mass to 5% by mass.

By setting the content of the component (B2) to be in the above-described range, pattern formation is sufficiently performed.

[Component (D2)]

The component (D2) is a base component and a photodisintegrable base (here, a component corresponding to the component (D1) is excluded), which is decomposed upon exposure and loses acid diffusion controllability.

In a case where a resist composition containing the component (D2) is obtained, the contrast between exposed portions and unexposed portions of the resist film can be further improved at the time of formation of a resist pattern.

The component (D2) is not particularly limited as long as it decomposes upon exposure and loses acid diffusion controllability, and is preferably one or more compounds selected from the group consisting of a compound represented by the following Formula (d2-1) (hereinafter referred to as a “component (d2-1)”), a compound represented by the following Formula (d2-2) (hereinafter referred to as a “component (d2-2)”), and a compound represented by the following Formula (d2-3) (hereinafter referred to as a “component (d2-3)”).

The components (d2-1) to (d2-3) are decomposed and then lose the acid diffusion controllability (basicity), and therefore the components (d2-1) to (d2-3) cannot act as a quencher at the exposed portions of the resist film, whereas the components (d2-1) to (d2-3) acts as a quencher at the unexposed portions of the resist film.

[In the formulae, Rd¹ to Rd⁴ represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, provided that, the carbon atom adjacent to the sulfur atom in the Rd² in Formula (d2-2) has no fluorine atom bonded thereto. Yd¹ represents a single bond or a divalent linking group. m represents an integer of 1 or more. Each M′^(m+) independently represents an m-valent onium cation.]

[Component (d2-1)]

Anion Moiety

In Formula (d2-1), Rd¹ represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, and examples thereof are the same as those described above as Rx¹ to Rx⁴ in Formula (bd1).

Among these, as the group as Rd¹, an aromatic hydrocarbon group which may have a substituent, an aliphatic cyclic group which may have a substituent and a chain-like alkyl group which may have a substituent are preferable.

Examples of the substituent which these groups may have include a hydroxyl group, an oxo group, an alkyl group, an aryl group, a fluorine atom, a fluorinated alkyl group, a lactone-containing cyclic group represented by any of Formulae (a2-r-1) to (a2-r-7), an ether bond, an ester bond, and a combination thereof. In a case where an ether bond or an ester bond is included as the substituent, the substituent may be bonded via an alkylene group, and a linking group represented by any of Formulae (y-a1-1) to (y-a1-5) is preferable as the substituent.

Preferable examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, and a polycyclic structure (for example, a polycyclic structure formed of a ring structure having a bicyclooctane skeleton and a ring structure other than the bicyclooctane skeleton) containing a bicyclooctane skeleton.

Examples of the aliphatic cyclic group include groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbomane, isobomane, tricyclodecane or tetracyclododecane.

The chain-like alkyl group preferably has 1 to 10 carbon atoms, and specific examples thereof include a linear alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, or the like; and a branched alkyl group such as a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group, a 4-methylpentyl group, or the like.

In a case where the chain-like alkyl group is a fluorinated alkyl group having a fluorine atom or a fluorinated alkyl group as a substituent, the fluorinated alkyl group has preferably 1 to 11 carbon atoms, more preferably 1 to 8 carbon atoms, and still more preferably 1 to 4 carbon atoms. The fluorinated alkyl group may contain an atom other than fluorine. Examples of the atom other than fluorine include an oxygen atom, a sulfur atom, and a nitrogen atom.

As Rd¹, a fluorinated alkyl group in which some or all hydrogen atoms constituting a linear alkyl group have been substituted with fluorine atom(s) is preferable, and a fluorinated alkyl group in which all of the hydrogen atoms constituting a linear alkyl group have been substituted with fluorine atoms (a linear perfluoroalkyl group) is particularly preferable.

Specific examples of preferable anion moieties of the component (d2-1) are shown below.

Cation Moiety

In Formula (d2-1), M′^(m+) represents an m-valent onium cation.

The onium cation of M′^(m+) can be appropriately selected from the same cations exemplified as M′^(m+) in the Formulae (b-1) to (b-3).

The component (d2-1) may be used alone or in combination of two or more kinds thereof.

[Component (d2-2)]

Anion Moiety

In Formula (d2-2), Rd² represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, and examples thereof are the same as those described above as Rx¹ to Rx⁴ in Formula (bd1).

Here, the carbon atom adjacent to the sulfur atom in Rd² has no fluorine atom bonded thereto (the carbon atom adjacent to the sulfur atom in Rd² is not substituted with a fluorine atom). As a result, the anion of the component (d2-2) becomes an appropriately weak acid anion, thereby improving the quenching ability of the component (D2).

As Rd², a chain-like alkyl group which may have a substituent or an aliphatic cyclic group which may have a substituent is preferable. The chain-like alkyl group has preferably 1 to 10 carbon atoms and more preferably 3 to 10 carbon atoms. As the aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from adamantane, norbornane, isobomane, tricyclodecane, or tetracyclododecane (which may have a substituent) and a group in which one or more hydrogen atoms have been removed from camphor are more preferable.

The hydrocarbon group as Rd² may have a substituent. As the substituent, the same groups as the substituents which may be included in the hydrocarbon group (such as an aromatic hydrocarbon group, an aliphatic cyclic group, or a chain-like alkyl group) as Rd¹ in Formula (d2-1) can be exemplified.

Specific examples of preferable anion moieties for the component (d2-2) are shown below.

Cation Moiety

In Formula (d2-2), M′^(m+) represents an m-valent onium cation, and has the same definition as that for M′^(m+) in Formula (d2-1).

The component (d2-2) may be used alone or in combination of two or more kinds thereof.

[Component (d2-3)]

Anion Moiety

In Formula (d2-3), Rd³ represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, and the same groups as those described above as Rx¹ to Rx⁴ in Formula (bd1) are exemplified, and a cyclic group containing a fluorine atom, a chain-like alkyl group, or a chain-like alkenyl group is preferable. Among these, a fluorinated alkyl group is preferable, and the same fluorinated alkyl groups as those described above as Rd¹ are more preferable.

In Formula (d2-3), Rd⁴ represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent or a chain-like alkenyl group which may have a substituent, and the same groups as those described above as Rx¹ to Rx⁴ in Formula (bd1) are exemplified.

Among these, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, an alkenyl group which may have a substituent, or a cyclic group which may have a substituent is preferable.

The alkyl group as Rd⁴ is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, a neopentyl group, and the like. Some hydrogen atoms in the alkyl group as Rd⁴ may be substituted with a hydroxyl group, a cyano group, or the like.

The alkoxy group as Rd⁴ is preferably an alkoxy group having 1 to 5 carbon atoms, and specific examples of the alkoxy group having 1 to 5 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, a tert-butoxy group, and the like. Among these, a methoxy group or an ethoxy group is preferable.

Examples of the alkenyl group as Rd⁴ are the same groups as those exemplified as the alkenyl as Rx¹ to Rx⁴ in Formula (bd1), and a vinyl group, a propenyl group (an allyl group), a 1-methylpropenyl group, and a 2-methylpropenyl group are preferable. These groups may have an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms as a substituent.

As the cyclic group as Rd⁴, the same groups as those described above as Rx¹ to Rx⁴ in Formula (bd1) can be exemplified. Among these, as the cyclic group, an alicyclic group in which one or more hydrogen atoms have been removed from a cycloalkane such as cyclopentane, cyclohexane, adamantane, norbornane, isobomane, tricyclodecane, tetracyclododecane, or the like, or an aromatic group such as a phenyl group, a naphthyl group or the like is preferable. In a case where Rd⁴ represents an alicyclic group, the resist composition can be satisfactorily dissolved in an organic solvent, thereby improving the lithography characteristics.

In Formula (d2-3), Yd¹ represents a single bond or a divalent linking group.

The divalent linking group as Yd¹ is not particularly limited, and examples thereof include a divalent hydrocarbon group (an aliphatic hydrocarbon group or an aromatic hydrocarbon group) which may have a substituent and a divalent linking group containing a hetero atom. The divalent linking groups are the same as described above as the divalent hydrocarbon group which may have a substituent and the divalent linking group containing a hetero atom explained above as the divalent linking group as Ya^(x1) in Formula (a10-1).

As Yd¹, a carbonyl group, an ester bond, an amide bond, an alkylene group, or a combination of these is preferable. As the alkylene group, a linear or branched alkylene group is more preferable, and a methylene group or an ethylene group is still more preferable.

Specific examples of preferable anion moieties for the component (d2-3) are shown below.

Cation Moiety

In Formula (d2-3), M′^(m+) represents an m-valent onium cation, and has the same definition as that for M′^(m+) in Formula (d2-1).

The component (d2-3) may be used alone or in combination of two or more kinds thereof.

As the component (D2), only one of the components (d2-1) to (d2-3) described above or a combination of two or more kinds thereof may be used.

In a case where the resist composition contains the component (D2), the content of the component (D2) in the resist composition is preferably in a range of 0.5 to 10 parts by mass, more preferably in a range of 0.5 to 8 parts by mass, and still more preferably in a range of 1 to 6 parts by mass with respect to 100 parts by mass of the component (A).

In a case where the resist composition contains the component (D2), the content of the component (D2) in the entire base component (D) that traps an acid generated from the component (B) upon exposure in the resist composition is, for example, 50% by mass or less, preferably 30% by mass or less, and more preferably 0% by mass to 5% by mass.

In a case where the content of the component (D2) is greater than or equal to the preferable lower limit, excellent lithography characteristics and an excellent resist pattern shape can be more reliably obtained. On the other hand, balance with other components can be taken as it is lower than or equal to the upper limit, and various lithography characteristics become good.

[Method for Producing Component (D2)]

The production methods of the components (d2-1) and (d2-2) are not particularly limited, and the components (d2-1) and (d2-2) can be produced by known methods.

Further, the method of producing the component (d2-3) is not particularly limited, and the component (d2-3) can be produced in the same manner as disclosed in United States Patent Application, Publication No. 2012-0149916.

[Component (D3)]

The component (D3) is a base component and is a nitrogen-containing organic compound component (here, a component corresponding to the component (D1) or (D2) is excluded) that acts as an acid diffusion control agent in the resist composition.

The component (D3) is not particularly limited as long as it acts as an acid diffusion control agent and does not correspond to the components (D1) and (D2). Examples thereof include compounds including an anion moiety and a cation moiety, aliphatic amines and the like.

Examples of the compound including the anion moiety and the cation moiety as the component (D3) include those in which the cation moiety is an ammonium cation as the components (d2-1) to (d2-3). Examples of the ammonium cation include a cation (primary to quaternary ammonium cations) in which NH₄, or H bonded to its nitrogen atom is substituted with a hydrocarbon group which may have a hetero atom, or a cyclic cation forming a ring with the nitrogen atom thereof.

Among the aliphatic amines, secondary aliphatic amines and tertiary aliphatic amines are preferable. An aliphatic amine is an amine having one or more aliphatic groups, and the aliphatic groups preferably have 1 to 12 carbon atoms.

Examples of these aliphatic amines include amines in which at least one hydrogen atom of ammonia (NH₃) has been substituted with an alkyl group or hydroxyalkyl group having 12 or less carbon atoms (alkylamines or alkylalcoholamines), and cyclic amines.

Specific examples of alkylamines and alkylalcoholamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, dicyclohexylamine, or the like; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-hexylamine, tri-n-pentylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, tri-n-dodecylamine, or the like; and alkylalcoholamines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, tri-n-octanolamine, or the like. Among these, trialkylamines of 5 to 10 carbon atoms are preferable, and tri-n-pentylamine and tri-n-octylamine are particularly preferable.

Examples of the cyclic amine include heterocyclic compounds containing a nitrogen atom as a hetero atom. The heterocyclic compound may be a monocyclic compound (aliphatic monocyclic amine), or a polycyclic compound (aliphatic polycyclic amine).

Specific examples of the aliphatic monocyclic amine include piperidine and piperazine.

The aliphatic polycyclic amine preferably has 6 to 10 carbon atoms, and specific examples thereof include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, 1,4-diazabicyclo[2.2.2]octane and the like.

Examples of other aliphatic amines include tris(2-methoxymethoxyethyl)amine, tris {2-(2-methoxyethoxy)ethyl}amine, tris {2-(2-methoxyethoxymethoxy)ethyl}amine, tris {2-(1-methoxyethoxy)ethyl}amine, tris {2-(1-ethoxyethoxy)ethyl}amine, tris {2-(1-ethoxypropoxy)ethyl}amine, tris[2-{2-(2-hydroxyethoxy)ethoxy}ethyl] amine, triethanolamine triacetate and the like, and triethanolamine triacetate is preferable.

Further, as the component (D3), an aromatic amine may be used.

Examples of aromatic amines include 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole and derivatives thereof as well as tribenzylamine, 2,6-diisopropylaniline and N-tert-butoxycarbonylpyrrolidine.

The component (D3) may be used alone or in combination of two or more kinds thereof.

In a case where the resist composition contains the component (D3), the content of the component (D3) in the resist composition is typically in a range of 0.01 to 5 parts by mass with respect to 100 parts by mass of the component (A). In a case where the content thereof is in the above-described range, the component (D3) and other components can be balanced, and various lithography characteristics are enhanced.

[Compound (E): at least one compound selected from group consisting of organic carboxylic acids, phosphorus oxo acids, and derivatives thereof]

For the purpose of preventing any deterioration in sensitivity, and improving the resist pattern shape and the post exposure temporal stability, the resist composition of the present embodiment may contain at least one compound (E) (hereinafter referred to as a “component (E)”) selected from the group consisting of an organic carboxylic acid, or a phosphorus oxo acid and a derivative thereof.

Examples of suitable organic carboxylic acids include acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid.

Examples of phosphorus oxo acids include phosphoric acid, phosphonic acid, and phosphinic acid. Among these, phosphonic acid is particularly preferable.

Examples of phosphorus oxo acid derivatives include esters in which a hydrogen atom in the above-described oxo acids is substituted with a hydrocarbon group. Examples of the hydrocarbon group include an alkyl group having 1 to 5 carbon atoms and an aryl group having 6 to 15 carbon atoms.

Examples of phosphoric acid derivatives include phosphoric acid esters such as di-n-butyl phosphate and diphenyl phosphate.

Examples of phosphonic acid derivatives include phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate.

Examples of phosphinic acid derivatives include phosphinic acid esters and phenylphosphinic acid.

In the resist composition of the present embodiment, the component (E) may be used alone or in combination of two or more kinds thereof.

In a case where the resist composition contains the component (E), the content of the component (E) is typically in a range of 0.01 to 5 parts by mass, with respect to 100 parts by mass of the component (A).

[Component (F): Fluorine Additive Component]

In the present embodiment, the resist composition may further include a fluorine additive (hereinafter, referred to as a “component (F)”) for imparting water repellency to the resist film and for improving lithography characteristics.

As the component (F), a fluorine-containing polymeric compound described in Japanese Unexamined Patent Application, First Publication No. 2010-002870, Japanese Unexamined Patent Application, First Publication No. 2010-032994, Japanese Unexamined Patent Application, First Publication No. 2010-277043, Japanese Unexamined Patent Application, First Publication No. 2011-13569, and Japanese Unexamined Patent Application, First Publication No. 2011-128226 can be exemplified.

Specific examples of the component (F) include polymers having a constitutional unit (f1) represented by Formula (f1-1) shown below. As the polymer, a polymer (homopolymer) formed of only a constitutional unit (f1) represented by Formula (f1-1) shown below; a copolymer of the constitutional unit (f1) and the constitutional unit (a1); and a copolymer of the constitutional unit (f1), a constitutional unit derived from acrylic acid or methacrylic acid and the above-described constitutional unit (a1) are preferable. As the constitutional unit (a1) to be copolymerized with the constitutional unit (f1), a constitutional unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate and a constitutional unit derived from 1-methyl-1-adamantyl (meth)acrylate are preferable.

[In the formula, R has the same definition as described above. Rf¹⁰² and Rf¹⁰³ each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, and Rf¹⁰² and Rf¹⁰³ may be the same as or different from each other. nf¹ represents an integer of 1 to 5, and Rf¹⁰¹ represents an organic group containing a fluorine atom.]

In Formula (f1-1), R bonded to the carbon atom at the α-position has the same definition as described above. As R, a hydrogen atom or a methyl group is preferable.

In Formula (f1-1), examples of the halogen atom as Rf¹⁰² and Rf¹⁰³ include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is particularly preferable. Examples of the alkyl group having 1 to 5 carbon atoms as Rf¹⁰² and Rf¹⁰³ include those described above as the alkyl group having 1 to 5 carbon atoms as R, and a methyl group or an ethyl group is preferable. Specific examples of the halogenated alkyl group having 1 to 5 carbon atoms as Rf¹⁰² and Rf¹⁰³ include groups in which some or all hydrogen atoms of the above-described alkyl groups of 1 to 5 carbon atoms have been substituted with halogen atoms.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is particularly preferable. Among these examples, as Rf¹⁰² and Rf¹⁰³, a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 5 carbon atoms is preferable, and a hydrogen atom, a fluorine atom, a methyl group, or an ethyl group is more preferable.

In Formula (f1-1), nf¹ represents an integer of 1 to 5, preferably an integer of 1 to 3, and more preferably an integer of 1 or 2.

In Formula (f1-1), Rf¹⁰¹ represents an organic group containing a fluorine atom, and is preferably a hydrocarbon group containing a fluorine atom.

The hydrocarbon group containing a fluorine atom may be linear, branched, or cyclic, and has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and particularly preferably 1 to 10 carbon atoms.

It is preferable that the hydrocarbon group having a fluorine atom has 25% or more of the hydrogen atoms in the hydrocarbon group fluorinated, more preferably 50% or greater, and particularly preferably 60% or greater from the viewpoint of improving the hydrophobicity of the resist film during immersion exposure.

Among these, as Rf¹⁰¹, a fluorinated hydrocarbon group having 1 to 6 carbon atoms is preferable, and a trifluoromethyl group, —CH₂—CF₃, —CH₂—CF₂—CF₃, —CH(CF₃)₂, —CH₂—CH₂—CF₃, and —CH₂—CH₂—CF₂—CF₂—CF₂—CF₃ are particularly preferable.

The weight average molecular weight (Mw) (in terms of polystyrene determined by gel permeation chromatography) of the component (F) is preferably in a range of 1,000 to 50,000, more preferably in a range of 5,000 to 40,000, and most preferably in a range of 10,000 to 30,000. In a case where the weight average molecular weight is less than or equal to the upper limit of the above-described range, the resist composition exhibits a satisfactory solubility in a solvent for a resist enough to be used as a resist. On the other hand, in a case where the weight average molecular weight is greater than or equal to the lower limit of the above-described range, water repellency of the resist film become excellent.

Further, the dispersity (Mw/Mn) of the component (F) is preferably in a range of 1.0 to 5.0, more preferably in a range of 1.0 to 3.0, and most preferably in a range of 1.2 to 2.5.

In the resist composition of the present embodiment, the component (F) may be used alone or in combination of two or more kinds thereof.

In a case where the resist composition contains the component (F), the content of the component (F) is typically in a range of 0.5 to 10 parts by mass, with respect to 100 parts by mass of the component (A).

As desired, other miscible additives can also be added to the resist composition of the present invention. The resist composition may contain miscible additives such as additive resins, dissolution inhibitors, plasticizers, stabilizers, colorants, halation prevention agents, and dyes for improving the performance of the resist film, as appropriate.

After dissolving the resist materials in the organic solvent (S), the resist composition of the present embodiment may have impurities or the like removed by using a polyimide porous film, a polyamide-imide porous film, or the like. For example, the resist composition may be subjected to filtration using a filter formed of a polyimide porous membrane, a filter formed of a polyamide-imide porous film, or a filter formed of a polyimide porous membrane and a polyamide-imide porous film. Examples of the polyimide porous membrane and the polyamide-imide porous film include those described in Japanese Unexamined Patent Application, First Publication No. 2016-155121.

The resist composition of the present embodiment contains the component (A), the component (S1), the component (BD1), and the optional components as required.

For example, in a case where the component (BD1) is used as the component (B1), the suitable resist composition contains the component (A), the component (S1), the component (B1), and the component (D2) or (D3). In a case where the component (BD1) is used as the component (D1), the suitable resist composition contains the component (A), the component (S1), the component (B2), and the component (D1).

Further, in a case where the component (BD1) is used as the component (B1) and the component (D1), the suitable resist composition contains the component (A), the component (S1), the component (B1), and the component (D1).

The resist composition of the present embodiment described above contains the compound (BD1) represented by Formula (bd1). The component (BD1) has a relatively high hydrophobicity since it has a specific structure (bulky structure) in which the anion moiety is mainly composed of a hydrocarbon. Accordingly, the compatibility between the compound (BD1) and the base material component (A) is enhanced, and the acid diffusivity in the resist film is appropriately controlled. Additionally, in the resist composition of the present embodiment, the component (S) contains the organic solvent (S1) having a hydroxyl group. Consequently, an appropriate polarity is imparted to the component (S), and interaction between the hydroxyl group of the organic solvent (S1) and the compound (BD1) occurs, whereby the compound (BD1) is appropriately dissolved in the resist composition. It is considered that the particles are dispersed to suppress occurrence of foreign substances/flaws at the time of forming a resist film. By containing the component (BD1) including the anion moiety and the cation moiety as well as the component (S1), according to the resist composition of the embodiment, it is considered that lithography characteristics (roughness reduction, etc.) are further improved, sensitivity is enhanced, and occurrence of defects can be suppressed.

By using the resist composition of the embodiment, uniformity of the compound (BD1) is enhanced in the formed resist film, whereby it is possible to easily form a high-resolution, well-shaped resist pattern with reduced roughness.

(Resist Pattern Forming Method)

The resist pattern forming method according to the second aspect of the present invention includes a step of forming a resist film on a support using the resist composition of the embodiment; a step of exposing the resist film; and a step of developing the exposed resist film to form a resist pattern.

According to one embodiment of the resist pattern forming method, a resist pattern forming method by performing processes as described below is exemplified.

First, a resist composition according to the embodiment is applied to a support using a spinner or the like, and a bake treatment (post applied bake (PAB)) is conducted under temperature conditions of 80° C. to 150° C. for 40 to 120 seconds and preferably 60 to 90 seconds, to form a resist film.

Following selective exposure of the thus formed resist film, by exposure through a mask having a predetermined pattern formed thereon (mask pattern) using an exposure apparatus such as an electron beam lithography apparatus or an EUV exposure apparatus, or by patterning via direct irradiation with an electron beam without using a mask pattern, baking treatment (post exposure baking (PEB)) is conducted under temperature conditions of 80° C. to 150° C. for 40 to 120 seconds, and preferably 60 to 90 seconds.

Next, the resist film is subjected to a developing treatment. The developing treatment is conducted using an alkali developing solution in a case of an alkali developing process, and a developing solution containing an organic solvent (organic developing solution) in a case of a solvent developing process.

After the developing treatment, it is preferable to conduct a rinse treatment. The rinse treatment is preferably conducted using pure water in a case of an alkali developing process, and a rinse liquid containing an organic solvent in a case of a solvent developing process.

In a case of a solvent developing process, after the developing treatment or the rinsing, the developing solution or the rinse liquid remaining on the pattern can be removed by a treatment using a supercritical fluid.

After the developing treatment or the rinse treatment, drying is conducted. As desired, bake treatment (post bake) can be conducted following the developing.

In this manner, a resist pattern can be formed.

The support is not specifically limited and a conventionally known support can be used. For example, substrates for electronic components, and such substrates having wiring patterns formed thereon can be used. Specific examples of the material of the substrate include metals such as silicon wafer, copper, chromium, iron and aluminum; and glass. Suitable materials for the wiring pattern include copper, aluminum, nickel, and gold.

Further, as the support, any one of the above-described supports provided with an inorganic and/or organic film on the surface thereof may be used. As the inorganic film, an inorganic antireflection film (inorganic BARC) can be used. As the organic film, an organic antireflection film (organic BARC) and an organic film such as a lower-layer organic film used in a multilayer resist method can be used.

Here, a “multilayer resist method” is method in which at least one layer of an organic film (lower-layer organic film) and at least one layer of a resist film (upper resist film) are provided on a substrate, and a resist pattern formed on the upper resist film is used as a mask to conduct patterning of the lower-layer organic film. This method is considered as being capable of forming a pattern with a high aspect ratio. More specifically, in the multilayer resist method, a desired thickness can be ensured by the lower-layer organic film, and as a result, the thickness of the resist film can be reduced, and an extremely fine pattern with a high aspect ratio can be formed.

The multilayer resist method is broadly classified into a method in which a double-layer structure consisting of an upper-layer resist film and a lower-layer organic film is formed (double-layer resist method), and a method in which a multilayer structure having at least three layers consisting of an upper-layer resist film, a lower-layer organic film and at least one intermediate layer (thin metal film or the like) provided between the upper-layer resist film and the lower-layer organic film (triple-layer resist method).

The wavelength to be used for exposure is not particularly limited and the exposure can be conducted using radiation such as an ArF excimer laser, a KrF excimer laser, an F2 excimer laser, extreme ultraviolet rays (EUV), vacuum ultraviolet rays (VUV), electron beams (EB), X-rays, and soft X-rays. The resist composition of the present invention is useful for a KrF excimer laser, an ArF excimer laser, EB, and EUV, more useful for an ArF excimer laser, EB, and EUV, and particularly useful for EB and EUV. That is, the resist pattern forming method according to the present embodiment is a particularly useful method when step of exposing the resist film includes exposing the resist film to extreme ultraviolet (EUV) or electron beam (EB).

The exposure of the resist film can be a general exposure (dry exposure) conducted in air or an inert gas such as nitrogen, or immersion exposure (immersion lithography).

In immersion lithography, the region between the resist film and the lens at the lowermost point of the exposure apparatus is pre-filled with a solvent (immersion medium) that has a larger refractive index than the refractive index of air, and the exposure (immersion exposure) is conducted in this state.

The immersion medium preferably exhibits a refractive index larger than the refractive index of air but smaller than the refractive index of the resist film to be exposed. The refractive index of the immersion medium is not particularly limited as long as it satisfies the above-described requirements.

Examples of this immersion medium which exhibits a refractive index that is larger than the refractive index of air but smaller than the refractive index of the resist film include water, fluorine-based inert liquids, silicon-based solvents, and hydrocarbon-based solvents.

Specific examples of the fluorine-based inert liquids include liquids containing a fluorine-based compound such as C₃HCl₂F₅, C₄F₉OCH₃, C₄F₉₀C₂H₅ or C₅H₃F₇ as the main component, and the boiling point is preferably in a range of 70° C. to 180° C. and more preferably in a range of 80° C. to 160° C. A fluorine-based inert liquid having a boiling point in the above-described range is advantageous in that the removal of the immersion medium after the exposure can be conducted by a simple method.

As a fluorine-based inert liquid, a perfluoroalkyl compound in which all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms is particularly preferable. Examples of these perfluoroalkyl compounds include perfluoroalkylether compounds and perfluoroalkylamine compounds.

Specifically, one example of a suitable perfluoroalkylether compound is perfluoro(2-butyl-tetrahydrofuran) (boiling point of 102° C.), and an example of a suitable perfluoroalkylamine compound is perfluorotributylamine (boiling point of 174° C.).

As the immersion medium, water is preferable in terms of cost, safety, environment and versatility.

As an example of the alkali developing solution used in an alkali developing process, a 0.1 to 10 mass % aqueous solution of tetramethylammonium hydroxide (TMAH) can be exemplified.

As the organic solvent contained in the organic developing solution used in a solvent developing process, any of the conventional organic solvents can be used which are capable of dissolving the component (A) (prior to exposure). Specific examples of the organic solvent include polar solvents such as ketone solvents, ester solvents, alcohol solvents, nitrile solvents, amide solvents and ether solvents, and hydrocarbon solvents.

A ketone solvent is an organic solvent containing C—C(═O)—C in the structure thereof. An ester solvent is an organic solvent containing C—C(═O)—O—C in the structure thereof. An alcohol solvent is an organic solvent containing an alcoholic hydroxyl group in the structure thereof. An “alcoholic hydroxyl group” indicates a hydroxyl group bonded to a carbon atom of an aliphatic hydrocarbon group. A nitrile solvent is an organic solvent containing a nitrile group in the structure thereof. An amide solvent is an organic solvent containing an amide group in the structure thereof. An ether solvent is an organic solvent containing C—O—C in the structure thereof.

Some organic solvents have a plurality of the functional groups which characterizes the above-described solvents in the structure thereof. In such a case, the organic solvent can be classified as any type of the solvent having the characteristic functional group. For example, diethylene glycol monomethylether can be classified as an alcohol solvent or an ether solvent.

A hydrocarbon solvent consists of a hydrocarbon which may be halogenated, and does not have any substituent other than a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

As the organic solvent contained in the organic developing solution, among these, a polar solvent is preferable, and ketone solvents, ester solvents, nitrile solvents and the like are preferable.

Examples of ketone solvents include 1-octanone, 2-octanone, 1-nonanone, 2-nonanone, acetone, 4-heptanone, 1-hexanone, 2-hexanone, diisobutyl ketone, cyclohexanone, methylcyclohexanone, phenylacetone, methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, acetonylacetone, ionone, diacetonylalcohol, acetylcarbinol, acetophenone, methyl naphthyl ketone, isophorone, propylenecarbonate, γ-butyrolactone, methyl amyl ketone (2-heptanone), and the like. Among these examples, as a ketone solvent, methyl amyl ketone (2-heptanone) is preferable.

Examples of ester solvents include methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, isoamyl acetate, ethyl methoxyacetate, ethyl ethoxyacetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monophenyl ether acetate, diethylene glycol monobutyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxybutyl acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, propylene glycol diacetate, methyl formate, ethyl formate, butyl formate, propyl formate, ethyl lactate, butyl lactate, propyl lactate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl-3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate, propyl-3-methoxypropionate, and the like. Among these examples, as an ester solvent, butyl acetate is preferable.

Examples of nitrile solvents include acetonitrile, propionitrile, valeronitrile, butyronitrile and the like.

As desired, the organic developing solution may have a conventional additive blended. Examples of the additive include surfactants. The surfactant is not particularly limited, and for example, an ionic or non-ionic fluorine and/or silicon surfactant can be used.

As the surfactant, a non-ionic surfactant is preferable, and a non-ionic fluorine surfactant or a non-ionic silicon surfactant is more preferable.

In a case where a surfactant is added, the amount thereof based on the total amount of the organic developing solution is generally 0.001% to 5% by mass, preferably 0.005% to 2% by mass, and more preferably 0.01% to 0.5% by mass.

The developing treatment can be performed by a conventional developing method. Examples thereof include a method in which the support is immersed in the developing solution for a predetermined time (a dip method), a method in which the developing solution is cast up on the surface of the substrate by surface tension and maintained for a predetermined period (a puddle method), a method in which the developing solution is sprayed onto the surface of the substrate (spray method), and a method in which the developing solution is continuously ejected from a developing solution ejecting nozzle while scanning at a constant rate to apply the developing solution to the substrate while rotating the substrate at a constant rate (dynamic dispense method).

As the organic solvent contained in the rinse liquid used in the rinse treatment after the developing treatment in a case of a solvent developing process, any of the above-described organic solvents contained in the organic developing solution can be used which poorly dissolves the resist pattern. In general, at least one solvent selected from the group consisting of hydrocarbon solvents, ketone solvents, ester solvents, alcohol solvents, amide solvents and ether solvents is used. Among these, at least one solvent selected from the group consisting of hydrocarbon solvents, ketone solvents, ester solvents, alcohol solvents and amide solvents is preferable, more preferably at least one solvent selected from the group consisting of alcohol solvents and ester solvents, and an alcohol solvent is particularly preferable.

The alcohol solvent used for the rinse liquid is preferably a monohydric alcohol of 6 to 8 carbon atoms, and the monohydric alcohol may be linear, branched or cyclic. Specific examples thereof include 1-hexanol, 1-heptanol, 1-octanol, 2-hexanol, 2-heptanol, 2-octanol, 3-hexanol, 3-heptanol, 3-octanol, 4-octanol, benzyl alcohol, and the like. Among these, 1-hexanol, 2-heptanol and 2-hexanol are preferable, and 1-hexanol and 2-hexanol are more preferable.

As the organic solvent, one kind of solvent may be used alone, or two or more kinds of solvents may be used in combination. Further, an organic solvent other than the above-described examples or water may be mixed together. However, in consideration of the development characteristics, the amount of water in the rinse liquid, based on the total amount of the rinse liquid is preferably 30% by mass or less, more preferably 10% by mass or less, still more preferably 5% by mass or less, and most preferably 3% by mass or less.

As desired, the rinse liquid may have a conventional additive blended. Examples of the additive include surfactants. As the surfactant, the same surfactants as those described above can be exemplified, a non-ionic surfactant is preferable, and a non-ionic fluorine surfactant or a non-ionic silicon surfactant is more preferable.

In a case where a surfactant is added, the amount thereof based on the total amount of the rinse liquid is generally 0.001% to 5% by mass, preferably 0.005% to 2% by mass, and more preferably 0.01% to 0.5% by mass.

The rinse treatment using a rinse liquid (washing treatment) can be conducted by a conventional rinse method. Examples of the rinse method include a method in which the rinse liquid is continuously applied to the substrate while rotating it at a constant rate (rotational coating method), a method in which the substrate is immersed in the rinse liquid for a predetermined time (dip method), and a method in which the rinse liquid is sprayed onto the surface of the substrate (spray method).

In the resist pattern forming method of the present embodiment described above, the resist composition according to the first aspect described above is used, thus it is possible to form a resist pattern having higher sensitivity and better lithography characteristics (roughness) at the time of forming a resist pattern.

<Preparation of Compound>

Preparation Example 1

Anthracene (5.0 g, 28 mmol), methyl acrylate (3.6 g, 42 mmol), aluminum chloride (0.37 g, 2.8 mmol) and toluene (50 g) were charged into a 100 mL three-necked flask and stirred. The reaction was carried out at 80° C. for 4 hours. The resultant solution was cooled. Ultrapure water (50 g) and MTBE (74 g) were added thereto, and after stirring for 30 minutes, the aqueous layer was removed. The organic layer was washed three times with ultrapure water (50 g each time), and the organic layer was concentrated using a rotary evaporator. The concentrate was recrystallized with 2-isopropanol to obtain Intermediate 1 (5.9 g, yield: 79.6%).

Sodium hydroxide (3.8 g, 95 mmol) and ultrapure water (38 g) were charged into a 100 mL three-necked flask and stirred to be dissolved. Intermediate 1 (5.0 g, 19 mmol) was dispersed and reacted at 90° C. for 4 hours. The resultant solution was cooled to room temperature, hydrochloric acid was added for neutralization until the solution became acidic, then MTBE (50 g) was added. After stirring for 30 minutes, the aqueous layer was removed. The organic layer was washed three times with ultrapure water (50 g each time), and the organic layer was concentrated using a rotary evaporator to obtain Intermediate 2 (4.6 g, yield: 97.2%).

Intermediate 2 (4.0 g, 16 mmol), compound (I-1) (5.0 g, 16 mmol), and dichloromethane (87 g) were charged into a 100 mL three-necked flask, and dissolved by stirring at room temperature. Diisopropyl carbodiimide (2.2 g, 18 mmol) and dimethylaminopyridine (0.098 g, 0.8 mmol) were added thereto, and the reaction was carried out at room temperature for 5 hours. The reaction solution was filtered and the filtrate was concentrated using a rotary evaporator. The concentrate was dissolved in acetonitrile (17 g) and then added dropwise to MTBE (170 g). The precipitated solid was filtered. The filtrate was again dissolved in acetonitrile (17 g), and then added dropwise to MTBE (170 g). The precipitated solid was filtered. After conducting this operation twice, the filtrate was dried under reduced pressure to obtain a precursor (Bpre-2) (5.8 g, yield: 66.8%).

Preparation Example of Other Precursors

The following precursors (Bpre-1) and (Bpre-3) to (Bpre-12) were obtained in the same manner as in the preparation example of the precursor (Bpre-2). The precursors (Bpre-1) to (Bpre-12) obtained are shown below.

(Preparation Example of Compound (B1-2)

The following compound (B1-2) was obtained by salt exchange between the precursor (Bpre-2) and the compound B.

Preparation Example of Other Compounds

The following compounds (B1-1), (B1-3) to (B1-10), and (D1-1) to (D1-3) were respectively obtained in the same manner as in “Preparation Example of Compound (B1-2)” by salt exchange between the precursors (Bpre-1) and (Bpre-3) to (Bpre-12) and the compound A for salt exchange.

The compounds (B1-1) to (B1-10) and the compounds (D1-1) to (D1-3) obtained are shown below.

[Preparation of Resist Composition]

Examples 1 to 33 and Comparative Examples 1 to 30

The components shown in Tables 1 to 4 were mixed and dissolved to prepare resist compositions (solid content concentration: 1.7% by mass) of the respective examples.

TABLE 1 Component (B) Component (D) Component Component Component Component Component Component (A) (B1) (B2) (D1) (D2) (S) Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-1 Example 1 [100] [18.5] [3.8] [7200] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-2 Example 2 [100] [18.5] [3.8] [7200] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-3 Example 3 [100] [18.5] [3.8] [7200] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-4 Example 4 [100] [18.5] [3.8] [7200] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-5 Example 5 [100] [18.5] [3.8] [7200] Comparative (A)-2 (B1)-1 — — (D2)-1 (S2)-2 Example 6 [100] [18.5] [3.8] [7200] Comparative (A)-3 (B1)-1 — — (D2)-1 (S2)-2 Example 7 [100] [18.5] [3.8] [7200] Comparative (A)-4 (B1)-1 — — (D2)-1 (S2)-2 Example 8 [100] [18.5] [3.8] [7200] Comparative (A)-5 (B1)-1 — — (D2)-1 (S2)-2 Example 9 [100] [18.5] [3.8] [7200] Comparative (A)-6 (B1)-1 — — (D2)-1 (S2)-2 Example 10 [100] [18.5] [3.8] [7200] Comparative (A)-1 (B1)-2 — — (D2)-1 (S2)-2 Example 11 [100] [20.5] [3.8] [7300] Comparative (A)-1 (B1)-3 — — (D2)-1 (S2)-2 Example 12 [100] [18.7] [3.8] [7200] Comparative (A)-1 (B1)-4 — — (D2)-1 (S2)-2 Example 13 [100] [20.5] [3.8] [7300]

TABLE 2 Component (B) Component (D) Component Component Component Component Component Component (A) (B1) (B2) (D1) (D2) (S) Comparative (A)-1 (B1)-5 — — (D2)-1 (S2)-2 Example 14 [100] [17.7] [3.8] [7150] Comparative (A)-1 (B1)-6 — — (D2)-1 (S2)-2 Example 15 [100] [17.7] [3.8] [7150] Comparative (A)-1 (B1)-7 — — (D2)-1 (S2)-2 Example 16 [100] [20.7] [3.8] [7300] Comparative (A)-1 (B1)-8 — — (D2)-1 (S2)-2 Example 17 [100] [20.1] [3.8] [7300] Comparative (A)-1 (B1)-9 — — (D2)-1 (S2)-2 Example 18 [100] [21.9] [3.8] [7400] Comparative (A)-1  (B1)-10 — — (D2)-1 (S2)-2 Example 19 [100] [25.7] [3.8] [7600] Comparative (A)-1 — (B2)-1 — (D2)-1 (S2)-2 Example 20 [100] [17.4] [3.8] [7200] Comparative (A)-1 — (B2)-2 — (D2)-1 (S2)-2 Example 21 [100] [16.7] [3.8] [7100] Comparative (A)-1 — (B2)-1 — (D2)-1 (S1/S2)-1 Example 22 [100] [17.4] [3.8] [7200] Comparative (A)-1 — (B2)-2 — (D2)-1 (S1/S2)-1 Example 23 [100] [16.7] [3.8] [7100] Comparative (A)-1 — (B2)-1 — (D2)-1 (S2)-3 Example 24 [100] [17.4] [3.8] [7200] Comparative (A)-1 — (B2)-2 — (D2)-1 (S2)-3 Example 25 [100] [16.7] [3.8] [7100] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-2 Example 26 [100] [27.7] [5.9] [7900] Comparative (A)-1 (B1)-1 — — (D2)-1 (S2)-2 Example 27 [100] [13.9] [2.8] [6900] Comparative (A)-1 (B1)-1 — (D1)-1 — (S2)-2 Example 28 [100] [18.5] [5.4] [7300] Comparative (A)-1 (B1)-1 — (D1)-2 — (S2)-2 Example 29 [100] [18.5] [6.9] [7400] Comparative (A)-1 (B1)-1 — (D1)-3 — (S2)-2 Example 30 [100] [18.5] [5.4] [7300]

TABLE 3 Component (B) Component (D) Component Component Component Component Component (A) (B1) (B2) (D1) (D2) Component (S) Example 1 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 2 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-2 [100] [18.5] [3.8] [7200] Example 3 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-3 [100] [18.5] [3.8] [7200] Example 4 (A)-1 (B1)-1 — — (D2)-1 (S1)-4 [100] [18.5] [3.8] [7200] Example 5 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-5 [100] [18.5] [3.8] [7200] Example 6 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-6 [100] [18.5] [3.8] [7200] Example 7 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-7 [100] [18.5] [3.8] [7200] Example 8 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-8 [100] [18.5] [3.8] [7200] Example 9 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-9 [100] [18.5] [3.8] [7200] Example 10 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-10 [100] [18.5] [3.8] [7200] Example 11 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-11 [100] [18.5] [3.8] [7200] Example 12 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-12 [100] [18.5] [3.8] [7200] Example 13 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-13 [100] [18.5] [3.8] [7200] Example 14 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-14 [100] [18.5] [3.8] [7200]

TABLE 4 Component (B) Component (D) Component Component Component Component Component Component (A) (B1) (B2) (D1) (D2) (S) Example 15 (A)-2 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 16 (A)-3 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 17 (A)-4 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 18 (A)-5 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 19 (A)-6 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [18.5] [3.8] [7200] Example 20 (A)-1 (B1)-2 — — (D2)-1 (S1/S2)-1 [100] [20.5] [3.8] [7200] Example 21 (A)-1 (B1)-3 — — (D2)-1 (S1/S2)-1 [100] [18.7] [3.8] [7200] Example 22 (A)-1 (B1)-4 — — (D2)-1 (S1/S2)-1 [100] [20.5] [3.8] [7300] Example 23 (A)-1 (B1)-5 — — (D2)-1 (S1/S2)-1 [100] [17.7] [3.8] [7150] Example 24 (A)-1 (B1)-6 — — (D2)-1 (S1/S2)-1 [100] [17.7] [3.8] [7150] Example 25 (A)-1 (B1)-7 — — (D2)-1 (S1/S2)-1 [100] [20.7] [3.8] [7300] Example 26 (A)-1 (B1)-8 — — (D2)-1 (S1/S2)-1 [100] [20.1] [3.8] [7300] Example 27 (A)-1 (B1)-9 — — (D2)-1 (S1/S2)-1 [100] [21.9] [3.8] [7400] Example 28 (A)-1  (B1)-10 — — (D2)-1 (S1/S2)-1 [100] [25.7] [3.8] [7600] Example 29 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [27.7] [5.9] [7900] Example 30 (A)-1 (B1)-1 — — (D2)-1 (S1/S2)-1 [100] [13.9] [2.8] [6900] Example 31 (A)-1 (B1)-1 — (D1)-1 — (S1/S2)-1 [100] [18.5] [5.4] [7300] Example 32 (A)-1 (B1)-1 — (D1)-2 — (S1/S2)-1 [100] [18.5] [6.9] [7400] Example 33 (A)-1 (B1)-1 — (D1)-3 — (S1/S2)-1 [100] [18.5] [5.4] [7300]

In Tables 1 to 4, each abbreviation has the following meaning. The numerical values in the parentheses are blending amounts (parts by mass).

(A)-1: polymer compound represented by the following Chemical Formula (A1)-1. The polymer compound (A1)-1 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-1 in terms of standard polystyrene equivalent determined by GPC measurement was 7,200, and the molecular weight dispersion degree (Mw/Mn) was 1.69. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m) acquired by ¹³C-NMR was 50:50.

(A)-2: polymer compound represented by the following Chemical Formula (A1)-2. The polymer compound (A1)-2 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-2 in terms of standard polystyrene equivalent determined by GPC measurement was 6,900, and the molecular weight dispersion degree (Mw/Mn) was 1.71. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m) acquired by ¹³C-NMR was 50:50.

(A)-3: polymer compound represented by the following Chemical Formula (A1)-3. The polymer compound (A1)-3 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-3 in terms of standard polystyrene equivalent determined by GPC measurement was 7,300, and the molecular weight dispersion degree (Mw/Mn) was 1.70. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m) acquired by ¹³C-NMR was 50:50.

(A)-4: polymer compound represented by the following Chemical Formula (A1)-4. The polymer compound (A1)-4 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-4 in terms of standard polystyrene equivalent determined by GPC measurement was 6,800, and the molecular weight dispersion degree (Mw/Mn) was 1.65. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m) acquired by ¹³C-NMR was 50:50.

(A)-5: polymer compound represented by the following Chemical Formula (A1)-5. The polymer compound (A1)-5 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-5 in terms of standard polystyrene equivalent determined by GPC measurement was 7,300, and the molecular weight dispersion degree (Mw/Mn) was 1.74. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m/n) acquired by ¹³C-NMR was 20:30:50.

(A)-6: polymer compound represented by the following Chemical Formula (A1)-6. The polymer compound (A1)-6 was obtained by radical polymerization using monomers from which the constituent units constituting the polymer compound are derived at a predetermined molar ratio. The weight average molecular weight (Mw) of the polymer compound (A1)-6 in terms of standard polystyrene equivalent determined by GPC measurement was 7,200, and the molecular weight dispersion degree (Mw/Mn) was 1.69. The copolymerization compositional ratio (the proportion (molar ratio) of each constitutional unit in the structural formula) (1/m) acquired by ¹³C-NMR was 50:50.

(B1)-1 to (B1)-10: respective acid generators including the compounds (B1-1) (B1-10) described above.

(D1)-1 to (D1)-3: acid diffusion control agents including the compounds respectively represented by Chemical Formulae (D1-1) to (D1-3).

(B2)-1 and (B2)-2: acid generators including compounds represented by the following Chemical Formulae (B2-1) and (B2-2).

(D2)-1: acid diffusion control agent including a compound represented by the following Chemical Formula (D2-1).

TABLE 5 Ratio (Mass Ratio) of Components (S1) and (S2) Ratio Component (S) Component (S1) Component (S2) (Mass Ratio) (S1/S2)-1 PGME PGMEA 50/50 (S1/S2)-2 PGME PGMEA 80/20 (S1/S2)-3 PGME PGMEA 20/80 (S1)-4 PGME — 100 (S1/S2)-5 IPA PGMEA 50/50 (S1/S2)-6 t-butyl alcohol PGMEA 50/50 (S1/S2)-7 DAA PGMEA 50/50 (S1/S2)-8 ethylene glycol PGMEA 50/50 (S1/S2)-9 DAA GBL/PGMEA 20/10/70 (S1/S2)-10 PGME PGMEA/CH 20/60/20 (S1/S2)-11 PGME PGMEA/CH 20/20/60 (S1/S2)-12 PGME CH 80/20 (S1/S2)-13 PGME GBL 90/10 (S1/S2)-14 PGME/t-butyl alcohol PGMEA 30/20/50 (S2)-1 — PGMEA 100 (S2)-2 — PGMEA/CH 80/20 (S2)-3 — PGMEA/CH 50/50 (S2)-4 — PGMEA/CH 20/80 (S2)-5 — PGMEA/GBL 90/10

The abbreviations shown in Table 5 indicate the following solvents:

PGME: propylene glycol monomethyl ether;

IPA: isopropyl alcohol;

DAA: diacetone alcohol;

PEGMEA: propylene glycol monomethyl ether acetate;

GBL: γ-butyrolactone; and

CH: cyclohexanone.

<Formation of Resist Pattern>

A 8-inch silicon substrate which has been subjected to a hexamethyldisilazane (HMDS) treatment was coated with each resist composition of Examples and Comparative Examples using a spinner, and a prebake (PAB) treatment was performed thereon on a hot plate at a temperature of 110° C. for 60 seconds so that the composition was dried to form a resist film having a film thickness of 50 nm.

A drawing (exposure) was carried out on the resist film using an electron beam lithography system JEOL-JBX-9300FS (manufactured by JEOL Ltd.) with acceleration voltage of 100 kV and a target size of 1:1 line-and-space pattern (line width: 50 nm) (hereinafter referred to as an “LS pattern”). Thereafter, the resist film was subjected to a post-exposure bake (PEB) treatment at 100° C. for 60 seconds.

Alkali development was performed for 60 seconds at 23° C. using 2.38 mass % tetramethylammonium hydroxide (TMAH) aqueous solution “NMD-3” (trade name, manufactured by Tokyo Ohka Kogyo Co., Ltd.).

The resist film was rinsed with pure water for 15 seconds.

Consequently, 1:1 LS pattern with a line width of 50 nm was formed.

[Evaluation of Optimum Exposure Dose (Eop)]

An optimum exposure dose Eop (μC/cm²) at which the LS pattern of the target size was formed was acquired by the method for forming a resist pattern described above. The results are listed in Tables 6 to 8 under “Eop (μC/cm²)”.

[Evaluation of LWR (Line Width Roughness)]

For the LS pattern formed in “Formation of Resist Pattern”, 3σ, which is a scale indicating LWR, was determined. The results are summarized in Tables 6 to 8 as “LWR (nm)”.

“3σ” refers to a triple value (3σ) (unit: nm) of a standard deviation (σ) calculated from the results which are measured at 400 points of line positions in a longitudinal direction of a line with a scanning electron microscope (acceleration voltage: 800 V, trade name: S-9380, manufactured by Hitachi High-Technologies Corporation).

The smaller a value of 3σ, the smaller a roughness of a line sidewall, which indicates that the LS pattern with more uniform width is obtained.

[Evaluation of Defects]

An 8-inch silicon substrate which has been subjected to a hexamethyldisilazane (HMDS) treatment was coated with each resist composition of Examples and Comparative Examples using a spinner, and a prebake (PAB) treatment was performed thereon on a hot plate at a temperature of 110° C. for 60 seconds so that the composition was dried to form a resist coating film having a film thickness of 50 nm. The number of foreign substances/flaws was measured with the coating film and Surfscan SP2 (trade name, manufactured by KLA-Tencor Corporation).

When the number of foreign substances/flaws of 80 nm or less on a surface of the coating film of Comparative Example 1 was defined as 1.0, the evaluation was carried out according to the following evaluation criteria. The results are summarized in Tables 6 to 8.

(Evaluation Criteria)

A: the number of foreign substances/flaws is smaller than that of Grade B

B: 0.5 or less

C: 0.5 to 1.0

D: exceeding 1.0

TABLE 6 Foreign PAB PEB Substances/ Eop LWR (° C.) (° C.) Flaws (μC/cm²) (nm) Comparative Example 1 110 100 Reference 95 4.9 Comparative Example 2 110 100 D 90 4.8 Comparative Example 3 110 100 D 95 4.8 Comparative Example 4 110 100 C 95 4.9 Comparative Example 5 110 100 C 90 5.0 Comparative Example 6 110 100 D 85 4.8 Comparative Example 7 110 100 D 100 4.7 Comparative Example 8 110 100 D 105 5.1 Comparative Example 9 110 100 C 110 4.8 Comparative Example 10 110 100 C 120 4.8 Comparative Example 11 110 100 D 85 4.7 Comparative Example 12 110 100 D 90 4.8 Comparative Example 13 110 100 D 90 4.8 Comparative Example 14 110 100 C 105 4.7 Comparative Example 15 110 100 C 110 4.8 Comparative Example 16 110 100 D 90 4.9 Comparative Example 17 110 100 D 95 4.8 Comparative Example 18 110 100 D 90 4.8 Comparative Example 19 110 100 C 90 4.9 Comparative Example 20 110 100 A 120 6.4 Comparative Example 21 110 100 A 125 6.1 Comparative Example 22 110 100 A 125 6.3 Comparative Example 23 110 100 A 125 6.0 Comparative Example 24 110 100 A 120 6.4 Comparative Example 25 110 100 A 125 6.0 Comparative Example 26 110 100 D 90 4.5 Comparative Example 27 110 100 C 95 5.3 Comparative Example 28 110 100 D 95 4.7 Comparative Example 29 110 100 D 90 4.9 Comparative Example 30 110 100 D 95 4.7

TABLE 7 Foreign PAB PEB Substances/ Eop LWR (° C.) (° C.) Flaws (μC/cm²) (nm) Example 1 110 100 A 90 4.6 Example 2 110 100 A 90 4.6 Example 3 110 100 A 95 4.6 Example 4 110 100 A 90 4.7 Example 5 110 100 B 90 4.7 Example 6 110 100 B 95 4.7 Example 7 110 100 A 90 4.6 Example 8 110 100 B 90 4.7 Example 9 110 100 A 90 4.5 Example 10 110 100 A 95 4.5 Example 11 110 100 A 85 4.8 Example 12 110 100 A 90 4.7 Example 13 110 100 B 90 4.6 Example 14 110 100 A 95 4.6

TABLE 8 Foreign PAB PEB Substances/ Eop LWR (° C.) (° C.) Flaws (μC/cm²) (nm) Example 15 110 100 A 85 4.6 Example 16 110 100 A 95 4.6 Example 17 110 100 A 95 5.1 Example 18 110 100 A 110 4.7 Example 19 110 100 A 115 4.7 Example 20 110 100 A 85 4.6 Example 21 110 100 A 85 4.8 Example 22 110 100 A 90 4.5 Example 23 110 100 A 95 4.7 Example 24 110 100 A 105 4.6 Example 25 110 100 A 90 4.8 Example 26 110 100 A 90 4.8 Example 27 110 100 A 90 4.7 Example 28 110 100 A 90 4.7 Example 29 110 100 A 90 4.4 Example 30 110 100 A 90 5.3 Example 31 110 100 A 95 4.7 Example 32 110 100 A 90 4.7 Example 33 110 100 A 90 4.7

Based on the results listed in Tables 6 to 8, according to the resist compositions of Examples, it is possible to achieve high sensitivity in forming a resist pattern and to form a resist pattern having a good shape with reduced roughness.

While preferred embodiments of the invention have been described and illustrated above, it should be understood that these are exemplary of the invention and are not to be considered as limiting. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit or scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description, and is only limited by the scope of the appended claims. 

What is claimed is:
 1. A resist composition which generates an acid upon exposure and of which solubility in a developing solution is changed due to an action of an acid, the resist composition comprising: a base material component (A) of which solubility in a developing solution is changed due to an action of an acid; a compound (BD1) including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent component (S), wherein the organic solvent component (S) contains an organic solvent (S1) having a hydroxyl group:

wherein Rx¹ to Rx⁴ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rx¹ to Rx⁴ may be bonded to each other to form a ring structure, and at least one of Rx¹ and Rx² and at least one of Rx³ and Rx⁴ are bonded to each other to form a ring structure; Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, Ry¹ and Ry² may be bonded to each other to form a ring structure;

represents a double bond or a single bond; Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx¹ to Rx⁴, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion; n represents an integer of 1 or more; m represents an integer of 1 or more; and M^(m+) represents an m-valent organic cation.
 2. The resist composition according to claim 1, wherein a content of the organic solvent (S1) having a hydroxyl group is 10 parts by mass or more based on 100 parts by mass of the organic solvent component (S).
 3. The resist composition according to claim 1, wherein the organic solvent component (S) is a mixed solvent of the organic solvent (S1) having a hydroxyl group and an organic solvent (S2) having no hydroxyl group.
 4. The resist composition according to claim 3, wherein the organic solvent (S1) having a hydroxyl group is one or more organic solvents selected from the group consisting of propylene glycol monomethyl ether, isopropyl alcohol, t-butyl alcohol, diacetone alcohol and ethylene glycol, and the organic solvent (S2) having no hydroxyl group is one or more organic solvents selected from the group consisting of propylene glycol monomethyl ether acetate, γ-butyrolactone and cyclohexanone.
 5. The resist composition according to claim 3, wherein a blending ratio (mass ratio) of the organic solvent (S1) having a hydroxyl group to the organic solvent (S2) having no hydroxyl group (S1:S2) is 1:9 to 8:2.
 6. The resist composition according to claim 1, wherein an anion moiety in the compound (BD1) is an anion represented by the following Formula (bd1-an1):

wherein Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom; Rx⁷ and Rx⁸ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or are bonded to each other to form a ring structure; p is 1 or 2, and when p is 2, a plurality of Rx⁷s and Rx⁸s may be different from each other; Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or alternatively, may be bonded to each other to form a ring structure;

represents a double bond or a single bond; Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion; and n represents an integer of 1 or more.
 7. The resist composition according to claim 6, wherein an anion moiety in the compound (BD1) is an anion represented by the following Formula (bd1-an2):

wherein Rx⁵ and Rx⁶ each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom; a plurality of Rx⁷s and Rx⁸s each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rx⁷s and Rx⁸s may be bonded to each other to form a ring structure; Ry¹ and Ry² each independently represents a hydrocarbon group which may have a substituent or a hydrogen atom, or may be bonded to each other to form a ring structure;

represents a double bond or a single bond; Rz¹ to Rz⁴ each independently represents, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rz¹ to Rz⁴ may be bonded to each other to form a ring structure, provided that at least one of Rx⁵ to Rx⁸, Ry¹ and Ry² and Rz¹ to Rz⁴ has an anionic group, and the whole anion moiety is an n-valent anion; and n represents an integer of 1 or more.
 8. The resist composition according to claim 1, wherein Ry¹ and Ry² are bonded to each other to form a ring structure.
 9. The resist composition according to claim 6, wherein Rx⁷ and Rx⁸ are bonded to each other to form a ring structure.
 10. The resist composition according to claim 1, wherein two or more of Rz¹ to Rz⁴ are bonded to each other to form a ring structure.
 11. The resist composition according to claim 1, wherein at least one of Rz¹ to Rz⁴ has an anionic group.
 12. The resist composition according to claim 6, wherein at least one of Rx⁵ and Rx⁶ has an anionic group.
 13. The resist composition according to claim 1, wherein a cation moiety in the compound (BD1) is a cation represented by any one of the following Formulae (ca-1) to (ca-4):

wherein R²⁰¹ to R²⁰⁷ and R²¹¹ and R²¹² each independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent, or an alkenyl group which may have a substituent; each of R²⁰¹ to R²⁰³, R²⁰⁶ and R²⁰⁷, and R²¹¹ and R²¹² may be bonded to each other to form a ring together with a sulfur atom in the formulae; R²⁰⁸ and R²⁰⁹ each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, or may be bonded to each other to form a ring together with a sulfur atom in the formulae; R²¹⁰ represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO₂-containing cyclic group which may have a substituent; L²⁰¹ represents —C(═O)— or —C(═O)—O—; a plurality of Y²⁰¹s each independently represent an arylene group, an alkylene group or an alkenylene group; x is 1 or 2; and W²⁰¹ represents a (x+1)-valent linking group.
 14. A resist pattern forming method, comprising: forming a resist film on a support using the resist composition according to claim 1; exposing the resist film; and developing the exposed resist film to form a resist pattern.
 15. The resist pattern forming method according to claim 14, wherein the resist film is exposed to extreme ultraviolet (EUV) or electron beam (EB). 